Patents Assigned to Advanced Epitaxy Technology Inc.
  • Patent number: 6432847
    Abstract: A novel method of using lasers for generating driving energy for activating P-type compound semiconductor films and reducing the resistivity thereof. The P-type compound semiconductor films are made from III-V nitrides or II-VI group compounds doped with P-type impurity. The present invention can be carried out in the ambience of atmosphere rather than in the ambience of nitrogen gas. In addition, adjusting the power and focusing distance of a laser source, and the power density can change the time required by the activating process.
    Type: Grant
    Filed: June 1, 2000
    Date of Patent: August 13, 2002
    Assignee: Advanced Epitaxy Technology Inc.
    Inventors: Jian-Shihn Tsang, Wen-Chung Tsai, Tsung-Yu Chen, Chia-Hung Hsu, Wei-Chih Lai
  • Patent number: 6380052
    Abstract: A novel method of using rapid variation of temperature for generating driving energy to activating P-type compound semiconductor films and reducing the resistivity thereof. The P-type compound semiconductor films are made from III-V nitrides or II-VI group compounds doped with P-type impurity. In addition, the time duration when the ambient temperature is greater than a certain temperature during the annealing process is limited to be less than one minute. Therefore, the optoelectronic performance of the P-type compound semiconductor films will not degrade because the duration of annealing process is decreased.
    Type: Grant
    Filed: May 30, 2000
    Date of Patent: April 30, 2002
    Assignee: Advanced Epitaxy Technology Inc.
    Inventors: Jian-Shihn Tsang, Wen-Chung Tsai, Wei-Chih Lai, Tsung-Yu Chen
  • Patent number: 6215131
    Abstract: A light-emitting device using a vacuum doughnut to serve as a current blocking layer is disclosed. The light-emitting device comprises: a substrate of a first conductivity type; a buffer layer formed on the substrate; a double heterostructure layer comprising a first cladding layer, an active layer and a second cladding layer, formed on the buffer layer; and a cap layer of a second conductivity type formed on the double heterostructure layer. A vacuum doughnut is formed between the active layer and an electrode formed on the cap layer to block a current flowing from the electrode formed on the cap layer so that the current flows through a region of the double heterostructure layer that is uncovered by the electrode. Furthermore, the vacuum doughnut can also be formed in the second cladding layer instead of forming in the cap layer.
    Type: Grant
    Filed: August 11, 1999
    Date of Patent: April 10, 2001
    Assignee: Advanced Epitaxy Technology Inc.
    Inventors: Jian-Tin Chen, Wei-Chih Lai, Tsong-Yu Chen