Patents Assigned to Advanced PDP Development Center Corporation
  • Patent number: 7952277
    Abstract: A PDP is proposed which has high emission efficiency and which can decrease address discharge voltage. In a column direction of at least one of transparent electrodes, which perform sustain discharge via respective discharge gaps of a pair of row electrodes and constituting a row electrode pair, is set to 150 ?m or less, and partial pressure of xenon in discharge gas sealed in a discharge space is set to 6.67 kPa or more. A width of a scan electrode, which is one row electrode of each of the row electrode pair facing the column electrode and to which scan pulse is applied, is wider than a width of the other row electrode of the pair to which discharge sustain voltage is applied.
    Type: Grant
    Filed: July 18, 2007
    Date of Patent: May 31, 2011
    Assignees: Advanced PDP Development Center Corporation, Hitachi, Ltd., Panasonic Corporation
    Inventors: Koji Shinohe, Toshiyuki Akiyama, Takashi Yamada, Yasuyuki Noguchi
  • Patent number: 7586467
    Abstract: A small-sized, low-loss load drive circuit, an integrated circuit for that drive circuit, and an inexpensive plasma display using that integrated circuit. In the load drive circuit that responds to switching commands to supply a high or low voltage to a load by switching, the source-drain voltage of an output-stage n-type MOS transistor of a flip-flop is supplied between the gate and cathode of a main IGBT. In order to hold this voltage, the power source to the flip-flop is supplied from a main power source or a charge pump power circuit connected at the fixed potential point of the main power source. In addition, a discharge prevention circuit and discharge prevention elements and are provided in order that the potential of the power source can be maintained higher than the positive potential of main power source.
    Type: Grant
    Filed: May 17, 2006
    Date of Patent: September 8, 2009
    Assignees: Hitachi, Ltd., Advanced PDP Development Center Corporation
    Inventors: Junichi Sakano, Kenji Hara, Mutsuhiro Mori
  • Patent number: 7557776
    Abstract: For a drive circuit of a sustaining discharge circuit of an AC plasma display panel, an idea of current flow parts arrangement is provided to reduce inductance. The configuration includes a plasma display panel on which electrodes are formed, an electric conductive conductor for fixing the panel, a pair of circuit boards fixed onto the conductor using a plurality of fixing members, ground terminals and electric power supplies disposed respectively for the circuit boards, and a pair of connecting circuit boards connected to end portions respectively of the circuit boards and an end portion of the panel. The ground terminals are electrically connected via fixing members to a position near an end portion of the conductor.
    Type: Grant
    Filed: April 25, 2005
    Date of Patent: July 7, 2009
    Assignees: Hitachi, Ltd., Advanced PDP Development Center Corporation
    Inventors: Hirokazu Inoue, Yukio Akiyama, Kiyoshi Watanuki, Michitaka Ohsawa
  • Publication number: 20080018563
    Abstract: A PDP is proposed which has high emission efficiency and which can decrease address discharge voltage. In a column direction of at least one of transparent electrodes, which perform sustain discharge via respective discharge gaps of a pair of row electrodes and constituting a row electrode pair, is set to 150 ?m or less, and partial pressure of xenon in discharge gas sealed in a discharge space is set to 6.67 kPa or more. A width of a scan electrode, which is one row electrode of each of the row electrode pair facing the column electrode and to which scan pulse is applied, is wider than a width of the other row electrode of the pair to which discharge sustain voltage is applied.
    Type: Application
    Filed: July 18, 2007
    Publication date: January 24, 2008
    Applicants: Advanced PDP Development Center Corporation, Fujitsu Limited, Pioneer Corporation, Matsushita Electric Industrial Co., Ltd.
    Inventors: Koji Shinohe, Toshiyuki Akiyama, Takashi Yamada, Yasuyuki Noguchi
  • Publication number: 20070278955
    Abstract: A manufacturing method of a PDP includes: a first material filling step for filling recessed portions (41) of a molding die (4) with a first dielectric paste (23A) that forms partitions; a second material application step for applying a second dielectric paste (22A) that forms an address electrode protective layer on a rear substrate (2); a transfer step for pressing the molding die (4) against the second dielectric paste (22A) and then peeling the molding die (4) off from the rear substrate (2); and a firing step. Since the molding die (4) is pressed against the second dielectric paste (22A) that has a fluidity in the transfer step, the first dielectric paste (23A) and the second dielectric paste (22A) can be adhered to each other securely. Accordingly, the partitions having a desired shape can be formed securely and inter-partition portions of the address electrode protective layer can be uniformly formed with a uniform thickness.
    Type: Application
    Filed: April 4, 2007
    Publication date: December 6, 2007
    Applicants: PIONEER CORPORATION, Advanced PDP Development Center Corporation
    Inventors: Yoshihiko Kusuma, Yuji Ito, Youichi Ikarashi, Keiji Nunomura, Toshihiko Kogure, Osamu Oida, Takahiro Kobayashi
  • Patent number: 7018771
    Abstract: The present invention provides a highly reliable technology for manufacturing a substrate with protrusions. After filling an UV-curable transfer material into the grooves of an intaglio plate for transfer, the UV-curable transfer material is cured by irradiating UV rays under the conditions where it is exposed to an atmosphere that contains at least one of oxygen and ozone while a curing-inhibited portion is formed in an area of the UV-curable transfer material exposed to this atmosphere, and the UV-curable transfer material is transferred to the substrate to form the protrusions, while the curing-inhibited portion is made to adhere to the substrate.
    Type: Grant
    Filed: April 21, 2005
    Date of Patent: March 28, 2006
    Assignees: Fujitsu Limited, Advanced PDP Development Center Corporation
    Inventors: Osamu Toyoda, Kazunori Inoue, Akira Tokai
  • Publication number: 20060024608
    Abstract: The present invention provides a highly reliable technology for manufacturing a substrate with protrusions. After filling an UV-curable transfer material into the grooves of an intaglio plate for transfer, the UV-curable transfer material is cured by irradiating UV rays under the conditions where it is exposed to an atmosphere that contains at least one of oxygen and ozone while a curing-inhibited portion is formed in an area of the UV-curable transfer material exposed to this atmosphere, and the UV-curable transfer material is transferred to the substrate to form the protrusions, while the curing-inhibited portion is made to adhere to the substrate.
    Type: Application
    Filed: April 21, 2005
    Publication date: February 2, 2006
    Applicants: FUJITSU LIMITED, ADVANCED PDP DEVELOPMENT CENTER CORPORATION
    Inventors: Osamu Toyoda, Kazunori Inoue, Akira Tokai
  • Publication number: 20060021529
    Abstract: The present invention provides a new and highly reliable substrate manufacturing technology for manufacturing a substrate with a protrusion pattern, which can decrease structural defects caused by involving bubbles when the protrusion pattern is formed, can improve the reliability of the product and the yield of the product, does not require off-line steps such as vacuum deaeration, and therefore improves the production efficiency and simplifies the steps. According to the present invention, a molding material paste is filled into the concave portions of an intaglio plate for filling, an intaglio plate for transfer on which a specific groove pattern is formed is partially contacted with the intaglio plate for filling, the molding material is filled into the grooves of the intaglio plate for transfer, then the molding material is transferred from the intaglio plate for transfer to a substrate as a protrusion pattern.
    Type: Application
    Filed: July 6, 2005
    Publication date: February 2, 2006
    Applicants: FUJITSU LIMITED, ADVANCED PDP DEVELOPMENT CENTER CORPORATION
    Inventors: Osamu Toyoda, Kazunori Inoue, Akira Tokai
  • Publication number: 20050285524
    Abstract: The present invention provides a new technology for an electrode that can be used for a gas discharge panel, a substrate for a gas discharge panel, a gas discharge panel and a gas discharge panel display device. On the rib formation surface of a substrate for a gas discharge display panel, a self-assembled monolayer is formed, a part of the self-assembled monolayer is activated so that a substance to be a plating catalyst can adhere thereto, the substance to be the plating catalyst is caused to adhere to this activated part to form the plating catalyst, and address electrodes are formed by forming an electroless plating layer on the top of the part of the self-assembled monolayer by an electroless plating method using the plating catalyst.
    Type: Application
    Filed: November 9, 2004
    Publication date: December 29, 2005
    Applicants: Fujitsu Limited, Advanced PDP Development Center Corporation
    Inventors: Akira Tokai, Osamu Toyoda, Kazunori Inoue