Abstract: According to the present invention, a piezoelectric film having a single crystal structure is able to be formed, from various piezoelectric materials, on a film structure of the present invention. A film structure according to the present invention includes: a substrate; a buffer film which is formed on the substrate and has a tetragonal crystal structure containing zirconia; a metal film containing a platinum group element, which is formed on the buffer film by means of epitaxial growth; and a film containing Sr(Ti1?x, Rux)O3 (wherein 0?x?1), which is formed on the metal film by means of epitaxial growth.

Abstract: A plasma CVD apparatus efficiently coats the surfaces of fine particles with a thin film or super-fine particles by concentrating a plasma near the fine particles. The plasma CVD apparatus includes a chamber, a container disposed in the chamber for housing the fine particles, the container having a polygonal inner shape in a cross section substantially perpendicular to a longitudinal axis of the container, a ground shielding member for shielding a surface of the container other than a housing face, a rotation mechanism for causing the container to rotate or act as a pendulum on an axis of rotation substantially perpendicular to the cross section, an opposed electrode disposed in the container so as to face the housing face, a plasma power source electrically connected to the container, a gas introducing mechanism for introducing a raw gas into the container, and an evacuation mechanism for evacuating the chamber.

Abstract: A method for manufacturing a crystal film including: forming a Zr film on a substrate heated to 700° C. or more by a vapor deposition method using a vapor deposition material having a Zr single crystal; forming a ZrO2 film on said Zr film on a substrate heated to 700° C. or more, by a vapor deposition method using said vapor deposition material having a Zr single crystal, and oxygen; and forming a Y2O3 film on said ZrO2 film on a substrate heated to 700° C. or more, by a vapor deposition method using a vapor deposition material having Y, and oxygen.

Abstract: A process for preparing nanoparticle coated surfaces including the steps of electrostatically coating surfaces with polyelectrolyte by exposing the surface to a solution or suspension of polyelectrolyte, removing excess non-bound polyelectrolyte, then further coating the particles with a multi-layer of charged nanoparticles by exposing the polyelectrolyte-coated surface to a fluid dispersion including the charged nanoparticles. The process steps can optionally be repeated thereby adding further layers of polyelectrolyte followed by nanoparticles as many times as desired to produce a second and subsequent layers. The polyelectrolyte has an opposite surface charge to the charged nanoparticles and a molecular weight at the ionic strength of the fluid that is effective so that the first, second, and subsequent layers independently comprise a multiplicity of nanoparticle layers that are thicker than monolayers.