Abstract: A control feedback system and method for industrial processes using automated particle or object analysis is disclosed. The control feedback system and method includes a particle characteristic measuring unit to obtain first measured characteristics of a first sample and second measured characteristics of a second sample, the first sample having a substantially different characteristic than the second sample; an optimal characteristic definition for comparison with the first and second measured characteristics; a corrective action database to define and select actions to be taken in response to a comparison of the first and second measured characteristics with the optimal characteristic definition; and a control line network to transfer control signal to a plurality of processing units in response to a selected action to be taken. Other methods and apparatuses are also described.
Type:
Grant
Filed:
July 12, 2002
Date of Patent:
April 26, 2005
Assignee:
Advanced Vision Particle Measurement, Inc.
Inventors:
Kenneth John Lieber, Ian B. Browne, John Tuttle
Abstract: A control feedback system and method for industrial processes using automated particle or object analysis is disclosed. The control feedback system and method includes a particle characteristic measuring unit to obtain measured characteristics of a bulk material sample; an optimal characteristic definition for comparison with the measured characteristics; a corrective action database for defining and selecting actions to be taken in response to a comparison of the measured characteristics with the optimal characteristic definition; and a control line network to transfer control signals to a plurality of processing units in response to a selected action to be taken.
Type:
Grant
Filed:
May 18, 2001
Date of Patent:
September 30, 2003
Assignee:
Advanced Vision Particle Measurement, Inc.