Abstract: The invention relates to a device for measuring and processing an input signal (To) of at least two decades, comprising: an electron multiplier (4) that has an exponential gain on the basis of the power supply voltage (Vm) thereof and which receives said input signal (To); a power supply (5) that provides the power supply voltage (Vm) of said multiplier (4); a control circuit (6) of the power supply (5), the gain (10) and shift (11) parameters of which are adjustable and define an output signal range while varying the exponential gain of said multiplier (4); a logarithmic compression amplifier (T), the output of which is received as an input of the control circuit (6) so as to vary the exponential gain of the electron multiplier (4), in a continuous manner over the dynamic range of a measurement, on the basis of the output signal (IoG) of the electron multiplier (4), and forming the output signal (Vout) of said device; a measuring and calculating means for predetermining the value of the exponent (b) for the

Abstract: The object of the present invention is a device for depolluting a non-sealed, confined environment (1) having a natural leakage (6) and including an interior space (9) bounded by a wall (7), comprising a depollution enclosure (11, 30) means (32, 42) for pumping gas and means (33, 43) for introducing gas. The depollution enclosure (11, 30) has at least two chambers (12, 13; 31, 41) separated by a sealing wall (14, 49). A first chamber (12, 31) is constituted by the part of the enclosure that is situated is contact with the wall (7) of the non-sealed, confined environment (1) and cooperates with first means for pumping (42) and first means for introducing gas (43), and a second chamber (13, 41) is constituted by the part of the enclosure which is situated in contact wife the natural leakage (6) from the non-sealed, confined environment (1) and cooperates with second means for pumping (42) and second means for introducing gas (43).

Abstract: A treatment device for transport and storage boxes according to the invention comprises a plurality of decontamination modules (24-27) supported by a common chassis (100) and arranged in a row of at least one column (23c) of modules superposed one on top of the other. Each decontamination module (24-27) comprises its own pumping means (6) having at least a primary pump (8a) housed in a primary pumping compartment (8c) that is longitudinally offset from the decontamination chamber (5). Access to the decontamination modules (24-27) is had via side access doors which are all oriented on one and the same access side and which are acted upon by actuating means that automatically close and open them. A lateral transfer zone is provided on the access side, and comprises a robot (29) capable of moving the transport and storage boxes between a frontal loading-unloading station (23a) and the decontamination chambers (5) of each of the decontamination modules (24-27).

Abstract: An object of the present invention is a photomask drying device which includes: a sealed chamber containing at least one photomask, a pumping unit to set up and maintain vacuum within said chamber, a support for the photomask placed within said chamber, infrared radiation means placed within said chamber, a system for injecting gas into said chamber characterized in that the infrared radiation means comprise a plurality of infrared radiation sources distributed in a plane parallel to the plane of the photomask in such a way that the distance from the photomask to the infrared radiation means is given by the relationship: D=1.

Abstract: A device for controlling the dehydration operation during a freeze-drying treatment comprises a freeze-drying chamber (1) connected to a vacuum line, and a gas analyzer, for analyzing the gases contained in the chamber. The gas analyzer comprises a gas ionization system (8) comprising a plasma source (13) in contact with the gases, which plasma source is combined with a generator (15) capable of generating a plasma from said gases, and a system for analyzing the ionized gases, comprising a radiation sensor (17) located close to the plasma generation zone and connected to an apparatus (18) for analyzing the change in the radiative spectrum emitted by the plasma. According to the invention, the device includes a means (16) for repeatedly turning the plasma source (13) on and off. The device may further include an optical port (25) placed between the gas ionization system (8) and the freeze-drying chamber (1).

Abstract: The leak detection device using hydrogen as a tracer gas is intended to be connected to an object to be tested. The leak detection device includes a hydrogen sensor placed in a low-pressure enclosure and includes a diode, a resistor, a MOS-type transistor whose gate is covered with a palladium catalyst, a pump connected to the low-pressure enclosure, a pressure gauge configured to measure the pressure in a vacuum line formed by the low-pressure enclosure connected to the pump, and a multiway valve having a first port allowing admission of the gas flow containing the tracer gas into the vacuum line, and a second port allowing the admission of neutral gas. The method makes it possible to stabilize the pressure of the vacuum line in order to avoid fluctuations in the hydrogen measurements.

Abstract: The invention relates to a method for monitoring a leak detector comprising: a secondary vacuum pump designed to be connected to a primary vacuum pump, the secondary vacuum pump comprising a motor, a rotor and a stator, the said rotor being capable of being rotated in the stator by the motor when the motor is powered, and at least one information means capable of being powered electrically, in order to inform a user of the operating state of the leak detector, characterized in that, in the event of the motor power supply being cut off, the kinetic energy of rotation of the secondary vacuum pump rotor in the form of electrical power (101) is recovered in order to power the information means (102). The invention also relates to a leak detector (1) using the said monitoring method.

Abstract: A device for handling substrates within a semiconductor manufacturing plant having substrate processing equipments, substrate storage means, substrate transport means, and a manufacturing execution system (MES) functionally related with the substrate processing equipments, the substrate storage means and the substrate transport means, including at least one substrate storage and transport box that is transported by the transport means and stored in the storage means; at least one gas analysis device of the gases forming the internal atmosphere of the substrate storage and transport box, which produces analysis signals representative of the quantity of the critical gas that is likely to generate molecular contamination, which is present in the storage and transport box; and an execution device which pilots the transport means and the storage means, with the execution device comprising instructions for detecting a molecular decontamination need as a function of analysis signals emitted by the gas analysis devic

Abstract: A pumping device and method are described. The pumping device comprises a dry rough vacuum pump equipped with a gas inlet connected to a vacuum chamber, a gas outlet leading to a conduit and an ejector. The pumping method comprises pumping gases contained in the vacuum chamber using the dry rough vacuum pump through the gas inlet, measuring electric power consumed by the dry rough vacuum pump and the pressure of the gases in the conduit, starting the ejector, when the pressure of the gases at the outlet and the electrical power consumed cross respective set point values as they rise and stopping the ejector when the electric power consumed and the pressure of the gases in the conduit at the outlet cross respective set point values as they fall.

Abstract: The invention pertains to a method for predicting a failure in the rotation of the rotor of a vacuum pump, comprising the following steps: sequences of events related to the change over time of the vacuum pump functional signals are recorded (101), a match is sought between at least one sequence of events and at least one pre-established association rule precursory pattern of a vacuum pump behavior model within the recorded sequences of events, said pre-established association rule's precursory patterns involving a failure in the rotor rotation (102), and a time prediction window is deduced during which a failure in the rotor rotation will occur in a vacuum pump (103).

Abstract: The regeneration method relates to a hydrogen sensor, which comprises a transistor of the MOS type whose gate is covered with a palladium catalyst and which is placed in a low-pressure enclosure. After a leak has been detected, a voltage is imposed on the gate of the transistor by means of an electronic circuit in order to regenerate the catalyst. The electronic circuit comprises a low-frequency DC generator and a switch for changing from the “measurement” mode to the “regeneration” mode, and vice versa.

Abstract: The invention relates to a station for measuring gaseous pollution in a transport enclosure of semiconductor substrates comprising a gas analysis device for determining the concentration of the gas to be analysed, said analysis device including: a diluting unit (3) configured to dilute a flow of gas to be analysed (Q) according to a dilution coefficient (D), and an analysis unit (5) communicating with the diluting unit (3) via a sampling pipe (7) in order to sample a flow of diluted gas (Qa) by pumping, and comprising at least one processing means for: analysing the sampled flow of diluted gas (Qa), and determining the concentration (C) of the gas flow to be analysed (Q) according to said analysed flow of diluted gas (Qa) and the dilution coefficient (D). The invention further relates to an associated gas analysis method.

Abstract: The embodiments of the present invention describe a gas discharge pipe comprising a first discharge channel and at least one second discharge channel designed to be connected respectively to a first vacuum pump and to at least a second vacuum pump on the one hand and to a reactor outlet on the other hand, in which the first discharge channel and at least the second discharge channel comprise first means and at least second means for injecting an inert gas in which the direction of injection is respectively oriented opposite to the direction of suction of the vacuum pumps.

Abstract: The invention relates to a method for lowering the pressure in a device charge-discharge lock from atmospheric pressure to a sub-atmospheric transfer pressure, said lock comprising a chamber in which at least one substrate is arranged at atmospheric pressure, said method comprising: a first step (101), in which first primary pumping is carried out from atmospheric pressure to a first characteristic threshold, using a primary pump with limited pumping rate, while isolating a turbomolecular pumping of said chamber; a second step (102) following said first step (101), in which a second primary pumping is carried out, faster than in said first step, to a second characteristic threshold, maintaining the isolation of the turbomolecular pumping; a third step (103) following said second step (102), in which secondary pumping is performed using said turbomolecular pumping upstream from the first pumping, and the primary pump chamber is isolated. The invention also relates to a device for implementing the method.

Abstract: The invention pertains to a dry-type vacuum pump comprising: at least one pumping stage (2), at least one rotary shaft (3) supported by a lubricated support bearing (7a, 7b) at least one lubricant deflector (12) and one ring seal (13) mounted on the rotary shaft, the ring seal (13) being mounted between the lubricant deflector (12) and the pumping stage (2), the lubricant deflector being mounted between the lubricated support bearing (7a, 7b) and the ring seal, a first reservoir (28) containing a first reserve of liquid lubricant (16a), said first reservoir (28) being in communication with the lubricated support bearing (7a, 7b) in a first volume (V1), a lubricant splashing unit mounted on the rotary shaft (3) in the first reservoir (28), one end of the lubricant splashing unit being bathed in the first reserve of liquid lubricant (16a), The vacuum pump has a second reservoir (15) comprising a second reserve of liquid lubricant (16b), the second reservoir (15) being separated from the first reservoir (

Abstract: An ionization cell for a mass spectrometer (2) includes: an ionization housing (10) having a first and a second electron input groove (11, 26) and one side (16) of which has an output groove (15) for passing ionized particles (14a, 14b, 14c) therethrough, a first working filament (13) placed opposite the first electron input groove (11) and intended to be supplied to produce an electron beam (12), and a second backup filament (22) placed opposite the second electron input groove (26) and intended to be supplied in the event the first working filament (13) fails so as to produce the electron beam, the input groove (26) being placed outside a front region (F) located opposite the first input groove (11). The invention also relates to a leak detector with a mass spectrometer, which includes such an above-described ionization cell.

Abstract: The invention relates to a device for measuring and processing an input signal (To) of at least two decades, comprising: an electron multiplier (4) that has an exponential gain on the basis of the power supply voltage (Vm) thereof and which receives said input signal (To); a power supply (5) that provides the power supply voltage (Vm) of said multiplier (4); a control circuit (6) of the power supply (5), the gain (10) and shift (11) parameters of which are adjustable and define an output signal range while varying the exponential gain of said multiplier (4); a logarithmic compression amplifier (T), the output of which is received as an input of the control circuit (6) so as to vary the exponential gain of the electron multiplier (4), in a continuous manner over the dynamic range of a measurement, on the basis of the output signal (IoG) of the electron multiplier (4), and forming the output signal (Vout) of said device; a measuring and calculating means for predetermining the value of the exponent (b) for the