Patents Assigned to Advanced Refractory Technologies, Inc.
  • Patent number: 6312570
    Abstract: This invention relates to a new family of materials that exhibits improved stability to the chemical environment used in metal ore reduction, and thus provides an opportunity for improving the energy use and efficiency of such processes by their use. More specifically, the inventions relates to an electrode, used in the construction and/or operation of a reduction cell use to produce metal from ore, which is comprised of a compound or compounds described by the chemical formulas M3NX2 or M2NX, where M is a transition metal, N is a group 3a, 4a or 5a element, and X is carbon or nitrogen; or a composite containing in part, at least one of such compounds.
    Type: Grant
    Filed: February 8, 2000
    Date of Patent: November 6, 2001
    Assignee: Advanced Refractory Technologies, Inc.
    Inventor: Thomas J. Mroz, Jr.
  • Patent number: 6083313
    Abstract: The present invention relates to a unique hard coating that provides the necessary characteristics for flat panel display plastic substrates because the coating is amorphous and is comprised of C, H, Si and O. The coating of the present invention is hard, optically transparent, scratch and abrasion resistant and hydrophobic. It is deposited by a low density, low temperature plasma enhanced chemical vapor deposition (PECVD) process and exhibits excellent barrier protection and reduced permeability to moisture, oxygen, helium and other vapors.
    Type: Grant
    Filed: July 27, 1999
    Date of Patent: July 4, 2000
    Assignee: Advanced Refractory Technologies, Inc.
    Inventors: Chandra Venkatraman, Cyndi Brodbeck
  • Patent number: 6054220
    Abstract: Disclosed herein is a silica coated powder that provides improved hydrolysis stability and damage tolerance compared to silica coated powders previously described and commercially available. The improved coated powder of this disclosure is clearly distinguished from other silica coated powders, in that the silica coating of the disclosed product is dense, or contains only closed pores, and as such does not allow for water penetration to the AlN core via permeability or any other means. Further disclosed is the process by which such improved coated powders can be produced. The process utilizes any form of silica coated aluminum nitride, which can be produced by any number of means as described in the literature. Such powders are then subjected to a further heat treatment which causes the closure of porosity and densification of the silica coating.
    Type: Grant
    Filed: September 15, 1998
    Date of Patent: April 25, 2000
    Assignee: Advanced Refractory Technologies, Inc.
    Inventor: Thomas J. Mroz
  • Patent number: 6013980
    Abstract: A diamond-like carbon-containing material useful as a coating for electronic devices including field emission devices and color television tubes, the coatings having both low secondary electron emission coefficients of less than unity and electrical resistivity tunable over a range of from about 10 e.sup.-2 to about 10 e.sup.16.
    Type: Grant
    Filed: May 9, 1997
    Date of Patent: January 11, 2000
    Assignee: Advanced Refractory Technologies, Inc.
    Inventors: Arvind Goel, Craig Anthony Outten
  • Patent number: 6013191
    Abstract: A method for polishing the surface of a diamond film with a low power density plasma in a reactor which comprises disposing O.sub.2 gas and a fluorinated gas such as SF.sub.6, NF.sub.3, and C.sub.2 F.sub.6 in the reactor, providing power to the reactor so that the power density in the reactor is between about 1.0 watts/cm.sup.2 and about 1.1 watts/cm.sup.2 for a first duration, and maintaining temperature in the reactor at between about 200.degree. to about 400.degree.. The method may alternatively comprise disposing a sputter gas such as Ar,O.sub.2 or N.sub.2 in the reactor, providing power to the reactor so that the power density in the reactor is between about 3.0 watts/cm.sup.2 and about 7.5 watts/cm.sup.2 for a first duration, and performing a sputter etch, disposing O.sub.2 gas and a fluorinated gas such as SF.sub.6, NF.sub.3, and C.sub.2 F.sub.6 in the reactor, and providing power to the reactor so that the power density in the reactor is between about 1.5 watts/cm.sup.2 and about 3.0 watts/cm.sup.
    Type: Grant
    Filed: October 27, 1997
    Date of Patent: January 11, 2000
    Assignee: Advanced Refractory Technologies, Inc.
    Inventors: Firooz Nasser-Faili, John A. Herb, Miguel A. Monreno
  • Patent number: 5795648
    Abstract: A method for preserving the precision-edges of a precision-edged substrate by applying to a the substrate a corrosion resistant coating comprising a diamond-like solid state material having interpenetrating atomic scale networks comprising a first diamond-like carbon network stabilized by hydrogen, a silicon network stabilized by oxygen, and optionally at least one network made from dopant elements or dopant compounds containing elements from Groups 1-7b and 8 of the periodic table.
    Type: Grant
    Filed: October 3, 1995
    Date of Patent: August 18, 1998
    Assignee: Advanced Refractory Technologies, Inc.
    Inventors: Arvind Goel, Donald J. Bray
  • Patent number: 5786068
    Abstract: An electrically tunable coating and method for its fabrication and deposition comprising, as a coating on a substrate, a diamond-like nanocomposite solid-state material having interpenetrating atomic scale networks of carbon in a diamond-like carbon network stabilized by hydrogen, a glass-like silicon network stabilized by oxygen, and optionally at least one additional network of dopant elements or dopant compounds having elements from groups 1-7b and 8 of the periodic table.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: July 28, 1998
    Assignee: Advanced Refractory Technologies, Inc.
    Inventors: Veniamin F. Dorfman, Arvind Goel
  • Patent number: 5728465
    Abstract: A method for inhibiting corrosion of a substrate by applying to a substrate a corrosion resistant coating comprising a diamond-like solid state material having interpenetrating atomic scale networks of class of diamond-like solid state materials formed from interpenetrating networks comprising a first network of carbon in a diamond-like carbon network stabilized by hydrogen, a silicon network stabilized by oxygen, and optionally at least one network made from dopant elements or dopant compounds containing elements from groups 1-7b and 8 of the periodic table.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: March 17, 1998
    Assignee: Advanced Refractory Technologies, Inc.
    Inventors: Veniamin F. Dorfman, Arvind Goel
  • Patent number: 5718976
    Abstract: An erosion resistant coating for optically transmissive substrates formed from a diamond-like nanocomposite structure which contains interpenetrating networks of a diamond-like carbon matrix stabilized by hydrogen, a silicone glass-like network stabilized by oxygen, and optionally, at least one network formed from elements and compounds from groups 1-7b and 8 of the periodic table.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: February 17, 1998
    Assignee: Advanced Refractory Technologies, Inc.
    Inventors: Veniamin F. Dorfman, Arvind Goel, Donald J. Bray
  • Patent number: 5693305
    Abstract: A method for making aluminum nitride whiskers comprising reacting a reactant bed of aluminum, alumina, ammonium chloride, with a metal-containing carbon catalyst in the presence of a nitrogen gas flow, such that a direct nitridation reaction, a carbothermal reaction and a transport species reaction occur concurrently.
    Type: Grant
    Filed: October 19, 1995
    Date of Patent: December 2, 1997
    Assignee: Advanced Refractory Technologies, Inc.
    Inventors: Vithal Revankar, Arvind Goel
  • Patent number: 5673527
    Abstract: A ceramic tile is mounted to the wall of an incinerator or other high temperature and/or corrosive environment with a stud assembly that includes a threaded stud and a ceramic T-nut. The ceramic T-nut thermally shields the stud to protect it from oxidation and corrosion, and reduces cracking in tile because the T-nut and the tile have similar thermal expansion. The T-nut is accessible through a small bore.
    Type: Grant
    Filed: September 5, 1995
    Date of Patent: October 7, 1997
    Assignee: Zampell Advanced Refractory Technologies, Inc.
    Inventors: Kent R. Coston, Brian T. Lenihan, James C. Zampell
  • Patent number: 5665326
    Abstract: A method for making titanium nitride whiskers comprising reacting titanium in the presence of nitrogen in a direct nitridation reaction, concurrently reacting titania in the presence of nitrogen in a carbothermal nitridation reaction, optionally in the presence of a transport species reaction under conditions necessary to make titanium nitride whiskers.
    Type: Grant
    Filed: November 13, 1995
    Date of Patent: September 9, 1997
    Assignee: Advanced Refractory Technologies, Inc.
    Inventors: Arvind Goel, Vithal Revankar
  • Patent number: 5638251
    Abstract: A method of making capacitors comprising, providing as the dielectric and/or conductive layers, a material made from a diamond-like nanocomposite solid-state material having interpenetrating atomic scale networks of carbon in a diamond-like carbon network stabilized by hydrogen, a glass-like silicon network stabilized by oxygen, and optionally at least one additional network of dopant elements or dopant compounds having elements from Groups 1-7b and 8 of the periodic table.
    Type: Grant
    Filed: October 3, 1995
    Date of Patent: June 10, 1997
    Assignee: Advanced Refractory Technologies, Inc.
    Inventors: Arvind Goel, Donald J. Bray, Steven C. Martin, Keith A. Blakely
  • Patent number: 4744922
    Abstract: A neutron-absorbing material is formed by a process which includes the steps of: mixing an absorptive material having a high thermal neutron capture cross-section (e.g., B.sub.4 C), a neutron-moderating material (e.g., graphite) and a binder (e.g., a phenol formaldehyde resin); shaping such mixture; curing such shaped mixture (e.g., to complete polymerization of the resin and to have only a carbon residue); and siliconizing such shaped and cured mixture. The resulting product has been formed to be denser and stronger, and more oxidation- and abrasion-resistant than prior art compositions.
    Type: Grant
    Filed: July 10, 1986
    Date of Patent: May 17, 1988
    Assignee: Advanced Refractory Technologies, Inc.
    Inventors: Keith A. Blakely, Peter T. B. Shaffer