Abstract: A wiring structure includes a redistribution layer and an electrical pad. The redistribution layer includes a passivation layer and a metal layer. The metal layer is embedded in the passivation layer, and the passivation layer defines an opening to expose a portion of the metal layer. The electrical pad is disposed in the opening of the passivation layer and on the metal layer. The electrical pad includes a seed layer, a conductive layer, a barrier layer and an anti-oxidation layer.
Type:
Grant
Filed:
October 16, 2018
Date of Patent:
September 1, 2020
Assignee:
ADVANCED SEMICOMDUCTOR ENGINEERING, INC.