Abstract: A novel, environmentally innocuous, post-etch, pre-soldering cleaner and cleaning process is disclosed for removing contaminants from plated surfaces of printed circuit boards manufactured by the pattern plating method. The post-etch, cleaning process of this invention, for removing contaminants from plated surfaces of an etched printed circuit, comprises treating the plated surfaces with a cleaning solution which comprises an aqueous solution of (i) an imidazole-2-thione compound and (ii) an acid. The imidazole-2-thione compound has the formula: ##STR1## wherein A and B are the same or different --R--Y groups, wherein R is a linear, branched or cyclic alkenyl group containing 1 to 12 carbon atoms and Y is a hydrogen, halogen, cyano, vinyl, phenyl or ether moiety. Of this class of compounds, 1-methyl-3-propylimidazole-2-thione is preferred.

Abstract: A new scintillating optical fiber is used in an array as a scintillator plate for imaging with high energy radiation, particles and the like. The scintillating optical fiber has an inner plastic core fiber which is transparent to visible radiation and has an index of refraction of about 1.45 or greater. The inner plastic core fiber has a plastic cladding material which has an index of refraction less than that of the inner plastic core fiber. The inner plastic core fiber contains a polymeric matrix material; a metal moiety; and an organic quench-resistant fluorescent material. The scintillator plates are useful in producing high efficiency and high resolution radiographic systems for x-ray medical diagnosis or non-destructive inspection as well as non-destructive inspection with thermal neutrons.

Abstract: A novel class of proton transfer, bis-benzazole, fluorescent compounds, i.e., fluors, is disclosed. The novel fluors include substituted or unsubstituted 1,4-bis(2-benzazolyl)-2-hydroxybenzenes and 1,4-bis(2-benzazolyl)-2-amidobenzenes wherein the benzazolyl group may be benzoxazolyl, benzimidazolyl, benzothiazolyl, and the like. The benzazolyl groups may be substituted with one or more alkyl groups to improve solubility in organic matrix materials such as solvents, monomers, resins, polymers, and the like. The novel fluors may be used in the manufacture of fluorescent coatings, objects, scintillators, light sources and the like. The novel fluors are particularly useful for radiation-hard, solid scintillators for the detection and measurement of high energy particles and radiation.

Abstract: Acid, electroplating baths having consistent leveler activity contain levelers which are quaternized near-monodisperse polymers of acrylic or methacrylic trialkyl amine esters. The polymers may contain hydroxyalkyl acrylate or methacrylate ester components, unquaternized acrylic or methacrylic amine component as well as other polymeric components.

Abstract: An efficient spray displacement tin plating process of copper printed circuit innerlayers is disclosed for the manufacture of multilayer printed circuit boards. The displacement tin plating solution is stabilized and replenished by incorporating free tin metal in the plating solution reservoir. Unwanted tin(IV) ions which are produced by aerial oxidation during the spray process, are reacted with tin metal in the reservoir to produce sufficient tin(II) ions to compensate for losses due to plating, oxidation and the like. Not only is the plating bath stabilized, but its useful life is extended dramatically.

Abstract: A stabilized spray displacement tin plating process of copper printed circuit innerlayers is disclosed for the manufacture of multilayer printed circuit boards. During prolonged use of spray tin plating, the plating solution becomes saturated with cupurous thiourea complex which precipitates interfering with spray nozzles and other mechanical components. The tin plating solution is stabilized by removing portions from the reservoir before saturation is reached, selectively precipitating the thiourea complex, and returning the remaining solution back to the reservoir. The precipitated cupurous thiourea complex is redissolved in acid and either disposed of by conventional waste treatment or the acid solution can be electrowinned to reclaim copper and oxidize thiourea to form a more acceptable acid solution for waste treatment.

Abstract: An environmentally innocuous effective replacement for thiourea is disclosed for use as a complexing agent in displacement plating processes in which the plating solution is applied to the substrate surface to be plated by immersion or by spraying, cascading, pouring and the like. The replacement complexing agent is an imidazole-2-thione compound having the formula: ##STR1## wherein A and B are the same or different --R--Y groups, wherein R is linear, branched or cyclic alkenyl group containing 1 to 12 carbon atoms and Y is a hydrogen, halogen, cyano, vinyl, phenyl, or ether moiety. Of this class of compounds, 1-methyl-3-propyl-imidazole-2-thione is preferred for immersion tin plating. This class of complexing agents is particularly useful in spray displacement tin plating for the manufacture of printed circuit boards wherein free tin metal is added to the plating solution.

Abstract: Improved through-hole plating of printed circuit boards, wherein the ratio of the printed circuit board thickness to the diameter of at least one through hole is greater than 3 to 1, is achieved by a high-throw acid copper plating bath of this invention. The high-throw acid copper plating bath comprises an aqeuous solution of (A) copper sulfate, (B) sulfuric acid, (C) chloride ion, e.g., hydrochloric acid, (D) a carrier, (E) a brightener, and (F) an alkali metal salt; wherein the plating bath has a pH of not greater than about 1, the concentration of the hydrochloric acid is from about 6.0.times.10.sup.-4 to about 1.8.times.10.sup.-3 moles/liter, and the mole ratio of copper sulfate:sulfuric acid is not greater than about 1:25. Unlike previous high-throw acid copper plating baths, the bath of this invention contains an alkali metal salt. The use of the alkali metal salt makes it possible to maintain a lower acid concentration resulting in easier maintenance and more consistent plating.

Abstract: For acid copper plating baths containing a brightener used to produce smooth copper coatings of high brilliancy, it has been found that the "break-in" period normally needed after a brightener is added to the plating bath, has been virtually eliminated by use of the brightener of this invention. This brightener consists essentially of a peroxide oxidation product of a dialkylamino-thioxomethyl-thioalkanesulfonic acid wherein each alkyl and alkane group individually contains 1 to 6 carbon atoms and wherein the peroxide oxidation of the dialkylamino-thioxomethyl-thioalkane-sulfonic acid is carried out in an acid, aqueous medium having a pH of not more than about 1. In an added embodiment of this invention the acid copper plating bath also contains hydrolysis products of the peroxide oxidation product of a dialkylamino-thioxomethyl-thioalkanesulfonic acid.