Abstract: A method and apparatus for plasma impurity control in closed flux plasma systems such as Tokamak reactors is disclosed. Local axisymmetrical injection of hydrogen gas is employed to reverse the normally inward flow of impurities into the plasma.
Type:
Grant
Filed:
August 29, 1975
Date of Patent:
December 16, 1980
Assignee:
The United States of America as represented by the United States Department of Energy