Abstract: A reactor for the plasma-assisted processing of gaseous media comprising a reactor chamber including a gas permeable bed of active material, a power source for applying across the bed of active material a potential sufficient to establish a plasma in a gaseous medium flowing through the bed of active material and a chamber having an inlet stub and an outlet stub for constraining the gaseous medium to flow through the bed of active material, wherein the bed of active material comprises a matrix of beads of a dielectric material having an assembly of regular arrays of beads in each of which adjacent beads are connected to a high voltage input terminal or an electrical ground.
Type:
Grant
Filed:
July 27, 2001
Date of Patent:
November 11, 2003
Assignee:
Accentus plc
Inventors:
Peter James Andrews, Stephen Ivor Hall, Michael Inman, James Timothy Shawcross, David Michael Weeks, Christopher David John Manson-Whitton