Abstract: A microwave plasma generating apparatus provided with a plurality of microwave plasma generating devices provided with a tubular container made of a dielectric material, a tubular chamber arranged to cover the tubular container, a gas supply port provided to an end of the tubular container, and a microwave introduction port provided at a side of the tubular chamber, has at another end of the tubular container a metallic tube that emits reactive gas generated by a reaction between the gas and the plasma, and is characterized in that an inner diameter of the metallic tube is equal to or larger than 0.1 mm and is equal to or smaller than a half of a wavelength of microwave to be used, and a ratio L2/R2 of an axial direction length L2 to the inner diameter R2 of the metallic tube is equal to or larger than 0.5.

Abstract: An object is to provide a manufacturing method of an insulation film in which no heating at high temperature is necessary. The manufacturing method of the insulation film includes a deposition process, a heating process and an exposure process. In the deposition process, a material is deposited on a substrate 11. In the heating process, the substrate 11 is heated at a temperature equal to or higher than 85° C. to equal to or lower than 450° C. In the exposure process, by irradiating a surface SA2 of a deposition material layer 12 on the substrate 11 with a plasma 82 containing hydrogen radicals, hydrogen is made to diffuse into the structure of the deposition material layer 12 and bind with components of the deposition material layer 12. A product of an irradiation time and a density of the radicals formed by the plasma 82 is equal to or higher than 25×1014 min·pcs/cm3.