Patents Assigned to Advanced Air Technologies, Inc.
  • Removal of low level ethylene oxide contaminants by treatment of contaminated gases with cationic exchange resins at gas-solid interface reaction conditions
    Patent number: 4828810
    Abstract: A method of removing low levels of ethylene oxide (1% by volume or less) from ethylene oxide contaminated gases is provided. The removal is effected by contacting the ethylene oxide with a solid, cationic ion exchange resin at conditions such that the quantity of water present in the reaction zone is at a level such that the reaction of the ethylene oxide with resin occurs at a gas-solid interface to form an ethylene oxide derivative polymer which is bound to said resin.
    Type: Grant
    Filed: May 18, 1987
    Date of Patent: May 9, 1989
    Assignee: Advanced Air Technologies, Inc.
    Inventors: Richard J. Kruse, David E. Hammer
  • Gas mask filter for the removal of low level ethylene oxide contaminants from air comprising dried cationic exchange resins
    Patent number: 4813410
    Abstract: A gas mask filter material is described comprising a dried acidic ion exchange resin which is effective in removing low levels of ethylene oxide from air contaminated therewith. Specifically described is a gas mask filter comprising a cross-linked polystyrene resin with sulfonic acid functionality that contains less than about 20 percent by weight water.
    Type: Grant
    Filed: May 18, 1987
    Date of Patent: March 21, 1989
    Assignee: Advanced Air Technologies, Inc.
    Inventors: Richard J. Kruse, David E. Hammer