Abstract: A programmable metallization cell voltage reference is disclosed. The voltage reference can be taken from the anode to ground, from the cathode to ground, or differentially across the programmable metallization cell device.
Abstract: A circuit for writing, reading, and erasing a programmable device is disclosed. The programmable device includes an ion conductor and a plurality of electrodes. Electrical properties of the device are altered by applying a sufficient bias across the electrode to form a conductive region within the ion conductor. The circuit can be used to program and read multiple bits within a single programmable device.
Abstract: Circuits for writing, reading, and erasing a programmable metallization cell are disclosed. The programming circuits compensate for parasitic capacitance and/or parasitic resistance. The parasitic resistance and/or capacitance is compensated for using a feedback loop or a time current filter. Various circuits also measure a switching speed of the programmable metallization cell.
Abstract: A circuit for writing, reading, and erasing a programmable device is disclosed. The programmable device includes an ion conductor and a plurality of electrodes. Electrical properties of the device are altered by applying a sufficient bias across the electrode to form a conductive region within the ion conductor. The circuit can be used to program and read multiple bits within a single programmable device.
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