Patents Assigned to Advanced Micro Devices (Shanghai) Co., Ltd.
  • Patent number: 11822956
    Abstract: One or more shader processor inputs (SPIs) provide work items from a thread group for execution on one or more shader engines. A command processor selectively dispatches the work items to the SPIs based on a size of the thread group and a format of cache lines of a cache implemented in the one or more shader engines. The command processor operates in a tile mode in which the command processor schedules the work items in multidimensional blocks that correspond to the format of the cache lines. In some cases, the format of the cache lines is determined by a texture surface format and a swizzle mode for storing texture data. The SPIs (or corresponding drivers) adaptively select wave size, tile size, and wave walk mode based on thread group size, UAV surface format. The SPIs adaptively launch and schedule waves in a thread group based on selected file size, wave walk mode, and wave size to improve cache locality, reduce memory access, and create address pattern to improve memory efficiency.
    Type: Grant
    Filed: December 28, 2020
    Date of Patent: November 21, 2023
    Assignee: Advanced Micro Devices (SHANGHAI) CO., LTD.
    Inventors: ZhongXiang Luo, JiXin Shan, MingTao Gu
  • Patent number: 11700004
    Abstract: A bi-directional Gray code counter includes a first set of logic circuitry configured to receive an input having a first sequence of bits representing a first value. The first set of logic circuitry is further configured to convert the first sequence of bits to a second sequence of bits representing the first value. The bi-directional Gray code counter further includes a second set of logic circuitry and third second set of logic circuitry. The second set of logic circuitry is configured to compare the second sequence of bits to a bit index pattern. The third set of logic circuitry is configured to transition one bit in the first sequence of bits from a first state to a second state to form a third sequence of bits representing a second value. The one bit is transitioned in response to the second sequence of bits being compared to the bit index pattern.
    Type: Grant
    Filed: January 28, 2022
    Date of Patent: July 11, 2023
    Assignee: ADVANCED MICRO DEVICES (SHANGHAI) CO., LTD.
    Inventor: HaiFeng Zhou
  • Patent number: 11494192
    Abstract: A processing element is implemented in a stage of a pipeline and configured to execute an instruction. A first array of multiplexers is to provide information associated with the instruction to the processing element in response to the instruction being in a first set of instructions. A second array of multiplexers is to provide information associated with the instruction to the first processing element in response to the instruction being in a second set of instructions. A control unit is to gate at least one of power or a clock signal provided to the first array of multiplexers in response to the instruction being in the second set.
    Type: Grant
    Filed: April 28, 2020
    Date of Patent: November 8, 2022
    Assignees: Advanced Micro Devices, Inc., ADVANCED MICRO DEVICES (SHANGHAI) CO., LTD.
    Inventors: Jiasheng Chen, YunXiao Zou, Bin He, Angel E. Socarras, QingCheng Wang, Wei Yuan, Michael Mantor
  • Patent number: 11269672
    Abstract: A processing system detects excessive requests sent on behalf of a virtual machine executing at the processing system within a predetermined period of time and denies subsequent requests sent on behalf of that virtual machine until after the predetermined period of time has elapsed in order to grant access to resources of the processing system for servicing requests from other virtual machines and to prevent a virtual machine that has been compromised by an attack from overwhelming the processing system with malicious requests. The processing system sets a threshold number of event requests for each type of event request that can occur within a predetermined period of time. If the number of event requests of a certain type exceeds the threshold for that event type, the processing system ignores subsequent event requests of that type until the predetermined period of time has expired.
    Type: Grant
    Filed: April 30, 2019
    Date of Patent: March 8, 2022
    Assignees: ADVANCED MICRO DEVICES (SHANGHAI) CO., LTD., ATI Technologies ULC
    Inventors: Yinan Jiang, Kun Xue
  • Patent number: 10656951
    Abstract: A processing element is implemented in a stage of a pipeline and configured to execute an instruction. A first array of multiplexers is to provide information associated with the instruction to the processing element in response to the instruction being in a first set of instructions. A second array of multiplexers is to provide information associated with the instruction to the first processing element in response to the instruction being in a second set of instructions. A control unit is to gate at least one of power or a clock signal provided to the first array of multiplexers in response to the instruction being in the second set.
    Type: Grant
    Filed: October 20, 2017
    Date of Patent: May 19, 2020
    Assignees: ADVANCED MICRO DEVICES, INC., ADVANCED MICRO DEVICES (SHANGHAI) CO., LTD.
    Inventors: Jiasheng Chen, YunXiao Zou, Bin He, Angel E. Socarras, QingCheng Wang, Wei Yuan, Michael Mantor
  • Patent number: 10198283
    Abstract: A request is sent from a new virtual function (VF) to a physical function for requesting the initialization of the new VF. The controlling physical function and the new VF establish a two-way communication channel that to start and end the VF's exclusive accesses to registers in a configuration space. The physical function uses a timing control to monitor that exclusive register access by the new VF is completed within a predetermined time period. The new VF is only granted a predetermined time period of exclusive access to complete its initialization process. If the exclusive access period is timed out, the controlling physical function can terminate the VF to prevent GPU stalls.
    Type: Grant
    Filed: November 10, 2016
    Date of Patent: February 5, 2019
    Assignees: ATI Technologies ULC, Advanced Micro Devices (Shanghai) Co., LTD.
    Inventors: Jeffrey G. Cheng, Yinan Jiang, Guangwen Yang, Kelly Donald Clark Zytaruk, LingFei Liu, XiaoWei Wang
  • Publication number: 20180102296
    Abstract: The present invention relates to a substrate comprising a build-up and a solder resist layer disposed on the build-up. The solder resist layer has an upper surface facing away from the build-up. The solder resist layer has a plurality of grooves on its upper surface. The grooves of the solder resist layer can better eliminate or relieve the stress accumulated on large solder resist area induced by heat and/or material coefficient of thermal expansion mismatch of the substrate and thus can prevent and diminish warpage of the substrate or package.
    Type: Application
    Filed: December 11, 2017
    Publication date: April 12, 2018
    Applicant: Advanced Micro Device (Shanghai) Co., Ltd.
    Inventors: I-Tseng LEE, Yu-Ling HSIEH
  • Patent number: 9870969
    Abstract: The present invention relates to a substrate comprising a build-up and a solder resist layer disposed on the build-up. The solder resist layer has an upper surface facing away from the build-up. The solder resist layer has a plurality of grooves on its upper surface. The grooves of the solder resist layer can better eliminate or relieve the stress accumulated on large solder resist area induced by heat and/or material coefficient of thermal expansion mismatch of the substrate and thus can prevent and diminish warpage of the substrate or package.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: January 16, 2018
    Assignee: ADVANCED MICRO DEVICES (SHANGHAI) CO., LTD.
    Inventors: I-Tseng Lee, Yu-Ling Hsieh
  • Patent number: 9214438
    Abstract: The present invention relates to die-die stacking structure and the method for making the same. The die-die stacking structure comprises a top die having a bottom surface, a first insulation layer covering the bottom surface of the top die, a bottom die having a top surface, a second insulation layer covering the top surface of the bottom die, a plurality of connection members between the top die and the bottom die and a protection material between the first insulation layer and the second insulation layer. The plurality of connection members communicates the top die with the bottom die. The protection material bridges the plurality of connection members to form a mesh layout between the first insulation layer and the second insulation layer.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: December 15, 2015
    Assignee: Advanced Micro Devices (Shanghai) Co., Ltd.
    Inventors: I-Tseng Lee, Yi Hsiu Liu
  • Patent number: 8994191
    Abstract: The present invention relates to die-die stacking structure and the method for making the same. The die-die stacking structure comprises a top die having a bottom surface, a first insulation layer covering the bottom surface of the top die, a bottom die having a top surface, a second insulation layer covering the top surface of the bottom die, a plurality of connection members between the top die and the bottom die and a protection material between the first insulation layer and the second insulation layer. The plurality of connection members communicates the top die with the bottom die. The protection material bridges the plurality of connection members to form a mesh layout between the first insulation layer and the second insulation layer.
    Type: Grant
    Filed: January 21, 2014
    Date of Patent: March 31, 2015
    Assignee: Advanced Micro Devices (Shanghai) Co. Ltd.
    Inventors: I-Tseng Lee, Yi Hsiu Liu
  • Publication number: 20140246223
    Abstract: The present invention relates to a substrate comprising a build-up and a solder resist layer disposed on the build-up. The solder resist layer has an upper surface facing away from the build-up. The solder resist layer has a plurality of grooves on its upper surface. The grooves of the solder resist layer can better eliminate or relieve the stress accumulated on large solder resist area induced by heat and/or material coefficient of thermal expansion mismatch of the substrate and thus can prevent and diminish warpage of the substrate or package.
    Type: Application
    Filed: February 28, 2014
    Publication date: September 4, 2014
    Applicant: Advanced Micro Devices (Shanghai) Co., Ltd.
    Inventors: I-Tseng Lee, Yu-Ling Hsieh