Abstract: A liquid ejecting apparatus includes a nozzle for ejecting liquid and a sealing unit that seals the nozzle. The sealing unit moves between a sealing position for sealing the nozzle in a direction of movement and an off position. A slider guides the sealing unit to the sealing position by moving rectilinearly in one of two opposite directions. The slider guides the sealing unit to the off position by moving in the other of the two directions. A drive mechanism performs first and second movements for moving the slider in the one and the other directions, respectively by a drive force from a motor. A drive force transmitting unit transmits the drive force to the drive mechanism by rotating while engaging the drive mechanism. The drive force transmitting unit rotates in the same direction while transmitting the drive force as the drive mechanism performs the first and second movements.

Abstract: The present invention extends to methods, systems, and computer program products for partitioning modeling platform data. Embodiments of the invention facilitate partitioning modeling platform data into nested horizontal slices. Using nested horizontal slices makes the modeling platform data more manageable and permits modeling platform data to align with existing tools and processes. Schemas and tables can be used to partition modeling platform data vertically and folders can be used to partition modeling platform data horizontally. Thus, a user-interface can preset the intersection of folders and schemas/tables as navigable chunks of data compatible with existing tools and processes, such as, for example, software development tools.

Abstract: Inventive antireflective structures comprise a semiconductor substrate having thereon a combination of a plurality of layers that either that absorb reflected light or that dissipate reflected light into patterns and intensities that do not substantially alter photoresist material on the semiconductor substrate. The semiconductor substrate has formed thereon a feature having a width of less than about 0.25 microns. Antireflective structures contemplated include a first layer of polysilicon and first layer of silicon nitride material that is formed upon the first layer of polysilicon. The antireflective structure has the ability to scatter unabsorbed light into patterns and intensities that are substantially ineffective to alter photoresist material exposed to said patterns and intensities.