Patents Assigned to Advanced Semiconductor Materials/AM.
  • Method and apparatus for achieving spatially uniform externally excited non-thermal chemical reactions
    Patent number: 4401507
    Abstract: Method and apparatus for improved uniformity in an externally excited non-thermal chemical reaction process. In the inventive process, the reactant is externally activated for a time short compared with the time during which reactant depletion would otherwise occur. The reactant is then deactivated for a period of time comparable to the transit time across the workload. In this way improved uniformity is obtained by reducing the depletion of the reactant as it flows across the workload.
    Type: Grant
    Filed: July 14, 1982
    Date of Patent: August 30, 1983
    Assignee: Advanced Semiconductor Materials/AM.
    Inventor: George M. Engle