Abstract: In one embodiment, an optical element includes a first semi-transparent semi-reflective layer and a second semi-transparent semi-reflective layer. The optical element includes a first transparent material having a first refractive index and disposed between the first semi-transparent semi-reflective layer and the second semi-transparent semi-reflective layer. The optical element includes a second transparent material having a second refractive index, disposed between the first semi-transparent semi-reflective layer and the second semi-transparent semi-reflective layer, and surrounding the first transparent material in a plane parallel to the first semi-transparent semi-reflective layer and the second semi-transparent semi-reflective layer. The first refractive index is higher than the second refractive index.

Abstract: Provided is a composition for resist patterning comprising a thiol; at least one -ene monomer; at least one polymerization initiator; and, optionally, a metal oxide used in an amount of 0.1 to 50 wt. % per weight of the composition; the thiol and -ene monomer are used in a stoichiometric ratio with a refractive index between 1.6 and 1.8. The composition is used in a patterning process wherein the composition is dispensed to the substrate, is covered with a mask, and is cured, e.g., by UV radiation, at room temperature with light having a wavelength in the range of 200 nm to 450 nm. The process may be carried out with thermal annealing.