Patents Assigned to Advanced Engergy Industries, Inc.
  • Plasma processing system
    Publication number: 20050069651
    Abstract: A processing system having a processing chamber that includes a substrate holder and an electrode. The processing system can include a pressure control system, gas supply system, and monitoring system. A multi-frequency RF source is coupled to the electrode using a reduced-element matching network having a single variable element. The multi-frequency RF source is set to a first frequency to ignite a plasma and to a second frequency to maintain the plasma.
    Type: Application
    Filed: September 30, 2003
    Publication date: March 31, 2005
    Applicants: TOKYO ELECTRON LIMITED, Advanced Engergy Industries, Inc.
    Inventors: Hideaki Miyoshi, Gemunu Dharmasena, Tsutomu Higashiura, Jack Gilmore, Joseph Osselburn, Theresa Beizer