Patents Assigned to Advanced Lithography Group
  • Patent number: 5869838
    Abstract: An electrostatic lens system consisting of several electrodes and a novel method of making same. The invention relates to a lithography apparatus that includes a field composable lens where at least one lens electrode has a novel structure, said structure comprising an outer support structure, an insulating intermediate part and a conductive inner part composed of a number of segment-like subelectrodes that can be individually powered, if necessary, slightly differently to produce desired individual electrostatic subfields to be superimposed to the lens field. With the field composable lens design, it has been successfully demonstrated that a number of shape and alignment errors of lens components can be corrected by supplying slightly different voltages to individual subelectrodes, thus optimizing the overall lens performance (in view of its optical properties).
    Type: Grant
    Filed: September 11, 1996
    Date of Patent: February 9, 1999
    Assignee: Advanced Lithography Group
    Inventor: Gerhard Stengl