Patents Assigned to Aalo LSI Design & Device Technology, Inc.
  • Patent number: 6255166
    Abstract: Provided in the present invention are a high speed and low program voltage nonvolatile memory cell, a programming method for same and a nonvolatile memory array. A nonvolatile memory cell comprises a first gate insulator formed on a surface of a first channel forming semiconductor region adjacent to a source region; a second gate insulator formed on a surface of a second channel forming semiconductor region adjacent to a drain region; a first gate electrode formed on said first gate insulator; and a second gate electrode formed on said second gate insulator wherein the second gate insulator includes a first layer forming a potential barrier at the interface with the second channel forming region; a third layer forming a potential barrier at the interface with the second gate electrode and the second layer between the first and third layers forming a carrier trapping level.
    Type: Grant
    Filed: December 28, 1999
    Date of Patent: July 3, 2001
    Assignee: Aalo LSI Design & Device Technology, Inc.
    Inventors: Seiki Ogura, Yutaka Hayashi