Abstract: A pattern inspection apparatus includes a first unit configured to acquire an optical image of a target workpiece to be inspected, a second unit configured to generate a reference image to be compared, a third unit configured, by using a mathematical model in which a parallel shift amount, an expansion and contraction error coefficient, a rotation error coefficient, a gray-level offset and an image transmission loss ratio are parameters, to calculate each of the parameters by a least-squares method, a forth unit configured to generate a corrected image by shifting a position of the reference image by a displacement amount, based on the each of the parameters, and a fifth unit configured to compare the corrected image with the optical image.

Abstract: A lighting optical apparatus using a deep ultraviolet light source that are easy to adjust due to a configuration with fewer components, has high illuminant and illuminant uniformity on an irradiated surface are provided. The apparatus has a deep ultraviolet light source from which deep ultraviolet rays are emitted, a first double-sided cylindrical lens which has a cylindrical lens array on both sides with a configuration of cylinder axes intersecting at right angles, a second double-sided cylindrical lens which has a cylindrical lens array on both sides with a configuration of cylinder axes intersecting at right angles, and a condenser lens.

Abstract: A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

Abstract: A level detection apparatus includes an illumination slit in which a rectangular first opening which causes illumination light to pass is formed, an optical system configured to illuminate a target object surface by illumination light passing through the illumination slit and focuses reflected light from the target object surface, first and second detection slits which are arranged in front of and in back of a focal point and in each of which a second opening is formed such that a short side of a rectangle is shorter than a short side of a illumination slit image formed by the illumination slit and a long side of the rectangle is larger than a long side of the illumination slit image, first and second light amount sensors configured to detect amounts of light of the reflected lights passing through the first and second detection slits, and a calculating unit configured to calculate a level of the target object surface based on outputs from the first and second light amount sensors.

Abstract: A semiconductor device fabrication-use mask pattern inspection apparatus having an optical configuration adaptable for achievement of a Koehler illumination system using a light source high in spatial coherency is disclosed. This apparatus includes a laser light source, a beam expander which is disposed between the laser source and a mask for expanding laser light to form an optical path of collimated light rays, and a beam splitter placed in the collimated light ray optical path for splitting the optical path into two optical paths. In one of these paths, a transmissive illumination optics is placed which irradiates transmission light onto the mask; in the other path, a reflective illumination optics is placed for irradiation of reflected light onto the mask. A pattern image of this mask is detected by a photosensitive device to generate a detected pattern image, which is sent to a comparator for comparison with a fiducial image thereof.

Abstract: A device for measuring the intensity of incoming light is disclosed. This device includes a rotatable light blocking unit which interrupts incident signal light at short regular intervals. The device also includes a light source which emits certain light different from the signal light while the signal light is interrupted by the block unit, and a measurement unit for measuring intensity values of the signal light and the certain light. A correction unit is provided for correcting the measured signal light intensity based on the certain light intensity. A calculator unit calculates a correction value through comparison of the intensity of the certain light to a reference value. The correction unit uses this correction value to correct the signal light intensity.

Abstract: A technique for correcting an image by using frequency division images and decomposition images corresponding in number to reference points is disclosed. An image correction apparatus includes an image divider which divides an inspection reference image into frequency regions to form frequency division images, a decomposition image generator for defining reference points at several locations within at least one frequency division image and for applying weighting with each reference point as a reference to thereby generate decomposition images corresponding in number to the reference points, a model parameter identifier for identifying a model parameter by using 2D linear prediction models of an image being tested, the decomposition images and a frequency division image which is out of the generation of decomposition images, and a model image generator for using the model parameter to generate a model image.

Abstract: A pattern image inspection apparatus with enhanced image correctability due to consolidation of alignment and image correction by using an image as divided by frequency regions while reducing image degradation and setup parameters is disclosed. The apparatus includes an image divider for creating for the test image and the reference image a plurality of frequency division images divided into frequency regions, a model parameter identifier for using 2D linear prediction models of the test image and the reference image to identify model parameters for each frequency division image, a model image generator for creating a model image based on the model parameters, and a comparison processor for performing inspection by comparing the model image to either the test image or the reference image with respect to each frequency division image. An image inspection method is also disclosed.

Abstract: A target workpiece inspection apparatus comprises an optical image acquiring unit to acquire an optical image of a target workpiece, a reference image generating unit to generate a reference image to be compared, a difference judging unit to judge whether an absolute value of difference between pixel values of the images in each pixel at a preliminary alignment position between the images is smaller than a threshold value, a least-squares method displacement calculating unit to calculate a displacement amount displaced from the preliminary alignment position, by using a regular matrix for a least-squares method obtained from a result judged, a position correcting unit to correct an alignment position between the optical image and the reference image to a position displaced from the preliminary alignment position by the displacement amount, and a comparing unit to compare the optical image and the reference image whose alignment position has been corrected.

Abstract: A pattern inspection apparatus includes a first unit configured to acquire an optical image of pattern, a second unit configured to generate a reference image to be compared, a third unit configured to calculate elements of a normal matrix for a least-squares method for calculating a displacement amount displaced from a preliminary alignment position, a forth unit configured to estimate a type of the reference image pattern, by using some of the elements of the normal matrix, a fifth unit configured to calculate the displacement amount based on the least-squares method, by using a normal matrix obtained by deleting predetermined elements depending upon the type of the pattern, a sixth unit configured to correct an alignment position between the optical image and the reference image to a position displaced by the displacement amount, and a seventh unit configured to compare the optical image and the reference image.

Abstract: A pattern inspection apparatus is disclosed, which includes a first laser light source for emission of first laser light having a first wavelength, a second laser light source for emission of second laser light having a second wavelength, and a deep ultraviolet (DUV) light source for emission of DUV light with a wavelength of less than or equal to 266 nm based on the first laser light and the second laser light. A first optical fiber is provided for connecting between the first laser light source and the DUV light source. A second optical fiber is for connection between the second laser light source and the DUV light source. The apparatus also includes a pattern inspection unit with the DUV light source being built therein, for inspecting a workpiece pattern being tested by using the DUV light as illumination light therefore.

Abstract: A mask/reticle pattern inspection apparatus capable of readily detecting local critical dimension (CD) errors of a circuit pattern of a testing workpiece is disclosed. This apparatus includes a search unit for finding a plurality of resembling or “look-alike” adjacent patterns around a specific pattern on the workpiece, which have similarity to the specific pattern. The inspection apparatus also includes a calculation unit for obtaining dissimilarity between the specific pattern and look-alike adjacent pattern, a variation evaluation unit which excludes an allowable error from the dissimilarity to thereby obtain a local CD error criterion value, and a CD error decision unit for determining the presence of a local CD error when the criterion value exceeds a threshold value in case the distance between the specific and look-alike patterns increases. A pattern inspection method is also disclosed.

Abstract: An assistance device of workpiece inspection apparatus embodying this invention includes a regional image data conversion unit which inputs region data indicative of a specified region of a workpiece being tested with a pattern formed thereon, and then converts the data to regional image data. The device also includes a data distribution processing unit which distributes the regional image data for output to the workpiece inspection apparatus in conformity with an inspection processing speed of the external workpiece inspection apparatus, which performs pattern defect inspection while comparing optical image data of the workpiece to prespecified reference image data.

Abstract: A pattern inspection apparatus capable of finding temporary emphatic portions in the process of transfer-and-development simulation of the image of a workpiece being tested is disclosed. This apparatus includes a first storage unit for retaining therein the pattern of an image captured from a workpiece under testing, a simulator for applying transfer/development simulation to the captured image pattern, and a second storage unit for storing the pattern of an image which is being presently simulated during the transfer/development simulation of the originally captured image pattern. A comparison processor handles as a pattern to be tested a pattern of the presently simulated or “midstream” image of the captured image while using a pattern to be compared as a fiducial pattern and compares the to-be-tested image to the fiducial pattern. A pattern inspection method is also disclosed.

Abstract: A pattern inspection apparatus for inspecting deterioration of the optical image of a workpiece to be tested is disclosed. The apparatus includes an image acquisition unit operable to capture an optical image of a workpiece under testing, a first memory for storing therein the workpiece image as a fiducial or “base” image, a second memory for receiving after acquisition of the base image another workpiece image gained by the image acquisition unit and for storing it as an image to be tested, and a comparison processor unit for comparing the test image to the base image. The workpiece base image that was read out of the first memory is compared to the test image of the workpiece as read from the second memory. A pattern inspection method and a workpiece obtained thereby along with a workpiece management methodology are also disclosed.

Abstract: A device for measuring the intensity of incoming light is disclosed. This device includes a rotatable light blocking unit which interrupts incident signal light at short regular intervals. The device also includes a light source which emits certain light different from the signal light while the signal light is interrupted by the block unit, and a measurement unit for measuring intensity values of the signal light and the certain light. A correction unit is provided for correcting the measured signal light intensity based on the certain light intensity. A calculator unit calculates a correction value through comparison of the intensity of the certain light to a reference value. The correction unit uses this correction value to correct the signal light intensity.

Abstract: A pattern inspection apparatus which compares a plurality of partial optical image data of a same target plate to be inspected, the target plate being formed as a pattern, includes an optical image data acquiring unit which acquires optical image data of the target plate to be inspected, and a comparing circuit which compares the plurality of partial optical image data. In the comparing circuit, region image data generated based on information of region pattern representing a predetermined region is input, and a decision criterion is changed with reference to the input region image data when the plurality of partial optical image data are compared with each other to decide the presence/absence of a defect on the target plate.

Abstract: A method of operating a laser light source including a wavelength conversion device in which two wavelength laser beams are input to a nonlinear crystal to output a sum frequency wavelength, according to an embodiment of the present invention, comprises: inputting only one wavelength laser beam of the two input wavelength laser beams to the nonlinear crystal; measuring scattered light intensity of the one wavelength laser beam by a light sensitive sensor installed on an optical axis of the sum frequency wavelength output beam; and judging a damage state of the nonlinear crystal based on a measurement value obtained by the intensity measurement by the light sensitive sensor.

Abstract: A workpiece inspection apparatus includes a search unit for finding from an input reference image a first pixel group which contains a certain pixel and a second pixel group having grayscale values within a threshold, and a probability acquisition unit responsive to receipt of an optical image of a workpiece being tested and the reference image, for obtaining a probability value based on a grayscale value of the certain pixel, a grayscale value of its corresponding pixel in the second pixel group, a grayscale value of an optical image pixel corresponding to the certain pixel, and a grayscale value of an optical image pixel corresponding to a pixel in the second pixel group corresponding to the certain pixel. The probability value is used to determine whether a defect exists at the optical image pixel corresponding to the certain pixel.

Abstract: A pattern inspection apparatus is disclosed, which includes a first laser light source for emission of first laser light having a first wavelength, a second laser light source for emission of second laser light having a second wavelength, and a deep ultraviolet (DUV) light source for emission of DUV light with a wavelength of less than or equal to 266 nm based on the first laser light and the second laser light. A first optical fiber is provided for connecting between the first laser light source and the DUV light source. A second optical fiber is for connection between the second laser light source and the DUV light source. The apparatus also includes a pattern inspection unit with the DUV light source being built therein, for inspecting a workpiece pattern being tested by using the DUV light as illumination light therefor.