Abstract: A method for manufacturing neutral color antireflective glass substrates by ion implantation, the method including ionizing a N2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 20 kV and 25 kV and setting the ion dosage at a value between 6×1016 ions/cm2 and ?5.00×1015×A/kV+2.00×1017 ions/cm2. A neutral color antireflective glass substrates including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.

Abstract: A method of implanting ions to modify the invading ion surface layer concentration of a chemically strengthened glass substrate, where the ions are selected from the group consisting of N, H, O, He, Ne, Ar, and Kr and are implanted in the chemically strengthened glass substrate with a dosage between 1014 ions/cm2 and 1018 ions/cm2, and an acceleration voltage between 5 kV and 100 kV.

Abstract: A method for manufacturing antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, or O2, ionizing the source gas so as to form a mixture of single charge and multicharge ions of N, or O, forming a beam of single charge and multicharge ions of N, or O by accelerating with an acceleration voltage A between 13 kV and 40 kV and setting the ion dosage at a value between 5.56×1014×A/kV+4.78×1016 ions/cm2 and ?2.22×1016×A/kV+1.09×1018 ions/cm2, as well as antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.

Abstract: The present invention relates to a coated substrate comprising: a substrate; a soft coating provided on at least a part of at least one face of the substrate; a protective sol-gel coating provided on at least a part of said face above the soft coating, to a process for making such coated substrate and to glazing units comprising such coated substrate.

Abstract: A light-emitting device includes a substrate that is at least partially transparent to optical radiation and has a first index of refraction. A diode region is disposed on a first surface of the substrate and is configured to emit light responsive to a voltage applied thereto. An encapsulation layer may be disposed on a second surface of the substrate and has a second index of refraction. An antireflective layer stack is formed within the substrate directly below the second surface of the substrate. The antireflective layer has an amorphous non-porous first layer, a porous second layer, an optional amorphous non porous third layer, and a fourth layer with modified crystallinity. The encapsulation layer may also be omitted and the substrate's second surface may separate the substrate, which has an antireflective layer stack within the substrate, directly below the second substrate surface, from air.

Abstract: A method for manufacturing neutral color antireflective glass substrates by ion implantation, the method including ionizing a N2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 20 kV and 25 kV and setting the ion dosage at a value between 6×1016 ions/cm2 and ?5.00×1015×A/kV+2.00×1017 ions/cm2. A neutral color antireflective glass substrates including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.

Abstract: The present invention relates to solar-control glazings intended to be fitted in buildings, but also in motor vehicles. They comprise a glass substrate carrying a transparent multilayer stack comprising an alternation of n silver-based functional layers that reflect infrared radiation and of n+1 dielectric coatings, with n?1, such that each functional layer is surrounded by dielectric coating. At least one of the dielectric coatings comprises a substantially metallic solar radiation absorbing layer based on at least one element selected from the group consisting of Co, Ru, Rh, Re, Os, Ir, Pt, enclosed between and in contact with two dielectric oxide layers.

Abstract: The present invention relates to solar-control glazings intended to be fitted in buildings, but also in motor vehicles. They comprise a glass substrate carrying a transparent multilayer stack comprising an alternation of n silver-based functional layers that reflect infrared radiation and of n+1 dielectric coatings, with n?1, such that each functional layer is surrounded by dielectric coating. At least one of the dielectric coatings comprises a substantially metallic solar radiation absorbing layer based on Pd, enclosed between and in contact with two dielectric oxide layers of at least one element selected from Zn, Sn, Al, In, Nb, Ti and Zr.

Abstract: The present invention relates to a coated substrate comprising: a substrate; a soft coating provided on at least a part of at least one face of the substrate; a protective sol-gel coating provided on at least a part of said face above the soft coating, to a process for making such coated substrate and to glazing units comprising such coated substrate.

Abstract: The present invention relates to an electrode pair for generating a linear plasma wherein the electrodes (21, 22) are segmented. More particularly, the present invention relates to a plasma source, for instance a hollow-cathode plasma source, comprising one or more plasma-generating electrode pairs wherein the electrodes are segmented. The present invention further relates to methods for controlling the uniformity of a linear plasma and also to methods for surface treating or coating substrates in a uniform way with linear plasma sources.

Abstract: The invention relates to heat treatable solar control glazing showing low-emissivity properties, and possibly also anti-solar properties and methods to manufacture such glazing. They comprise a transparent substrate coated with a stack of thin layers comprising n functional layer(s) reflecting infrared radiation and n+1 dielectric layers, with n?1, each functional layer being surrounded by dielectric layers. At least one dielectric layer above a functional layer comprises a layer consisting essentially of silicon oxide, preferably deposited by PECVD, and the stack comprises a barrier layer based on zinc oxide above and in direct contact with any functional layer which has a silicon oxide layer in the dielectric layer directly above it.

Abstract: A method for manufacturing antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, or O2, ionizing the source gas so as to form a mixture of single charge and multicharge ions of N, or O, forming a beam of single charge and multicharge ions of N, or O by accelerating with an acceleration voltage A between 13 kV and 40 kV and setting the ion dosage at a value between 5.56×1014×A/kV+4.78×1016 ions/cm2 and ?2.22×1016×A/kV+1.09×1018 ions/cm2, as well as antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.

Abstract: A method for manufacturing blue reflective glass substrates by ion implantation, the method including ionizing a N2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 15 kV and 35 kV and a dosage D between ?9.33×1015×A/kV+3.87×1017 ions/cm2 and 7.50×1017 ions/cm2. A blue reflective glass substrate including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.

Abstract: The invention concerns a method for manufacturing glass substrates with reduced internal reflectance by ion implantation, comprising ionizing a source gas of N2, O2, Ar, and/or He so as to form a mixture of single charge and multicharge ions of N, O, Ar, and/or He forming a beam of single charge and multicharge ions of N, O, Ar, and/or He, by accelerating with an acceleration voltage comprised between 15 kV and 60 kV and an ion dosage comprised between 1017 ions/cm2 and 1018 ions/cm2. The invention further concerns glass substrates having reduced internal reflectance, comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.

Abstract: The invention concerns a method for manufacturing heat treatable antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, O2, or Ar, ionizing the source gas so as to form a mixture of single charge and multicharge ions of Ar, N, or O, forming a beam of single charge and multicharge ions of Ar, N, or O by accelerating with an acceleration voltage comprised between 15 kV and 60 kV and setting the ion dosage at a value comprised between 7.5×1016 and 7.5×1017 ions/cm2. The invention further concerns heat treatable and heat treated antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.

Abstract: The invention concerns a method for manufacturing scratch-resistant antireflective glass substrates by ion implantation, comprising ionizing a source gas of N2 so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N, by accelerating with an acceleration voltage comprised between 20 kV and 30 kV and an ion dosage comprised between 5×1016 ions/cm2 and 1017 ions/cm2. The invention further concerns scratch-resistant antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.

Abstract: The invention relates to heat treatable solar control glazing showing low-emissivity properties, and possibly also anti-solar properties and methods to manufacture such glazing. They comprise a transparent substrate coated with a stack of thin layers comprising n functional layer(s) reflecting infrared radiation and n+1 dielectric layers, with n?1, each functional layer being surrounded by dielectric layers. At least one dielectric layer above a functional layer comprises a layer consisting essentially of silicon oxide, preferably deposited by PECVD, and the stack comprises a barrier layer based on zinc oxide above and in direct contact with any functional layer which has a silicon oxide layer in the dielectric layer directly above it.