Patents Assigned to Adeka Corporation
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Publication number: 20240128461Abstract: Provided is a conductive undercoating agent, including: a conductive carbon material; a binding agent; and a solvent, wherein the conductive carbon material is flaked graphite having an average thickness of from 10 nm to 200 nm and a specific surface area of from 10 m2/g to 40 m2/g.Type: ApplicationFiled: February 22, 2022Publication date: April 18, 2024Applicant: ADEKA CORPORATIONInventors: Kenji KAKIAGE, Ryo TANIUCHI, Ryo MACHIDA, Yohei AOYAMA, Toru YANO
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Publication number: 20240117081Abstract: A polymerizable composition includes a water-soluble monofunctional acrylamide compound, a water-soluble photoradical initiator, a water-soluble photosensitizer, and an aqueous solvent.Type: ApplicationFiled: November 10, 2020Publication date: April 11, 2024Applicant: ADEKA CORPORATIONInventors: Kenji HARA, Kazuteru NAGASAKA, Masatomi IRISAWA, Yuji ODA
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Patent number: 11955637Abstract: To provide an electrode for non-aqueous electrolyte batteries, which traps hydrogen sulfide gas, generated from the inside thereof for some reason, in the electrode, and suppresses the outflow of hydrogen sulfide gas to the outside of the battery. An electrode for lithium ion batteries includes a coating material which contains a silanol group and is present on at least a surface of an active material layer. The active material layer contains a sulfur-based material and a resin-based binder. The sulfur-based material is an active material capable of alloying with lithium metal or an active material capable of occluding lithium ions. The coating material containing the silanol group is a silicate having a siloxane bond or a silica fine particle aggregate having a siloxane bond as a component.Type: GrantFiled: November 22, 2019Date of Patent: April 9, 2024Assignees: ATTACCATO LIMITED LIABILITY COMPANY, ADEKA CORPORATIONInventors: Takashi Mukai, Naoto Yamashita, Yuta Ikeuchi, Taichi Sakamoto, Kenji Kakiage, Hiroyuki Osada, Yohei Aoyama
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Patent number: 11918668Abstract: The present invention provides a method for producing a glyceryl ether-containing composition, the method including: a deodorization step for bringing a glyceryl ether-containing product selected from the group consisting of a monohexyl glyceryl ether-containing product, a monocyclohexyl glyceryl ether-containing product and a mixture thereof into contact with water vapor in an environment having a reduced pressure of 0.10 kPa or more and 10 kPa or less for 60 minutes or more and 600 minutes or less; and an addition step for adding 0.05 to 0.30 parts by mass of an antioxidant containing d-?-tocopherol to 100 parts by mass of the glyceryl ether-containing product, and also provides a glyceryl ether-containing composition containing specific amounts of a specific glyceryl ether and an antioxidant containing d-?-tocopherol.Type: GrantFiled: September 20, 2019Date of Patent: March 5, 2024Assignee: ADEKA CORPORATIONInventors: Yasuhiro Tsushima, Hiroshi Suzuki, Kazuya Nakajima
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Publication number: 20240067663Abstract: An yttrium compound, a method of manufacturing an integrated circuit device, and a raw material for forming an yttrium-containing film, the yttrium compound being represented by the following General formula (1):Type: ApplicationFiled: August 8, 2023Publication date: February 29, 2024Applicant: ADEKA CORPORATIONInventors: Hyunwoo KIM, Kazuki HARANO, Kiyoshi MURATA, Haruyoshi SATO, Seungmin RYU, Gyuhee PARK, Younjoung CHO, Atsushi YAMASHITA
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Publication number: 20240060177Abstract: Provided is an indium compound, which is represented by the following general formula (1): where R1 and R2 each independently represent, for example, an unsubstituted alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and A represents a group represented by the following general formula (L-1) or (L-2): where R11, R12, R13, R14, R21 and R22 each independently represent, for example, a hydrogen atom or an unsubstituted alkyl group having 1 to 5 carbon atoms, and represents a bonding position with C in the general formula (1).Type: ApplicationFiled: November 30, 2021Publication date: February 22, 2024Applicant: ADEKA CORPORATIONInventors: Keisuke TAKEDA, Masaki ENZU
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Patent number: 11905388Abstract: The present invention provides a resin composition that contains copper particles and a particular resin and that is capable of producing a cured product having a low volume resistance value, and a cured product obtained by curing the resin composition. The resin composition contains (A) copper particles having an average particle diameter of 0.1 to 20 ?m, (B) a phosphoric acid-modified epoxy resin obtained by reacting a phosphoric acid (b1) with an epoxy compound (b2), and (C) a curing agent, wherein the content of the component (B) and the content of the component (C), based on 100 parts by mass of the total amount of the components (A) to (C), are 0.1 to 30 parts by mass and 0.1 to 5 parts by mass, respectively. Further, the cured product is obtained by curing the resin composition.Type: GrantFiled: August 11, 2020Date of Patent: February 20, 2024Assignee: ADEKA CORPORATIONInventors: Yusuke Nuida, Hitoshi Hosokawa, Hiroshi Morita
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Patent number: 11905404Abstract: Provided is a resin composition that is capable of producing a cured product having excellent environmental suitability, high strength, and excellent flame retardancy, and that is suitably usable as a matrix resin for fiber-reinforced plastics. A resin composition contains (A) an epoxy resin, (B) a cyanate resin, (C) an aromatic amine curing agent that is liquid at 25° C., and (D) a phosphorus-containing compound represented by formula (1). Preferably, in formula (1), R1 and R2 each independently represent an alkyl group or an aryl group, and X and Y are an oxygen atom.Type: GrantFiled: June 27, 2019Date of Patent: February 20, 2024Assignee: ADEKA CORPORATIONInventors: Masato Inadome, Naohiro Fujita, Kazuhide Morino, Chihiro Asakura
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Publication number: 20240043655Abstract: According to an additive composition which contains: (A) an aromatic phosphate sodium salt represented by the following Formula (1), where R1 to R5 each independently represent a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; (B) a fatty acid sodium salt; and (C) talc, and in which a mass ratio (B)/(A) of the content of the component (B) with respect to the content of the component (A) is 0.1 to 3 and a mass ratio (C)/[(A)+(B)+(C)] of the content of the component (C) with respect to a total content of the components (A), (B), and (C) is 0.2 to 0.8, for example, an additive composition which has excellent powder flowability and can impart excellent mechanical properties and excellent color tone to a molded article can be provided.Type: ApplicationFiled: July 29, 2021Publication date: February 8, 2024Applicant: ADEKA CORPORATIONInventors: Yuhei HATTORI, Takuya FUKUDA, Akitomo SATO
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Patent number: 11884809Abstract: Disclosed is an acrylic resin composition that has excellent weather resistance and can be stably produced at high temperatures. Specifically, disclosed is an acrylic resin composition including, with respect to 100 parts by mass of an acrylic resin, from 0.1 to 8 parts by mass of a triazine-based UV absorber including 2-(4,6-diphenyl-1,3,5-triazin-2-yl)-5-[2-(2-ethylhexanoyloxy)ethoxy]phenol, wherein the acrylic resin used is an acrylic resin including at least 80 wt % of methyl methacrylate as a monomer component, and having a glass transition temperature of at least 80° C.Type: GrantFiled: July 24, 2018Date of Patent: January 30, 2024Assignee: ADEKA CORPORATIONInventors: Naoto Ueda, Kazukiyo Nomura
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Publication number: 20240026224Abstract: Provided are: a flame retardant agent composition which has excellent flame retardancy as well as an excellent balance of dust suppression and powder flowability; a flame-retardant resin composition containing the same; and a molded article thereof. The flame retardant agent composition contains at least one phosphate compound represented by Formula (1) or (2). When the loose bulk density of the flame retardant agent composition is defined as d (g/cm3), and the 10% cumulative particle size and the 50% cumulative particle size of the flame retardant agent composition in a volume-based particle size distribution are defined as D10 (?m) and D50 (?m), respectively, d, D10 (?m), and D50 (?m) satisfy 0.030?d/(D50?D10)?0.110.Type: ApplicationFiled: December 15, 2021Publication date: January 25, 2024Applicant: ADEKA CORPORATIONInventors: Kei ASAI, Michio NAKAMURA, Genta KOKURA
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Publication number: 20240018655Abstract: Provided is a method of producing a thin-film containing a hafnium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a hafnium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 300° C. or more and less than 450° C. to form the thin-film containing a hafnium atom on the surface of the substrate: wherein R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and R3 and R4 each independently represent an alkyl group having 1 to 3 carbon atoms.Type: ApplicationFiled: November 16, 2021Publication date: January 18, 2024Applicant: ADEKA CORPORATIONInventors: Akihiro NISHIDA, Masako HATASE, Tomoharu YOSHINO, Yoshiki OOE, Chiaki MITSUI
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Publication number: 20240018654Abstract: Provided is a method of producing a thin-film containing a zirconium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a zirconium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 240° C. or more and 450° C. or less to form the thin-film containing a zirconium atom on the surface of the substrate: wherein R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and R3 and R4 each independently represent an alkyl group having 1 to 3 carbon atoms, provided that a zirconium compound in which both of R1 and R2 represent hydrogen atoms is excluded.Type: ApplicationFiled: November 16, 2021Publication date: January 18, 2024Applicant: ADEKA CORPORATIONInventors: Akihiro NISHIDA, Masako HATASE, Tomoharu YOSHINO, Yoshiki OOE, Chiaki MITSUI
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Publication number: 20240010815Abstract: Provided are a crystallization inhibitor for polyolefin resins, a polyolefin resin composition, a molded article, a method of producing a polyolefin resin composition, and a method of inhibiting the crystallization of polyolefin resins, which are capable of sufficiently inhibiting the crystallization of polyolefin resins. The crystallization inhibitor for polyolefin resins includes a nucleating agent for polyolefin resins (A) and a lubricant (B). The nucleating agent for polyolefin resins (A) includes an acetal compound (A-1) represented by general formula (1), and the lubricant (B) includes at least one selected from the group consisting of a fatty acid ester (B-1) and a fatty acid amide (B-2). In general formula (1), R1 represents a hydrogen atom, etc.; R2, R3, R4, and R5 each independently represent a hydrogen atom, etc., or a C3-C6 alkylene group, etc. with R2 and R3 or R4 and R5 linked to each other; and X represents a single bond, a —CH(OH)— group, or a —CH(OH)CH(OH)— group.Type: ApplicationFiled: November 25, 2021Publication date: January 11, 2024Applicant: ADEKA CORPORATIONInventors: Atsuo TADA, Naoto UEDA
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Publication number: 20240010763Abstract: A polyolefin-based resin composition of the present invention contains a polyolefin-based resin (A) and a light stabilizer (B), in which the light stabilizer (B) includes a predetermined hindered amine compound (B-1) and a predetermined phenol-based antioxidant (B-2), where the polyolefin-based resin composition is composed such that a value of the brightness increase ratio [L* (2,040 h)?L* (0 h)]/L* (0 h) before and after the weather resistance test is ?0.05 or more and less than 0.1.Type: ApplicationFiled: October 8, 2021Publication date: January 11, 2024Applicant: ADEKA CORPORATIONInventors: Kenji YAMASHITA, Tomohiro HIDANO, Marina UEDA, Takashi AYABE
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Publication number: 20240002635Abstract: A polyolefin-based resin composition of the present invention contains a polyolefin-based resin (A) and a light stabilizer (B), in which the light stabilizer (B) includes a predetermined hindered amine compound (B-1) and a predetermined phenol-based antioxidant (B-2).Type: ApplicationFiled: October 8, 2021Publication date: January 4, 2024Applicant: ADEKA CORPORATIONInventors: Kenji YAMASHITA, Tomohiro HIDANO, Marina UEDA, Takashi AYABE
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Patent number: 11840617Abstract: Provided are: a stabilizer composition capable of imparting a vinyl chloride resin with excellent thermal stability, coloration resistance, and thermal coloration resistance; a vinyl chloride resin composition containing the same and a molded article of the composition. The stabilizer composition contains, with respect to 100 parts by mass of a component (A): 5 to 700 parts by mass of a component (B) and 5 to 200 parts by mass of a component (C). The component (A) is at least one organic acid zinc salt, the component (B) is at least one selected from the group consisting of organic acid barium salts, overbased barium carbonates, organic acid calcium salts and overbased calcium carbonates, and the component (C) is at least one hindered amine-based light stabilizer.Type: GrantFiled: January 30, 2019Date of Patent: December 12, 2023Assignee: ADEKA CORPORATIONInventors: Ryusuke Mitamura, Hiroshi Nishimura, Kazumasa Tanaka
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Publication number: 20230383037Abstract: The object of the present invention is to provide an absorption enhancer capable of introducing high-molecular weight compounds into cells. The object can be solved by a composition of the present invention comprising a polymer compound having a group represented by the following general formula (1) or the following general formula (2) at a side chain, and a compound to be administered with a molecular weight of 1,000 to 1,200,000. wherein X1 is a residue of neutral amino acid or ?-aminoalkanoic acid in which an end amino group and an end carboxyl group are removed, X2 is a residue of cell-penetrating peptide in which an end amino group and an end carboxyl group are removed, X3 is a hydroxyl group, an amino group, an alkoxyl group having 1 to 4 carbon atoms or a benzyloxy group, a is an integer of 0 to 50, and * denotes a bonding site.Type: ApplicationFiled: October 11, 2021Publication date: November 30, 2023Applicants: JOSHO GAKUEN EDUCATIONAL FOUNDATION, ADEKA CORPORATIONInventors: Shinji SAKUMA, Takumi TOMONO, Kohei MIYATA, Koichi SHIGENO
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Publication number: 20230374267Abstract: A light stabilizer masterbatch contains a polypropylene-based resin (A) and a light stabilizer (B), where the light stabilizer masterbatch is composed such that the light stabilizer (B) includes a hindered amine compound (B-1) including one or two or more predetermined compounds and includes a predetermined phenol-based antioxidant (B-2), the content of the light stabilizer (B) with respect to 100 parts by mass of the polypropylene-based resin (A) is more than 10 parts by mass.Type: ApplicationFiled: October 8, 2021Publication date: November 23, 2023Applicant: ADEKA CORPORATIONInventors: Kenji YAMASHITA, Tomohiro HIDANO, Marina UEDA, Takashi AYABE
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Publication number: 20230369039Abstract: A method of manufacturing a semiconductor device is provided. The method includes providing a first layer having a first surface and a second layer having a second surface orthogonal to the first surface in a vertical direction, forming an inhibitor layer conformally on the first surface and the second surface, exposing the second surface by selectively removing the inhibitor layer on the second surface among the first surface and the second surface, the exposing of the second surface may include selectively removing an edge portion of the inhibitor layer on the first surface, the edge portion contacting the second surface, and forming an interest layer on the exposed second surface.Type: ApplicationFiled: May 10, 2023Publication date: November 16, 2023Applicants: Samsung Electronics Co., Ltd., ADEKA CORPORATIONInventors: Eunhyea KO, Daihyun Kim, Thanh Cuong Nguyen, Soyoung Lee, Jihyun Lee, Hoon Han, Byungkeun Hwang, Hiroyuki Uchiuzou, Kiyoshi Murata, Tomoharu Yoshino, Youjoung Cho