Patents Represented by Attorney William Cray
  • Patent number: 6690704
    Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
    Type: Grant
    Filed: July 31, 2002
    Date of Patent: February 10, 2004
    Assignee: Cymer, Inc.
    Inventors: John P. Fallon, Richard L. Sandstrom, William N. Partlo, Alexander I. Ershov, Toshihiko Ishihara, John Meisner, Richard M. Ness, Paul C. Melcher, John A. Rule, Robert N. Jacques
  • Patent number: 6687562
    Abstract: A system for a monitoring lithography lasers at integrated circuit fabrication plants. Each laser at each fabrication plant has associated with it a terminal server. With respect to each fabrication plant a central control server unit is in communication with each of the lasers through a local area network. Information from the lasers is collected by the central control server unit and the information is used to provide summary information which is made available in a web site format to interested parties having access authorization.
    Type: Grant
    Filed: December 8, 2000
    Date of Patent: February 3, 2004
    Assignee: Cymer, Inc.
    Inventors: Parthiv S. Patel, Joseph E. Conway, Muljadi Tantra, Jeffrey W. Moen, Jason R. Carlesi, Roger L. Green, Tom A. Watson, Christopher G. Rowan
  • Patent number: 6671294
    Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.
    Type: Grant
    Filed: July 27, 2001
    Date of Patent: December 30, 2003
    Assignee: Cymer, Inc.
    Inventors: Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, Palash P. Das, Richard L. Sandstrom, John M. Algots, Khurshid Ahmed
  • Patent number: 6661826
    Abstract: A feedthrough structure of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure to a single piece elongated electrode inside the enclosure. The feedthrough structure includes a single piece integrated main insulator larger than the electrode. The main insulator is compressed between the electrode and the wall of the enclosure. The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals to prevent gas leakage around the feedthrough structure.
    Type: Grant
    Filed: June 7, 2002
    Date of Patent: December 9, 2003
    Assignee: Cymer, Inc.
    Inventors: Richard C. Ujazdowski, Timothy S. Dyer, William N. Partlo, Michael Altheim, Brian Strate, Thomas Hofmann
  • Patent number: 6654403
    Abstract: An excimer laser with a laser chamber containing a circulating laser gas containing fluorine and a set of long life electrode structures. At least one of the electrode structures has an erosion pad and a cross section shape designed to provide in conjunction with other chamber structure a gradual increasing flow cross section between the discharge region and the circulating tangential fan blade. In a preferred embodiment, electrode lifetime is increased by annealing the erosion rod after it is are machined. This annealing relieves the surface stress caused by the machining operation and reduces the exposed metallic grain boundary length per unit area on the surface of the electrodes, which provides substantial reduction in erosion caused by fluorine chemical attack. Annealing after machining also reduces the stress throughout the bulk of the electrode material. In preferred embodiments the anode is a copper-aluminum alloy and the cathode is a copper-zinc alloy.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: November 25, 2003
    Assignee: Cymer, Inc.
    Inventors: Richard C. Ujazdowski, Michael C. Cates, Richard G. Morton
  • Patent number: 6650666
    Abstract: An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control with the combination of a stepper motor and a piezoelectric driver. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: November 18, 2003
    Assignee: Cymer, Inc.
    Inventors: Ronald L. Spangler, Robert N. Jacques, John A. Rule, Frederick A. Palenschat, Igor V. Fomenkov, John M. Algots, Jacob P. Lipcon, Richard L. Sandstrom
  • Patent number: 6644324
    Abstract: Methods and apparatus are provided for cleaning and passivating laser discharge chambers with plasmas. In one embodiment, an oxygen based plasma is formed in a plasma source external to the laser discharge chamber by applying a radiofrequency signal to oxygen containing gases. The oxygen based plasma is drawn into the laser discharge chamber, where it reacts with contaminants and cleans internal surfaces. After cleaning, a fluorine based plasma is formed in the plasma source and drawn into the laser discharge chamber to passivate internal surfaces. In another embodiment, cleaning with the oxygen based plasma is not used since some level of cleaning is accomplished with the fluorine based plasma. In another embodiment, oxygen based plasmas and fluorine based plasmas are formed in the laser discharge chamber by applying a radiofrequency signal to a laser discharge chamber electrode.
    Type: Grant
    Filed: March 6, 2000
    Date of Patent: November 11, 2003
    Assignee: Cymer, Inc.
    Inventors: Tom A. Watson, Richard L. Sandstrom, Richard G. Morton, Robert E. Weeks, John P. Quitter, Mark R. Lewis
  • Patent number: 6618421
    Abstract: A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.
    Type: Grant
    Filed: April 18, 2001
    Date of Patent: September 9, 2003
    Assignee: Cymer, Inc.
    Inventors: Palash P. Das, Jennan Yu, Stuart L. Anderson, Helmut Schillinger, Tobias Pflanz, Claus Strowitzki, Claudia A. Hartmann, Stephan Geiger, Brett D. Smith, William N. Partlo
  • Patent number: 6618425
    Abstract: A laser controller interconnected with an electric discharge laser communicates with a remote computer incorporating a display screen programmably emulating a conventional keyboard. The display screen has a plurality of imaged virtual keys each programmably emulating a physical key of a conventional keyboard. Some virtual keys programmably emulate a prescribed sequence of keystrokes, which control, monitor, and record the laser operation. A prescribed sequence can optionally be automated, conditional, or interrupted by operator prompts. The remote computer communicates serially with the laser controller through an electrically conductive cable, a fiberoptic link, or a wireless channel. A keystroke is typically applied by manually pressing the position of a corresponding virtual key on a touch sensitive screen, or alternatively by actuating a conventional pointing device.
    Type: Grant
    Filed: November 17, 1999
    Date of Patent: September 9, 2003
    Assignee: Cymer, Inc.
    Inventors: Jason R. Carlesi, David J. Dunlap, Igor V. Fomenkov
  • Patent number: 6603549
    Abstract: A simple, reliable, easy to use method for calculating bandwidth data of very narrow band laser beams based on bandwidth data obtained with a spectrometer in circumstances where the laser bandwidths are not large compared to the slit function of the spectrometer. The slit function of the spectrometer is determined. Spectral data of the laser beam is measured with the spectrometer to produce a measured laser beam spectrum which represents a convolution of the laser beam spectrum and the spectrometer slit function. This measured laser spectrum is then mathematically convolved with the slit function of the spectrometer to produce a doubly convolved spectrum. Bandwidth values representing true laser bandwidths are determined from measured laser spectrum and the doubly convolved spectrum. Preferably the true laser bandwidths are calculated by determining the difference between “twice a measured laser bandwidth” and a corresponding “doubly convolved bandwidth”.
    Type: Grant
    Filed: August 16, 2001
    Date of Patent: August 5, 2003
    Assignee: Cymer, Inc.
    Inventors: Steven F. Haas, Richard L. Sandstrom, Thomas Hofmann, Alexander I. Ershov
  • Patent number: 6598322
    Abstract: A shoe having at least one elongated shape memory alloy element and an electric circuit which when energized will produce a tightening of the shoe upper around the foot of a wearer. In a preferred embodiment, the shoe in one of a pair of golf shoes and the circuit in the shoe is energized by a switch in the heel that is turned on by the golfer clicking his heels together. Typically the golfer does this prior to each important swing of a golf club. A battery contained in the shoe provides a power source to produce a current in the circuit that heats the shape memory alloy causing it to reduce its length providing the tightening of the shoe uppers.
    Type: Grant
    Filed: January 9, 2002
    Date of Patent: July 29, 2003
    Assignee: Cymer, Inc.
    Inventors: Robert N. Jacques, Marco Giovanardi, Huckleberry B. Dorn