Abstract: Systems, apparatuses, and methods for performing hybrid anti-aliasing operations are disclosed. The hybrid anti-aliasing resolve operation combines multi-sampling anti-aliasing (MSAA) and post-processing anti-aliasing to generate higher-quality images in a computationally efficient manner. In one embodiment, a processor detects a request to perform an anti-aliasing resolve operation on an image stored in the memory. Responsive to detecting the request, the processor expands dimensions of the image and then filters the image with a post-processing anti-aliasing filter. After filtering the image, the processor performs an averaging of the image which becomes the result of the anti-aliasing resolve operation. Expanding dimensions of the image involves converting sub-pixels of the image into regular pixels. The processor can also rotate the image to align the sub-pixels into a vertical and horizontal grid pattern prior to filtering the image.

Abstract: A method of decoding Huffman-encoded data may comprise receiving a symbol associated with the Huffman encoded data, selecting a target group for the symbol based on a bit length value associated with the symbol, associating the symbol with the target group, associating the symbol with a code, and incrementing a starting code for each of a plurality of groups associated with a starting code that is equal to or greater than the starting code of the target group.

Abstract: Two clock domains of a data processing device are each synchronized with a different clock signal. The clock signals are generated by clock generation logic. The clock generation logic also generates a transfer enable signal based on the relative frequency of each clock signal to indicate when data can be transferred between the clock domains. Further, as the relative frequency of the clock signals change, the timing of the transfer enable signal also changes to ensure reliable data transfer.

Abstract: A method is provided, the method comprising processing a workpiece, having a photolithography overlay target structure disposed thereon, using a chemical-mechanical planarization (CMP) tool and measuring a photolithography overlay parameter using the photolithography overlay target structure. The method also comprises forming an output signal corresponding to the photolithography overlay parameter measured and to the chemical-mechanical planarization (CMP) tool used and using the output signal to improve at least one of accuracy in photolithography overlay metrology and fault detection in chemical-mechanical planarization (CMP).