Abstract: A method and system for providing a contact hole between structures for a semiconductor device is disclosed. The method and system comprises etching a resist material on the semiconductor device to expose a surface of the structures; providing an implant to the surface of the structures; and removing the resist material from a gap between the structures. The method and system includes annealing the semiconductor device to cause the implant to adhere to the treated surface; and providing dielectric material within the gap. Finally, the method and system includes etching the contact hole in the gap between the structures. The contact hole can then be etched without damaging the structures. Accordingly, by providing an implant treated surface and then providing an anneal process the implant is bonded to the appropriate portion of the semiconductor structure.
Abstract: In a first aspect of the present invention, a flash memory array is disclosed. The flash memory array comprises a substrate comprising active regions, wherein the active regions are defined by a layer of nitride, the layer of nitride including a top surface. The flash memory array further comprises shallow trenches in the substrate, each of the shallow trenches including a layer of oxide, the layer of oxide having a top surface, wherein the top surface of the layer of oxide and the top surface of the layer of nitride are on substantially the same plane and channel areas wherein the occurrences of polyl stringers in the channel areas is substantially reduced. In a second aspect of the present invention, a method and system for fabricating a flash memory array is disclosed. The method comprises the steps of providing a layer of nitride over a substrate, forming trenches in the substrate and then growing a layer of oxide in the trenches. Finally, the layer of oxide is polished back.
Type:
Grant
Filed:
May 2, 2000
Date of Patent:
August 26, 2003
Assignee:
Advanced Micro Devices, Inc.
Inventors:
Maria C. Chan, Hao Fang, Mark S. Chang, Mike Templeton
Abstract: A field dressing tool of the type for field dressing small game, is provided. The field dressing tool including: a pair of handles each having a first and second end, each handle forming a trough; a cutting blade connected to a first end of each of said handles, the cutting blades functionally interconnected by a pivot joint; a knife member having a first edge tapering to a point and a notch formed proximate the point on an edge opposite the first edge, the knife member pivotally connected to the second end of one of the handles and pivotable from a position disposed within a trough to a position extending from a handle; and a rake member pivotally connected to the second end of one of the handles, the rake being pivotable from a position disposed within a trough to a position extending from a handle.