Patents Assigned to Actinix
  • Patent number: 7042577
    Abstract: We disclose several instrument architectures for the measurement of arbitrary phase retardation on advanced lithography photomasks. These architectures combine traditional interferometric techniques with high-magnification UV microscopy. Features are interrogated using a multitude of phase probes, formed by a imaging a number of variable apertures back-illuminated by phase-coherent beams, onto the surface of the photomask with a given demagnification. The size, spacing, and orientation of the phase probes may be adjusted to suit photomask feature geometries. Means are provided to vary the relative optical phase between the phase probes. These phase probes both reflect from and transmit through the photomask; the stationary, non-localized interference fringes, formed in the regions of phase probe electric field overlap, contain information on the optical path difference between the two probes.
    Type: Grant
    Filed: July 15, 2003
    Date of Patent: May 9, 2006
    Assignee: ACTINIX
    Inventors: James Jeffery Jacob, Andrew John Merriam
  • Patent number: 6958854
    Abstract: A method and apparatus for high-efficiency stimulated Raman Stokes and anti-Stokes scattering is described. A dual-Raman scattering cell configuration is disclosed. A variable pressure of the first Raman cell causes a controllable pressure shift of the Raman-active two-photon transition. The frequency-shifted Stokes radiation generated in the first Raman cell, along with the residual pump laser radiation, is applied to a second Raman cell whose pressure is adjusted to maximize production of the anti-Stokes sidebands. By the steps of applying the first Stokes sideband “injection” signal, and controlling its frequency via the pressure difference of the two Raman cells, and its intensity by appropriate focussing, the process of Raman scattering may be significantly enhanced over the techniques of the prior art. These techniques are of especial interest to the production of intense, coherent, short-wavelength radiation, especially when only a single pump laser frequency is available.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: October 25, 2005
    Assignee: Actinix
    Inventor: Andrew John Merriam
  • Patent number: 6525868
    Abstract: A nonlinear optical mixer produces coherent vacuum ultraviolet radiation. A cell contains a gas mixture of xenon and a phase-matching gas. A pump laser beam selectively excites the two-photon transition in the xenon gas. A mixing laser beam is also directed towards the gas mixture. Coherent vacuum ultraviolet radiation is produced by four wave mixing of the pump and mixing laser beams. The phase-matching gas, for example mercury vapor, is used to achieve phase matching of the four wave mixing. The coherent vacuum ultraviolet radiation preferably has a wavelength of approximately 157.6 nm (the molecular fluorine line) or 121.6 nm (the Lyman-&agr; hydrogen line). In a preferred embodiment, the two laser beams are loosely-focused.
    Type: Grant
    Filed: June 20, 2001
    Date of Patent: February 25, 2003
    Assignee: Actinix
    Inventors: Andrew J. Merriam, James J. Jacob
  • Patent number: 6373869
    Abstract: An optical system for producing ultraviolet radiation includes an optical source, an optical parametric oscillator (OPO), a frequency doubler, and a mixer. The optical source produces a first beam of radiation. The OPO receives a first portion of the first beam of radiation and produces a second beam of radiation therefrom. The frequency doubler receives a second portion of the first beam of radiation and produces the second harmonic thereof. The mixer mixes the second beam of radiation and the second harmonic of the first beam of radiation to produce an ultraviolet beam of radiation. In a preferred embodiment, the optical source includes a Nd:YAG laser which is frequency doubled to produce a first beam of radiation at a wavelength of approximately 532 nm; and the ultraviolet beam of radiation has a wavelength close to one of the excimer laser lines, typically either 193 nm or 157 nm.
    Type: Grant
    Filed: July 29, 1999
    Date of Patent: April 16, 2002
    Assignee: Actinix
    Inventor: James J. Jacob