Patents Represented by Attorney Willard B. Matthews, Jr.

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  • Collimated x-ray source for x-ray lithographic system
    Patent number: 3947687
    Abstract: In an X-ray lithographic system, high power X-ray illumination of photo-resist coated substrate members is accomplished by projecting a collimated X-ray beam, emitted from an extended area X-ray source, through the patterned apertures of an X-ray absorbent mask. Improved efficiency is achieved by limiting X-ray emission to the discrete portions of the extended area emission surface that corresponds to related patterned mask apertures.
    Type: Grant
    Filed: October 23, 1974
    Date of Patent: March 30, 1976
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventor: Thomas E. Fenstermacher