Patents Assigned to A-Tech Corporation
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Patent number: 11860142Abstract: A liquid chromatograph mass spectrometer specifying a location where a flow path is clogged and recovering in a short time. The liquid chromatograph mass spectrometer includes a first flow path passing through a separation column, a second flow path not passing through the separation column, a mass spectrometry unit on the downstream side of the first and second flow paths that analyzes a sample that has passed through the first flow path, a first valve for connecting any one of the first and second flow paths to the mass spectrometry unit, and a controller for controlling driving of the first valve connecting the first flow path to the mass spectrometric unit, comparing the measured value of the mass spectrometric unit with a predetermined threshold value, and connecting the second flow path to the mass spectrometry unit when it is determined to be abnormal.Type: GrantFiled: October 25, 2019Date of Patent: January 2, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Masuyuki Sugiyama, Yuichiro Hashimoto, Hideki Hasegawa
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Patent number: 11859600Abstract: A liquid feed pump which increases the liquid flow velocity in a stagnation area in the pressure chamber of a plunger pump, thereby improving the liquid replacement speed in the plunger pump. When the liquid in the liquid feed pump is replaced, a first plunger slides back and forth in the space between a lower limit point and an upper limit point, and the second plunger stops at least temporarily at a position near to the upper limit point or slides back and forth for a shorter distance than when the liquid feed pump usually feeds the liquid.Type: GrantFiled: December 3, 2019Date of Patent: January 2, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Nobuhiro Tsukada, Daisuke Akieda, Shinya Ito, Kenichiro Nishiki
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Patent number: 11860177Abstract: An analysis method of an automatic analyzer is provided. The automatic analyzer includes: an insertion unit into which a rack is inserted; a transport line that transports the rack; a detection unit that detects a rack identifier from a rack or an attribute from a sample container which accommodates therein a sample as an object to be examined and which is mounted on a rack; an analysis module that includes a light source and a spectrometer which measures a measurement value to analyze a sample; a rack standby unit in which a rack stands by; and, a rack recovery unit that recovers a rack. In the automatic analyzer, a rack stands by in the rack standby unit until a measurement result in the analysis module is output; and is then recovered to the rack recovery unit.Type: GrantFiled: July 7, 2020Date of Patent: January 2, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Satoshi Shibuya, Tsuguhiko Satou, Toshihide Hanawa
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Patent number: 11860094Abstract: An analysis system includes an analyzer configured to separate a sample including a plurality of components labeled with any of M kinds of fluorescent substances by chromatography and acquire first time-series data of fluorescence signals detected in N kinds (M>N) of wavelength bands in a state in which at least a part of the plurality of components is not completely separated; and a computer configured to compare the first time-series data with the second time-series data, and determine which kind of fluorescent substance of M kinds of fluorescent substances individually labels each of the plurality of components.Type: GrantFiled: February 20, 2017Date of Patent: January 2, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventor: Takashi Anazawa
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Patent number: 11863374Abstract: In a distributed control system, when the determination that an error has occurred is made as a result of comparison of correct connection information retained in a storage unit and connection information of an actually connected control object device or terminal communication device by a comparison unit, a central computation device outputs a display signal of an abnormal part to a display device, and the display device displays the abnormal part on the basis of the display signal. A distributed control system and an automatic analysis device provided with the same, and an automatic analysis system are thereby provided, whereby an erroneous connections or defects can be more easily and reliably detected than in the prior art, even when a plurality of control boards are distributedly arranged in the same device.Type: GrantFiled: May 27, 2019Date of Patent: January 2, 2024Assignee: HITACHI HIGH-TECH CORPORATIONInventor: Takafumi Hasegawa
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Publication number: 20230420215Abstract: A charged particle beam device for irradiating a sample arranged in a sample chamber to be observed with an electron beam includes: a plasma generation device to which a bias voltage is applicable to generate plasma containing charged particles for applying charges onto a side wall of a pattern of the sample; and a guide that guides the charged particles in the plasma generated by the plasma generation device to the pattern of the sample.Type: ApplicationFiled: June 5, 2023Publication date: December 28, 2023Applicant: Hitachi High-Tech CorporationInventors: Toshiyuki YOKOSUKA, Hideyuki KOTSUJI, Hajime KAWANO
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Publication number: 20230420238Abstract: An ion source includes: an atomizer configured to continuously introduce a liquid sample and atomize the liquid sample; a heating and mixing chamber configured to vaporize the atomized liquid sample; and a charge supply unit configured to ionize the vaporized liquid sample. The charge supply unit has a positive pressure with respect to the heating and mixing chamber. The vaporized liquid sample and a gaseous seed ion supplied from the charge supply unit are mixed in the heating and mixing chamber. An auxiliary gas for adjusting a gas flow rate in the heating and mixing chamber can be introduced into the heating and mixing chamber. The heating and mixing chamber has a chamber outlet configured to introduce the ionized liquid sample into a mass spectrometer. The chamber outlet is connected to a first pore of the mass spectrometer.Type: ApplicationFiled: December 6, 2021Publication date: December 28, 2023Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Yasushi TERUI, Kantarou MARUOKA
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Publication number: 20230417783Abstract: An automatic analyzer comprises a reagent storage unit, a reaction promotion unit, and an unused container providing unit. The reaction promotion unit is between the reagent storage unit and the unused container providing unit in a left-right direction, and is on a rear side from the reagent storage unit and the unused container providing unit in a front-rear direction. In the automatic analyzer, a cover covering the reaction promotion unit is with a first fitting portion, a second fitting portion, and a third fitting portion located between the first and the second fitting portion in the left-right direction and a handle that is between the first and the second fitting portion in the left-right direction and on a rear side of the third fitting portion in the front-rear direction. The first and the second fitting portion are high in positioning functionality. The third fitting portion is low in positioning functionality.Type: ApplicationFiled: November 8, 2021Publication date: December 28, 2023Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Shugo Okabe, Takenori Okusa
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Patent number: 11852599Abstract: Provided is an image processing system capable of estimating a three-dimensional shape of a semiconductor pattern or a particle by solving problems of measurement reduction in a height direction and taking an enormous amount of time at a time of acquiring learning data. The image processing system according to the disclosure stores a detectable range of a detector provided in a charged particle beam device in a storage device in advance, generates a simulated image of a three-dimensional shape pattern using the detectable range, and learns a relationship between the simulated image and the three-dimensional shape pattern in advance.Type: GrantFiled: July 22, 2021Date of Patent: December 26, 2023Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Nobuhiro Okai, Naomasa Suzuki, Muneyuki Fukuda
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Patent number: 11851642Abstract: The invention provides a technology for promptly determining bacterial identification or an antimicrobial susceptibility testing. In the invention, first, a state where the bacteria are divided is monitored by performing microscopic observation with respect to the shape or the number of bacteria in each of wells of a culture plate for bacterial identification culture or the antimicrobial susceptibility testing. In addition, the shape, the number or the area of the bacteria are interpreted from the image obtained by the microscopic observation whether or not the bacteria proliferate at a stage from an induction phase to a logarithmic phase, and the time-dependent changes thereof are made into a graph. From the graph, it is determined whether or not the bacteria proliferate for each measurement, the determination results are displayed on the screen, and accordingly, the result of the antimicrobial susceptibility is provided every time when the measurement is performed.Type: GrantFiled: September 2, 2020Date of Patent: December 26, 2023Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Chihiro Uematsu, Muneo Maeshima
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Patent number: 11851282Abstract: The invention provides a conveying device having a conveying performance higher than that of the related art, a sample analysis system and sample pretreatment device with the conveying device and a method for conveying a conveyance object. A conveying device 1 includes a permanent magnet 10 which is provided on a sample rack 111 side, magnetic poles 25 each of which includes a core 22 made of a second magnetic body and a winding 21 wound around an outer periphery of the core 22, drive circuits 50 each of which supplies a current to the winding 21 of the magnetic pole 25, and current command calculation units 55 each of which controls a value of the current to be supplied to the winding 21 from the drive circuit 50. The current command calculation unit 55 makes the currents to be supplied to the windings 21 vary.Type: GrantFiled: January 14, 2020Date of Patent: December 26, 2023Assignee: Hitachi High-Tech CorporationInventors: Yasuaki Aoyama, Ryosuke Hoshi, Hiroyuki Kobayashi, Satoru Kaneko, Takeshi Tamakoshi, Hiroshi Watanabe, Katsuhiro Kambara, Kuniaki Onizawa
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Patent number: 11855318Abstract: The present invention aims to provide a fuel battery system improved in reliability by accurately detecting when a fuel electrode gas or an air electrode gas has leaked. A fuel battery cell according to the present invention includes a first electrode, an electrolyte membrane, and a second electrode which are layered on a support substrate. Further, at least any one of the first electrode, the electrolyte membrane, and the second electrode is electrically isolated by an insulating member to form a first region and a second region. The insulating member is disposed at a position where the insulating member does not overlap with an opening portion of the support substrate (refer to FIG. 3).Type: GrantFiled: April 26, 2019Date of Patent: December 26, 2023Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Munenori Degawa, Noriyuki Sakuma, Yoshitaka Sasago, Aritoshi Sugimoto, Nobuyuki Mise, Takashi Tsutsumi
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Publication number: 20230408459Abstract: Provided is an autosampler of a liquid chromatograph that can manage a sample container even in a case where the throughput of a pretreatment unit exceeds the throughput of the autosampler. An autosampler of a liquid chromatograph includes a plurality of sample aspiration nozzles that aspirates a sample from sample containers installed at respective sample aspiration points; a sample transfer means that transfers the sample containers to the respective sample aspiration points; and a retraction point where one of the sample containers is put into the autosampler and one of the sample containers collected from the sample aspiration points can be held.Type: ApplicationFiled: December 8, 2021Publication date: December 21, 2023Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Daisuke Kanai, Yuichiro Hashimoto
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Publication number: 20230408535Abstract: An automatic analyzer includes: an analysis unit performing analysis of a sample; a thin waste fluid tank housing a waste fluid produced by a process of analyzing the sample; an attention attraction thin waste fluid height sensor detecting that the waste fluid has reached a predetermined reference amount, the waste fluid being housed in the thin waste fluid tank; a timer unit starting counting time when the attention attraction thin waste fluid height sensor detects that the waste fluid has reached the reference amount; and a control unit controlling operation of the analysis unit. The control unit determines, when an operator instructs starting analysis, whether to permit starting analysis by the analysis unit based on whether a count result obtained by the timer unit reaches predetermined reference time. Accordingly, it is possible to operate the analyzer while workflows are easily considered and unexpected measurement stops are avoided.Type: ApplicationFiled: August 27, 2021Publication date: December 21, 2023Applicant: Hitachi High-Tech CorporationInventors: Marina NAKAI, Shunsuke SASAKI, Takenori OKUSA, Hiroki FUJITA, Hiroyuki MISHIMA
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Publication number: 20230412684Abstract: A method of using voice commands from a mobile device to remotely access and control a computer. The method includes receiving audio data from the mobile device at the computer. The audio data is decoded into a command. A software program that the command was provided for is determined. At least one process is executed at the computer in response to the command. Output data is generated at the computer in response to executing at least one process at the computer. The output data is transmitted to the mobile device.Type: ApplicationFiled: August 28, 2023Publication date: December 21, 2023Applicant: Voice Tech CorporationInventor: Todd R. Smith
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Publication number: 20230411108Abstract: A charged particle beam device includes: a plasma generation device attached to a sample chamber through a connecting member; a guide including a hollow portion configured to guide a plasma generated by the plasma generation device in a direction toward a stage; a first voltage source configured to apply a voltage to the stage; and a second voltage source configured to adjust the plasma generation device and the guide to a predetermined potential, in which the guide is disposed to avoid an opening of an objective lens through which a charged particle beam passes and to position a tip of the guide between the objective lens and the stage.Type: ApplicationFiled: May 18, 2023Publication date: December 21, 2023Applicant: Hitachi High-Tech CorporationInventors: Hideyuki Kotsuji, Toshiyuki Yokosuka, Hajime Kawano
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Patent number: 11848171Abstract: Provided is a charged particle beam device and a charged particle beam device calibration method capable of correcting an influence of characteristic variation and noise with high accuracy. Control units execute a first calibration of correcting a characteristic variation between a plurality of channels in detectors and signal processing circuits by using a setting value of a control parameter for each of the plurality of channels in a state in which a primary electron beam is not emitted. The control units further execute a second calibration of correcting a characteristic variation between the plurality of channels in scintillators or the like by using the setting value of the control parameter for each of the plurality of channels in a state in which the primary electron beam is emitted.Type: GrantFiled: January 28, 2022Date of Patent: December 19, 2023Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Akio Yamamoto, Wen Li, Hiroshi Oinuma, Shunsuke Mizutani
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Patent number: 11846736Abstract: The purpose of the present invention is to provide a scintillator for a charged particle beam device and a charged particle beam device which achieve both an increase in emission intensity and a reduction in afterglow intensity. This scintillator for a charged particle beam device is characterized by comprising a substrate (13), a buffer layer (14) formed on a surface of the substrate (13), a stack (12) of a light emitting layer (15) and a barrier layer (16) formed on a surface of the buffer layer (14), and a conductive layer (17) formed on a surface of the stack (12) and by being configured such that the light emitting layer (15) contains InGaN, the barrier layer (16) contains GaN, and the ratio b/a of the thickness b of the barrier layer (16) to the thickness a of the light emitting layer (15) is 11 to 25.Type: GrantFiled: July 10, 2019Date of Patent: December 19, 2023Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Eri Takahashi, Shin Imamura, Makoto Suzuki, Shunsuke Mizutani
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Publication number: 20230402249Abstract: A defect inspection apparatus includes: a feature value calculation unit calculating a feature value based on a captured image of a sample; an image information reduction unit generating a latent variable by reducing an information quantity of the feature value; a statistic value estimation unit estimating an image statistic value that can be taken by a normal image based on the latent variable; and a defect detection unit detecting a defect in an inspection image based on the image statistic value and the inspection image of the sample.Type: ApplicationFiled: May 16, 2023Publication date: December 14, 2023Applicant: Hitachi High-Tech CorporationInventors: Yasuhiro YOSHIDA, Masayoshi Ishikawa, Toshinori Yamauchi, Kosuke Fukuda, Hiroyuki Shindo
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Patent number: D1008986Type: GrantFiled: October 25, 2021Date of Patent: December 26, 2023Assignee: Hitachi High-Tech CorporationInventors: Yusuke Nakatani, Kazuumi Tanaka, Masahiro Yamaoka, Yasushi Sonoda, Taku Iwase