Abstract: A dynamic mixer comprising two mixing parts which are rotatable relative to each other about a predetermined axis of rotation, each of said mixing parts having a mixing face, between which is defined a flow path which extends between an inlet and an outlet, each of said mixing faces comprising a series of annular steps centered on the predetermined axis of rotation, having a plurality of offset and overlapping cavities formed therein, such that material moving between the mixing faces of the two mixing parts from the inlet to the outlet is transferable between overlapping cavities.

Abstract: A dynamic mixer comprising two mixing parts which are rotatable relative to each other about a predetermined axis of rotation, each of said mixing parts having a mixing face, between which is defined a flow path which extends between an inlet and an outlet, each of said mixing faces comprising a series of annular steps centred on the predetermined axis of rotation, having a plurality of offset and overlapping cavities formed therein, such that material moving between the mixing faces of the two mixing parts from the inlet to the outlet is transferable between overlapping cavities.

Abstract: A milling apparatus in which at least two independently driven axiaily mounted elements are eccentrically mounted one within the other so as to define a processing chamber (12) therebetween with the minimum radial gap between the elements at one position being diametrically opposite to the maximum radial gap. Stresses are applied to the material by passing it through the minimum radial gap, which is adjustable. The elements may be rotated in the same direction to apply compressive and extensional stresses to material within the minimum gap, or in opposite directions to apply shear stresses to the material within this gap. A third element may be incorporated within the chamber to provide heat transfer and distributive mixing to the stressed material.

Abstract: A milling apparatus in which at least two independently driven axiaily mounted elements are eccentrically mounted one within the other so as to define a processing chamber (12) therebetween with the minimum radial gap between the elements at one position being diametrically opposite to the maximum radial gap. Stresses are applied to the material by passing it through the minimum radial gap, which is adjustable. The elements may be rotated in the same direction to apply compressive and extensional stresses to material within the minimum gap, or in opposite directions to apply shear stresses to the material within this gap. A third element may be incorporated within the chamber to provide heat transfer and distributive mixing to the stressed material.

Abstract: A cheese process vat is disclosed. The cheese process vat includes an enclosure and a shaft assembly, preferably a shaft assembly having a shaft and a plurality of agitator panels arranged on the shaft. The cheese process vat preferably further includes an adjustable shaft seal assembly that adjustably seals the joint between the shaft and the enclosure. Methods of using the respective cheese process vats are also disclosed.

Abstract: A method of cleaning a substrate includes contacting a surface of a semiconductor substrate with a composition comprising a superacid. The semiconductor substrate may be a wafer.

Abstract: A dynamic mixer in which two members (1,2) are rotated relative to each other about a predetermined axis (XX), the members having facing surfaces (15, 16) which extend axially and between which is defined a mixing chamber through which a flow path extends between an inlet (7) for material to be mixed and an outlet (8). An array of two or more mixing formations is defined on at least one of the facing surfaces (15, 16) which extend radially towards the facing surface of the other element (15, 16) and which act to mix material within the mixing chamber, and which extend axially generally parallel to the axis.

Abstract: A cheese process vat is disclosed. The cheese process vat includes an enclosure and a shaft assembly, preferably a shaft assembly having a shaft and a plurality of agitator panels arranged on the shaft. The cheese process vat preferably further includes a shaft seal assembly having a fluid accessible clean-in-place chamber. Methods of using the respective cheese process vats are also disclosed.

Abstract: A cheese process vat is disclosed. The cheese process vat includes an enclosure and a shaft assembly, preferably a shaft assembly having a shaft and a plurality of agitator panels arranged on the shaft in a planar fashion. The agitator panels are preferably arranged on the shaft such that the shaft assembly is balanced in both weight and agitator panel surface area around the centerline of the shaft.

Abstract: A cheese process vat is disclosed. The cheese process vat includes an enclosure and a shaft assembly, preferably a shaft assembly having a shaft and a plurality of agitator panels arranged on the shaft in a planar fashion. The agitator panels are preferably arranged on the shaft such that the shaft assembly is balanced in both weight and agitator panel surface area around the centerline of the shaft.

Abstract: A cheese process vat is disclosed. The cheese process vat includes an enclosure and a shaft assembly, preferably a shaft assembly having a shaft and a plurality of agitator panels arranged on the shaft. The cheese process vat preferably further includes an adjustable shaft seal assembly that adjustably seals the joint between the shaft and the enclosure. The adjustable seal has separate shaft and face seals. Methods of using the respective cheese process vats are also disclosed.

Abstract: A cheese process vat is disclosed. The cheese process vat includes an enclosure and a shaft assembly, preferably a shaft assembly having a shaft and a plurality of agitator panels arranged on the shaft. The cheese process vat preferably further includes a shaft seal assembly having a fluid accessible clean-in-place chamber. Methods of using the respective cheese process vats are also disclosed.

Abstract: A cheese process vat is disclosed. The cheese process vat includes an enclosure and a shaft assembly, preferably a shaft assembly having a shaft and a plurality of agitator panels arranged on the shaft. The preferred cheese process vat includes a plurality of rennet solution injection assemblies to inject rennet solution into the contents of the vat such that the rennet solution sufficiently pierces the surface of the fluid contents of the vat so that the rennet solution is mixed and distributed more efficiently.

Abstract: A cheese process vat is disclosed. The cheese process vat includes an enclosure and a shaft assembly, preferably a shaft assembly having a shaft and a plurality of agitator panels arranged on the shaft. The cheese process vat preferably further includes an adjustable shaft seal assembly that adjustably seals the joint between the shaft and the enclosure. Methods of using the respective cheese process vats are also disclosed.

Abstract: A dynamic mixer in which two elements are rotatable relative to each other about a predetermined axis and between which is defined a flow path extending between an inlet for materials to be mixed and an outlet. The flow path is defined between surfaces of the elements each of which surfaces defines a series of annular projections (8, 12) centred on the predetermined axis (10). The surfaces are positioned such that projections defined by one element extend into spaces between projections (12) defined by the other element. At least one cavity is formed in each projection (8, 12) to define a flow passage bridging the projection in which the cavity is formed. Each of the elements may be generally conical althrough each of the elements could be generally cylindrical or planar, providing projections in the two elements overlap.

Abstract: This invention relates to a method of predicting the long-term dose rates from radioactive material on the interior, wetted surfaces of the primary coolant piping of nuclear power reactors. The electrochemical potential of the cooling water of a nuclear power plant is measured over a short-term period with an electrochemical potential measuring device that has an unprefilmed measuring electrode. The results of these electrochemical potential measurements are divided by the result at a prescribed short period of exposure, and these normalized electrochemical potential fractions are plotted versus the logarithm of time. The negative of the slope of the straight line through the plotted data is divided into the measured average Co-60 concentration in the cooling water, and a standard curve of long-term dose rate versus this parameter is used to predict the eventual long-term radiation build-up performance of the nuclear power plant in which the electrochemical potential measurements are made.