Abstract: A method for manufacturing, by chemical depostion from the vapor phase, epitaxial composites comprising thin films of a Group III-V compound semiconductor such as gallium arsenide (GaAs) or gallium alluminum arsenide (GaAlAs) on single crystal silicon substrates.
Type:
Grant
Filed:
May 19, 1992
Date of Patent:
December 7, 1993
Assignee:
Advanced Energy Fund Limited Partnership
Abstract: Expitaxial composite comprising thin films of a Group III-V compound semiconductor such as gallium arsenide (GaAs) or gallium aluminum arsenide (GaAlAs) on single crystal silicon substrates are disclosed. Also disclosed is a process for manufacturing, by chemical deposition from the vapor phase, epitaxial composites as above described, and to semiconductor devices based on such epitaxial composites. The composites have particular utility for use in making light sensitive solid state solar cells.
Type:
Grant
Filed:
April 27, 1984
Date of Patent:
May 13, 1986
Assignee:
Advanced Energy Fund Limited Partnership