Abstract: A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.
Type:
Application
Filed:
November 22, 2002
Publication date:
April 17, 2003
Applicant:
ADE Optical Systems Corporation, a Massachusetts corporation
Inventors:
Michael E. Fossey, John C. Stover, Lee D. Clementi
Abstract: A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.
Type:
Application
Filed:
July 17, 2001
Publication date:
December 6, 2001
Applicant:
ADE Optical Systems Corporation, a Massachusetts corporation
Inventors:
Michael E. Fossey, John C. Stover, Lee D. Clementi