Patents Assigned to Adtec Plasma Technology Co., Ltd.
  • Patent number: 11875968
    Abstract: Provided is a high frequency power source allowing the user to arbitrarily set a temporal change pattern for the value of high frequency power to be outputted. A high frequency power source 10A according to the present invention includes an output portion 20 configured to output high frequency power to a load 40 via an impedance matching circuit 30, a data storage portion 13A configured to store command data created by a user, and a control portion 12A configured to control the output portion 20 and the impedance matching circuit 30 on the basis of the command data stored in the data storage portion 13A.
    Type: Grant
    Filed: November 22, 2021
    Date of Patent: January 16, 2024
    Assignee: Adtec Plasma Technology Co., Ltd.
    Inventors: Toshihiro Takahara, Takamichi Kishira, Katsunori Tanaka
  • Patent number: 11651938
    Abstract: Provided is an impedance matching device capable of promptly improving an impedance mismatch between a high-frequency power source and a load even when the impedance of the load continuously changes. An impedance matching device according to the present invention is for use in a high-frequency power system configured to supply a load with an output from a high-frequency power source via a matching circuit whose constant is mechanically changed, and the impedance matching device includes a matching condition value acquisition portion for acquiring a matching condition value indicating a matching condition between the high-frequency power source and a load, and a control portion for controlling an oscillation frequency of the high-frequency power source based on the matching condition value.
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: May 16, 2023
    Assignee: ADTEC PLASMA TECHNOLOGY CO., LTD.
    Inventors: Toshihiro Takahara, Etsuro Kawata, Takamichi Kishira, Takehiro Okazaki, Nobutaka Fujiwara, Atsushi Katsuya, Kenta Nakamura
  • Patent number: 9526160
    Abstract: A resonator body 1 comprises a square-tube-shaped side wall 2 with upper and lower walls. A cavity 5 is formed in the resonator body. The side wall has a microwave supply opening 6. A wave guide 7 is connected to the microwave supply opening through an inductive window 13. The upper and lower walls have reaction tube attachment openings 3a, 4a. A reaction tube 8 is attached to the reaction tube attachment openings and extends vertically through the cavity and cross an axis of the wave guide. Square tubes 10a-10b made of non-magnetic metal meshes are arranged concentrically to the resonator body and in nested manner in the cavity at a distance from both the interior surface of the side wall and the reaction tube.
    Type: Grant
    Filed: May 27, 2013
    Date of Patent: December 20, 2016
    Assignee: Adtec Plasma Technology Co., LTD.
    Inventors: Shuitsu Fujii, Katsumi Oi
  • Patent number: 7858899
    Abstract: A coaxial microwave plasma torch, comprising, an outside conductor (1) formed in a cylindrical shape, a cylindrical electric discharge tube (3) fixedly inserted into an axial hole (2) formed in the outside conductor on one end face (4) side, and a coaxial cable (6) having one end fitted to the other end face of the outside conductor. An antenna (9) electrically connected to an inside conductor (8) is fitted to the one end of the coaxial cable and extended into the electric discharge tube through a through-hole (11) axially passed through between the other end face (5) of the outside conductor and the bottom face of the axial hole. The outside conductor (7) of the coaxial cable is electrically connected to the outside conductor, and a gas inlet pipeline (13) supplying a gas into the electric discharge tube is fitted in the outside conductor.
    Type: Grant
    Filed: March 25, 2005
    Date of Patent: December 28, 2010
    Assignee: Adtec Plasma Technology Co., Ltd.
    Inventors: Shuitsu Fujii, Raju Ramasamy, Takuya Urayama, Kazunari Fujioka
  • Patent number: 7795818
    Abstract: A microwave plasma generator in which the generating amount of radicals can be regulated easily with higher reaction efficiency while reducing gas consumption. The microwave plasma generator comprises an outer conductor (2), an inner conductor (3) arranged in the internal space (4) of the outer conductor, a discharge tube (7) having a double tube structure consisting of an inner tube (5) and an outer tube (6) and penetrating the outer and inner conductors in the axial direction, and a cavity (1) having a means for adjusting the position of the inner tube to the outer tube in the axial direction in the discharge tube.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: September 14, 2010
    Assignee: Adtec Plasma Technology Co., Ltd.
    Inventors: Takuya Urayama, Kazunari Fujioka, Masahiko Uchiyama
  • Patent number: 7514377
    Abstract: To provide a generator capable of generating plasma and ozone with high efficiency and easy to handle, with a simple structure. An electrode part 10 is formed of electrodes 11 and 12 without dielectric material interposed therebetween. An arc-extinguishing capacitor 13 as a charge storage part for storing charge is connected in series to the electrode part 10. An AC power source 15 generating plasma by causing self-arc-extinguishing discharge between the electrodes 11 and 12 by applying AC voltage to charge and discharge the arc-extinguishing capacitor 13, is connected to both ends of a circuit in which the electrode part 10 and the arc-extinguishing capacitor 13 are connected in series. The arc-extinguishing capacitor 13 and one electrode 12 of the electrode part 10 connected thereto are unitized, for making the electrode part multi-polarized.
    Type: Grant
    Filed: December 26, 2003
    Date of Patent: April 7, 2009
    Assignees: Hitachi Kokusai Electric Inc., Adtec Plasma Technology Co., Ltd.
    Inventors: Noriyoshi Sato, Takeshi Taniguchi, Hiroshi Mase, Shuitsu Fujii, Tamiya Fujiwara