Patents Represented by Attorney Willliam D. Sabo
  • Patent number: 5043789
    Abstract: An improved insulating layer is formed by applying to a suitable substrate an organic solution, prepared by reacting an aminoalkoxysilane monomer, an arylalkoxysilane or arylsilazane monomer and water in a solvent, and then heating the coated substrate under conditions so as to evaporate the solvent and form a layer of cured ladder-type silsesquioxane copolymer. The insulating layer, which demonstrates excellent planarizing and thermal stability characteristics, is particularly useful in semiconductor device applications.
    Type: Grant
    Filed: March 15, 1990
    Date of Patent: August 27, 1991
    Assignee: International Business Machines Corporation
    Inventors: Harold G. Linde, Rosemary A. Previti-Kelly