Patents Assigned to Advanced Micro Devices, LLP
  • Refractive index system monitor and control for immersion lithography
    Patent number: 6844206
    Abstract: A system and/or method are disclosed for measuring and/or controlling refractive index (n) and/or lithographic constant (k) of an immersion medium utilized in connection with immersion lithography. A known grating structure is built upon a substrate. A refractive index monitoring component facilitates measuring and/or controlling the immersion medium by utilizing detected light scattered from the known grating structure.
    Type: Grant
    Filed: August 21, 2003
    Date of Patent: January 18, 2005
    Assignee: Advanced Micro Devices, LLP
    Inventors: Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Ramkumar Subramanian