Patents Assigned to Adanced Technology Materials, Inc.
  • Patent number: 6833024
    Abstract: Apparatus and method for abatement of effluent from multi-component metal oxides deposited by CVD processes using metal source reagent liquid solutions which comprise at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex and a suitable solvent medium for that metal coordination complex e.g., a metalorganic chemical vapor deposition (MOCVD) process for forming barium strontium titanate (BST) thin films on substrates. The effluent is sorptively treated to remove precursor species and MOCVD process by-products from the effluent. An endpoint detector such as a quartz microbalance detector may be employed to detect incipient breakthrough conditions in the sorptive treatment unit.
    Type: Grant
    Filed: October 23, 2002
    Date of Patent: December 21, 2004
    Assignee: Adanced Technology Materials, Inc.
    Inventors: Mark Holst, Rebecca Faller, Glenn Tom, Jose Arno, Ray Dubois