Abstract: There is provided a gasket comprising a sealing portion and a deformation stopper portion. When the gasket is placed between adjacent surfaces to be sealed of two objects, the sealing portion is engaged by the adjacent surfaces. The deformation stopper portion is engaged by the adjacent surfaces of the objects when the sealing portion has been deformed by a predetermined amount by the adjacent surfaces, thereby preventing excessive deformation of the sealing portion.
Abstract: A polishing pad for use in chemical mechanical polishing is formed of silicone rubber. An abrasive fine inorganic powder and a reinforcing fine silica powder are dispersed in the silicone rubber, and the inorganic powder has a particle size of 0.01-100 &mgr;m and is contained in the amount of 10-85 wt.% of the silicone rubber.