Patents Assigned to ACM Reasearch (Shanghai) Inc.
  • METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFER
    Publication number: 20150332940
    Abstract: A method and apparatus (100) for cleaning semiconductor wafer are provided, combining batch cleaning and single wafer cleaning together.
    Type: Application
    Filed: November 28, 2012
    Publication date: November 19, 2015
    Applicant: ACM Reasearch (Shanghai) Inc.
    Inventors: Hui Wang, Fuping Chen, Liangzhi Xie, Shena Jia, Xi Wang, Xiaoyan Zhang