Patents Assigned to Advanced Technology Material, Inc.
  • Patent number: 6984299
    Abstract: The present invention relates to a method and apparatus for determining organic additive concentrations in a sample electrolytic solution, preferably a copper electroplating solution, by measuring the double layer capacitance of a measuring electrode in such sample solution. Specifically, the present invention utilizes the correlation between double layer capacitance and the organic additive concentration for concentration mapping, based on the double layer capacitance measured for the sample electrolytic solution.
    Type: Grant
    Filed: April 27, 2004
    Date of Patent: January 10, 2006
    Assignee: Advanced Technology Material, Inc.
    Inventors: Jianwen Han, Mackenzie E. King
  • Patent number: 6331211
    Abstract: A method and apparatus for forming a low dielectric constant polymeric film on a substrate, by liquid delivery of a parylene precursor reagent, in the form of an organic solution or a neat liquid, subsequent flash vaporization of the neat liquid or organic solution, pyrolytic “cracking” of the precursor to form the reactive monomer and/or reactive radical species, and condensation and polymerization of the monomer and/or reactive radical species to form a low dielectric constant polymeric film on the substrate. The low dielectric constant polymeric film may comprise a parylene film, formed from a precursor such as [2.2]paracyclophane, an alkyl- and/or halo-substituted derivative thereof, or an analogous compound of a p-xylene derivative.
    Type: Grant
    Filed: August 10, 2000
    Date of Patent: December 18, 2001
    Assignee: Advanced Technology Material, Inc.
    Inventors: Chongying Xu, Thomas H. Baum, Ralph J. Carl, Edward A. Sturm