Abstract: A method for making a mask for optical lithography or other projection printing, wherein the mask is represented by a mask pattern, is disclosed herein. The mask provides a substantially binary output image on the surface of a wafer as light is applied to the mask. Light passes through the mask and onto a wafer at varying intensities, such intensities represented by output intensity values, the threshold values of which produce output images within predetermined constraints. The method includes the steps of defining sampling points which are representative of the binary output image. These sampling points are used in defining local objective functions, which are combined to give a total objective function. The present invention further includes the steps of adjusting the mask pattern to provide for minimization by optimization of the objective function, transferring the mask pattern to a mask generating machine to generate a mask, and generating a mask.

Abstract: An electrical contact for a lamp having at least one electrical jack employed in conjunction with lamp housing and an electrical conductor. The contact includes a body element possessing a first end portion, second end portion, and an intermediate turned or bent portion. The body element is constructed of flexible conductive material to permit bending of the first and second end portions relative to one another. A pair of flexible flanges extend from the first portion and serve to form a channel and to contact the lamp electrical jack. The flanges include at least one edge portion capable of scrapping the lamp electrical jack. The electrical conductor connects to the second end portion of the body element which is held to the lamp housing.