Abstract: Methods and apparatus are provided for detection of large leaks in scaled articles. Apparatus for leak detection includes a first sealable chamber configured to receive a test piece containing a trace gas, a second sealable chamber, a first valve coupled between the first and second chambers, a leak detector having a test port, a trace gas permeable member coupled between the second chamber and the test port of the leak detector, a vacuum pump having an inlet, and a second valve coupled between the second chamber and the inlet of the vacuum pump. The permeable member may be quartz, which is permeable to helium when heated. The leak detector may be an ion pump or a helium mass spectrometer leak detector.

Abstract: A compact scroll pump includes a scroll set having an inlet and an outlet, and a drive mechanism. The scroll set includes a stationary scroll blade extending from a stationary plate and an orbiting scroll blade extending from an orbiting plate. The stationary and orbiting scroll blades are intermeshed together to define one or more interblade pockets. The orbiting scroll blade is located on a first side of the orbiting plate, and the drive mechanism is operatively coupled to a second side of the orbiting plate for producing orbiting motion of the orbiting scroll blade relative to the stationary scroll blade. The drive mechanism includes a motor and a crankshaft having an axis of rotation, and an orbiting bearing coupled between the crankshaft and the orbiting plate. The scroll set is configured such that an imaginary plane perpendicular to the axis of rotation passes through the orbiting bearing and at least a portion of the orbiting scroll blade.

Abstract: A substrate processing system includes a primary processing assembly and secondary processing assembly. The secondary processing assembly has one or more interconnected modules and includes one or more process stations. The primary and secondary processing assemblies are connected by a vacuum conveyor, so that the substrates remain in vacuum during transport. The secondary processing assembly may include one or more modules which are interconnected to provide a desired system configuration. A dual processing module, including first and second process stations, is selectably operable in a serial mode or a parallel mode.

Abstract: A rapid thermal processing system for large area substrates, such as glass panels for flat panel displays, includes a processing chamber having a loading/unloading zone and a processing zone, a heating assembly for heating a substrate in the processing zone, and a transport assembly for transporting the substrate through the processing chamber. The transport assembly includes a feed conveyor for transporting the substrate from the loading/unloading zone through the processing zone and a substrate return assembly for transporting the substrate from the feed conveyor to the loading/unloading zone after the substrate is transported through the processing zone. The substrate return assembly may include a return conveyor for transporting the substrate to the loading/unloading zone and a substrate reverser for transferring the substrate from the feed conveyor to the return conveyor.

Abstract: A disk gripper for gripping an insulating disk, such as a glass disk, at its edge during processing includes a contact device for contacting the edge of the insulating disk and a mechanism for moving the contact device between a contact position, in contact with the edge of the disk, and a retracted position. In a first processing station, a conductive coating is applied to a disk held by the gripper, with the contact device in the retracted position. In a second processing station, ions are generated in a plasma adjacent to the surface of the disk held by the gripper. The contact device is in the contact position in contact with the conductive coating, and a bias voltage is applied to the contact device in the second processing station. The ions are accelerated from the plasma toward the disk by the bias voltage applied to the conductive coating.

Abstract: A rapid thermal processing system for large area substrates, such as glass panels for flat panel displays, includes a processing chamber, a transport assembly for transporting a substrate through the processing chamber, and a heating assembly for heating the substrate. The heating assembly includes a bank of elongated heating elements disposed in the processing chamber. The heating elements have longitudinal axes aligned with the substrate transport direction. In one embodiment, heating elements on one side of the substrate have longitudinal axes aligned perpendicular to the substrate transport direction and heating elements on the opposite side of the substrate have longitudinal axes aligned parallel to the substrate transport direction.

Abstract: A soft docking system is provided for a medical treatment system, such as an intraoperative electron beam therapy system. The medical treatment system includes a treatment head, an applicator having a fixed position relative to a patient and apparatus for adjusting the position of the treatment head relative to the applicator. The soft docking system includes one or more sensing assemblies for sensing a position of the treatment head relative to the applicator and providing one or more position signals representative thereof, and a display responsive to the position signals for indicating the position of the treatment head relative to the applicator. The position of the treatment head may be adjusted so that the display indicates a desired postion. The docking system may provide an interlock signal to prevent application of the electron beam until the treatment head and the applicator are correctly aligned.

Abstract: An electron beam microscope includes an electron beam pattern source, a vacuum enclosure, electron optics, a detector and a processor. The electron beam pattern source generates a sequence of electron beam patterns for illuminating a set of pixels on a specimen. The electron optics directs the sequence of electron beam patterns to the specimen. The detector detects a result of an interaction between each of the electron beam patterns and the specimen and produces a sequence of detector signals. The processor, in response to the sequence of detector signals, generates an image including a pixel value representative of each of the illuminated of pixels on the specimen. The electron beam microscope preferably includes a deflector for deflecting each of the electron beam patterns relative to the specimen.

Abstract: An electron source includes a negative electron affinity photocathode on a light-transmissive substrate and a light beam generator for directing a light beam through the substrate at the photocathode for exciting electrons into the conduction band. The photocathode has at least one active area for emission of electrons with dimensions of less than about two micrometers. The electron source further includes electron optics for forming the electrons into an electron beam and a vacuum enclosure for maintaining the photocathode at high vacuum. The photocathode is patterned to define emission areas. A patterned mask may be located on the emission surface of the active layer, may be buried within the active layer or may be located between the active layer and the substrate.

Abstract: An electron beam source includes a cathode having an electron emission surface including an active area for emission of electrons and a cathode shield assembly including a conductive shield disposed in proximity to the electron emission surface of the cathode. The shield has an opening aligned with the active area. The electron beam source further includes a device for stimulating emission of electrons from the active area of the cathode, electron optics for forming the electrons into an electron beam and a vacuum enclosure for maintaining the cathode at high vacuum. The cathode may be a negative electron affinity photocathode formed on a light-transmissive substrate. The shield protects non-emitting areas of the emission surface from contamination and inhibits cathode materials from contaminating components of the electron beam source. The cathode may be moved relative to the opening in the shield so as to align an new active area with the opening.

Abstract: A linear accelerator for charged particles includes a plurality of accelerating stages in a linear arrangement along a central axis. Each accelerating stage has at least one passageway radially spaced from the central axis for transmitting a beam of charged particles. Electromagnetic wave energy is coupled to the accelerating stages to produce an accelerating electric field in a region of the passageway of each of the accelerating stages. Coupling circuits couple the electromagnetic wave energy between adjacent accelerating stages. Each accelerating stage may be configured as an annular accelerating cavity or as two or more accelerating cavities disposed around the central axis. The passageway may be configured as two or more discrete apertures or a single annular aperture. Beam bending devices may be used to direct the charged particle beam through the accelerator two or more times. The linear accelerator produces a high current, high energy charged particle beam.

Abstract: A vacuum processing system for handling and processing rectangular glass panels for flat panel displays has a cluster configuration. The system includes a central buffer chamber, with multiple processing chambers, a load lock and an unload lock positioned around the buffer chamber and coupled to the buffer chamber through gate valves. The buffer chamber contains a turntable that is rotatable about a vertical axis. The system further includes substrate carriers, each for supporting a substrate in a vertical orientation as it is transported through the system and is processed. The turntable has dual substrate carrier positions for rotating substrate carriers into alignment with a selected processing chamber, the load lock or the unload lock. Multiple substrates can be handled and processed concurrently to achieve a high throughput rate. The system is typically used for sputter deposition of ITO films and metal films on the glass substrate.

Abstract: A control apparatus for controlling RF power supplied to first and second loads is provided. The control apparatus includes a first symmetric hybrid junction having a first port for receiving input RF power, a second port coupled to the first load and a third port coupled to a dummy load. The control apparatus further includes a second symmetric hybrid junction having a first port coupled to a fourth port of the first symmetric hybrid junction and a third port coupled to the second load. First and second variable shorts are respectively coupled to second and fourth ports of the second symmetric hybrid junction. RF power reflected by the first and second variable shorts is controllably directed through the second symmetric hybrid junction to the second load. The amplitude and phase of the RF power supplied to the second load can be controlled independently.

Abstract: An electrodeless fluorescent light source has an electrodeless lamp mounted in a termination fixture which includes an inner conductor and an outer conductor disposed around the inner conductor and is coupled to a high frequency power source. Power is coupled to an ultraviolet-producing low pressure discharge in the electrodeless lamp which acts as a termination load within the termination fixture. A phosphor coating on the inner surface of the electrodeless lamp emits visible light upon excitation by ultraviolet radiation. Alternatively, the phosphor coating can be on the inner surface of a transparent envelope which forms part of the termination fixture. In this case, the phosphor coated envelope can be removable from the light source. The light source can be dimmed by reducing the microwave power input. Frequency of operation is typically from 902 MHz to 928 MHz.