Abstract: A structure for forming a sidewall image transfer conductor having a contact pad includes forming an insulator to include a recess, depositing a conductor around the insulator, and etching the conductor to form the sidewall image transfer conductor, wherein the conductor remains in the recess and forms the contact pad and the recess is perpendicular to the sidewall image transfer conductor.
Type:
Grant
Filed:
August 23, 1999
Date of Patent:
May 20, 2003
Assignee:
International Business Machines Corporation
Inventors:
Edward W. Conrad, Chung H. Lam, Dale W. Martin, Edmund Sprogis