Patents Assigned to Advanced Wet Technologies GmbH
  • METHOD AND APPARATUS FOR TREATING AT LEAST ONE SUBSTRATE IN A LIQUID MEDIUM
    Publication number: 20150083171
    Abstract: A method for treating at least one substrate (15), particularly wafers, in a liquid medium (3). In a first step, the substrate (15) is lifted in the liquid medium (3) until the substrate (15) is at least partially lifted out of the liquid medium (3) and, in a second step, is passed on at least one point protruding out of the liquid medium (3).
    Type: Application
    Filed: April 26, 2013
    Publication date: March 26, 2015
    Applicant: AWT ADVANCED WET TECHNOLOGIES GMBH
    Inventors: Hans Hauger, Werner Schulz
  • Gas Expansion Displacement CNX Concept, Methods and Apparatus
    Publication number: 20140083462
    Abstract: A cyclic bubble generation and termination process can be used to effectively clean objects in a liquid. The bubbles can be generated from dissolved gas in the liquid during a pressurizing phase of the cyclic bubble process. Alternatively, the bubbles can be generated from as a by-product in a chemical reaction between chemicals in the liquid and material or chemicals at the surface of a part being processed. A vacuum process or a hyperbaric process can be used for cycling the pressure.
    Type: Application
    Filed: September 25, 2013
    Publication date: March 27, 2014
    Applicant: Advanced Wet Technologies GmbH
    Inventor: Richard W. Plavidal
  • Hyperbaric CNX for Post-Wafer-Saw Integrated Clean, De-Glue, and Dry Apparatus & Process
    Publication number: 20130276823
    Abstract: Silicon plates can be cleaned, rinsed and dried by hyperbaric superheated liquid and superheated steam. The superheated liquid can be used to clean and rinse the silicon plates after being saw from a silicon block. A slow drain can be open to remove the superheated liquid. A fast drain then can be open, preferably to atmosphere, to allow steam to vent through bottom. The fast drain can function as a drying process, vaporizing water droplets down the drain with the escaping steam.
    Type: Application
    Filed: April 24, 2013
    Publication date: October 24, 2013
    Applicant: Advanced Wet Technologies GmbH
    Inventor: Richard W. Plavidal
  • Hyperbaric methods and systems for rinsing and drying granular materials
    Publication number: 20130276822
    Abstract: Polysilicon granules can be cleaned, rinsed and dried by hyperbaric superheated liquid and superheated steam. The superheated liquid can be used to rinse and heating the polysilicon granules. A slow drain can be open to remove the superheated liquid. A fast drain then can be open, preferably to atmosphere, to allow steam to vent through bottom. The fast drain can function as a drying process, vaporizing water droplets down the drain with the escaping steam.
    Type: Application
    Filed: April 18, 2013
    Publication date: October 24, 2013
    Applicant: Advanced Wet Technologies GmbH
    Inventor: Richard W. Plavidal
  • Dynamic chamber for cycle nucleation technology
    Publication number: 20130276819
    Abstract: A dynamic cyclic nucleation transport (D-CNX) process can be used to wet process an object, such as cleaning or etching. In the D-CNX process, the chamber volume is cyclically enlarged and reduced, effectively reducing and increasing the chamber pressure, respectively. During the pressure reduction phase, bubbles can be generated, which can be terminated or travel to the liquid surface during the pressure increment phase. The generation and termination of bubbles can clean or etch the object, even in hard to reach places.
    Type: Application
    Filed: April 17, 2013
    Publication date: October 24, 2013
    Applicant: Advanced Wet Technologies GmbH
    Inventor: Richard W. Plavidal