Abstract: A compound including the following Group 1, a partial structure that is an alkylene chain or a polyalkylene oxide chain, and the following Group 2: Group 1: —SiR13 Group 2: —Si(R2)nL3-n where each of pieces of R1 independently represents a hydrocarbon group or a trialkylsilyloxy group, each of pieces of R2 independently represents a hydrocarbon group, each of pieces of L independently represents a hydrolyzable group or a hydroxyl group, and n is an integer from 0 to 2.

Abstract: A compound containing a linear alkyl group having 19 or more carbon atoms or a linear alkylene group having 19 or more carbon atoms, and a reactive silyl group linked to the linear alkyl group having 19 or more carbon atoms or the linear alkylene group having 19 or more carbon atoms, directly or via a polyvalent linking group, a composition and a surface treatment agent including the compound, and an article and a method of producing an article using the surface treatment agent.

Abstract: A gallium oxide film production apparatus includes: a reaction chamber; a substrate disposition portion located in the reaction chamber and configured to dispose a substrate for growing a gallium oxide; a gallium element supply device configured to supply a gallium element to the substrate disposition portion; an oxygen element supply device configured to supply oxygen constituent particles to the substrate disposition portion; and a mixed gas supply device configured to supply a mixed gas containing oxygen and ozone to the oxygen element supply device. The oxygen element supply device includes a plasma generation unit configured to generate plasma from the mixed gas.

Abstract: The present invention relates to a glass including, in mol % in terms of oxides: 68% or more of SiO2; 0.1% to 8% of Al2O3; and 0.1% to 4% of SrO, in which [SiO2]+[B2O3] is 88% or more, [B2O3]?([RO]+[R2O]?[Al2O3]) is 27% or less, a relative dielectric constant at 25° C. and a frequency of 10 GHz is 4.5 or less, a dielectric loss tangent at 25° C. and a frequency of 10 GHz is 0.005 or less, ?Abs-OH is 4.0 or less, a total content (RO) of MgO, CaO, SrO, and BaO is more than 0% to 6%, a total content (R2O) of Li2O, Na2O, and K2O is 0% to 1%, [Al2O3]?[RO] is ?3% to less than 8%, [Al2O3]×[RO] is more than 0 to 30, [MgO]+[CaO] is 0.1% to 5.9%, and [MgO]/([MgO]+[Al2O3]) is 0 to 0.45.

Abstract: A reflective mask blank includes: a substrate, a multilayer reflective film including molybdenum layers and silicon layers alternately and being configured to reflect EUV light, an intermediate film, a protective film, and an absorber film, in this order, in which the intermediate film includes silicon and nitrogen, an atomic weight ratio of a content of the nitrogen to a content of the silicon is 0.22 to 0.40 or 0.15 or less, the protective film includes one or more layers selected from the group consisting of a layer including rhodium and a layer including a rhodium-containing material, and the rhodium-containing material includes rhodium and one or more elements selected from the group consisting of boron, carbon, nitrogen, oxygen, silicon, titanium, zirconium, niobium, molybdenum, ruthenium, palladium, tantalum, and iridium.

Abstract: A glass substrate for EUVL includes a first main surface having a rectangular shape; a second main surface having a rectangular shape on an opposite side to the first main surface; four end surfaces orthogonal to the first and second main surfaces; four first chamfered surfaces formed on boundaries between the first main surface and the end surfaces; and four second chamfered surfaces formed on boundaries between the second main surface and the end surfaces. The glass substrate for EUVL is formed of quartz glass containing TiO2. The end surfaces include fluorine (F) and an element (A) other than fluorine that forms a gas cluster with fluorine, and satisfy relations: S ? 1 = ? 0 x = 50 [ nm ] { D ? 1 ? ( x ) - ( a ? 1 ? x + b ? 1 ) } ? dx > 0.2 ( 1 ) S ? 2 = ? 0 x = 50 [ nm ] { D ? 2 ? ( x ) - ( a ? 2 ? x + b ? 2 ) } ? dx > 0.

Abstract: An electroconductive-film-coated substrate includes a glass substrate and an electroconductive film disposed on one main surface of the glass substrate. The electroconductive film has an inclined portion in a peripheral edge. A distance from a position in the inclined portion where a thickness of the electroconductive film is 10% of a film thickness of a center of the electroconductive film to an edge end of the glass substrate is 3.00 mm or less. A distance from an end of the inclined portion to the edge end of the glass substrate is longer than 0.00 mm.

Abstract: A liquid composition containing a thermosetting resin, first silica particles, second silica particles, and a solvent, in which the first silica particles have a median diameter d50 of from 1.5 ?m to 20.0 ?m, the product of a specific surface area and the median diameter d50 being from 2.7 to 5.0 ?m m2/g, and the second silica particles have a median diameter d50 of from 0.3 ?m to less than 1.5 ?m; and a prepreg, a metal substrate with a resin, and a wiring board using the same are provided.

Abstract: A method of producing a fluorine-containing copolymer includes performing suspension polymerization by using monomers including ethylene and tetrafluoroethylene in a polymerization medium including water and a polymerization solvent A that is not compatible with water and that is at least one kind selected from the group consisting of compounds represented by Formulae 1 to 3. In the method, the proportion of water to the polymerization medium is from 10% by volume to 80% by volume, the solubility of the polymerization solvent A to the water at 25° C. is 500 g/L or less, and the solubility of the water to the polymerization solvent A at 25° C. is 500 g/L or less. Descriptions regarding Formulae 1 to 3 are omitted.

Abstract: A compound including the following Group 1, a partial structure that is an alkylene chain, a polyalkylene oxide chain, a divalent organopolysiloxane residue, or a combination thereof, and the following Group 2. Group 1: monovalent cyclic polysiloxane residue or monovalent cage-like polysiloxane residue Group 2: —Si(R2)nL3-n R2 is a monovalent hydrocarbon group, each of pieces of L is independently a hydrolyzable group or a hydroxyl group, and n is an integer from 0 to 2.

Abstract: A chemically strengthened glass sheet in which a value of SB/(SA×t) is 5.0 mm?1 or more, where SA (MPa·?m) is an integrated value of a 5 compressive stress from a surface of the glass sheet to a depth of 10 ?m, SB (MPa·?m) is an integrated value of a compressive stress from the depth of 10 ?m to DOL which is a depth at which the compressive stress is zero, and t (mm) is a thickness of the glass sheet.

Abstract: An ABA triblock polymer including an A block and a B block, in which the A block is a random polymer including a constituent unit derived from a reactive group-containing polymerizable monomer and a constituent unit derived from a hydrophobic group-containing polymerizable monomer, and the B block contains a divalent organopolysiloxane residue in a main chain, as well as applications thereof.

Abstract: A liquid composition containing a thermosetting resin and silica particles, in which (1) the d50 and specific surface area of the silica particles are within a particular range, and the viscosity of the composition is within a particular range, (2) the d50 of the silica particles and the product of the specific surface area and the d50 are in particular ranges, and the liquid composition further contains a solvent having a specific surface tension, (3) the d50/d10 of the silica particles is in a particular range, the liquid composition further contains a solvent having a specific boiling point and a specific evaporation rate, and the thixotropy ratio of the composition is in a specific range, or (4) the proportion of silica particles having a particle diameter of 10 ?m or more, the coefficient of variation of particle diameter, and the d50 are within particular ranges; and applications thereof.

Abstract: An anti-reflective film-attached transparent substrate includes: a transparent substrate comprising two main surfaces; and a diffusion layer and an anti-reflective film in this order from a transparent substrate side on one main surface of the transparent substrate. When reflection on the other main surface of the transparent substrate is eliminated and a light source is incident on the one main surface at an incident angle of 45°, a* and b* of diffusely reflected lights at angles of ?15°, 15°, 25°, 45°, 75°, and 110° with respect to a specularly reflected light under a D65 light source satisfy formulas (1) ?6?a*?2, (2) ?1?b*?12 (3) b*??2a*+4, and (4) b*??2a*?5.

Abstract: An ABA triblock polymer, in which an A block is a random polymer including a constituent unit derived from a reactive group-containing polymerizable monomer and a constituent unit derived from a reactive group-free polymerizable monomer, a B block contains a polyalkylene oxide chain or a divalent organopolysiloxane residue in a main chain, the constituent unit derived from a reactive group-free polymerizable monomer contains a constituent unit derived from a hydrophobic group-containing polymerizable monomer in a case in which the B block contains a polyalkylene oxide chain in a main chain, and the constituent unit derived from a reactive group-free polymerizable monomer contains a constituent unit derived from a hydrophilic group-containing polymerizable monomer in a case in which the B block contains a divalent organopolysiloxane residue in a main chain, as well as applications thereof. The details of the reactive group, the hydrophobic group, and hydrophilic group are omitted.

Abstract: A windshield for vehicle includes a laminated glass in which a plurality of glass plates are bonded together with an intermediate film interposed therebetween, in which: the laminated glass includes a glass plate with a terminal, the glass plate with the terminal including a glass plate of the plurality of glass plates, a conductor, and the terminal, the conductor being formed on one surface of the glass plate, the conductor including a material containing silver and glass frit, the conductor having a terminal joint portion to which the terminal is joined, the terminal being joined onto the terminal joint portion with lead-free solder interposed therebetween; the conductor includes the terminal joint portion; and at least a surface of the terminal joint portion has a compressive stress portion.

Abstract: A glass for an optical filter, the glass being a phosphate glass including Cu, in which the glass has: an average transmittance of 80% or more at a wavelength of 430 nm to 550 nm; an average transmittance of 2% or less at a wavelength of 800 nm to 950 nm; an average transmittance of 3% or less at a wavelength of 1000 nm to 1200 nm; an average transmittance of 5% or less at a wavelength of 700 nm to 1200 nm; a transmittance of 25% or more at a wavelength of 1550 nm; and a wavelength at which a transmittance is 50% of 615 nm or more in a wavelength range of 600 nm to 800 nm.

Abstract: A tiling display is obtained by arranging a plurality of unit panels, each including an anti-reflective film-attached transparent substrate on a display surface side. The anti-reflective film-attached transparent substrate includes a transparent substrate, a diffusion layer, and an anti-reflective film in this order toward the display surface side, and two of the unit panels adjacent to each other satisfy the condition 1.

Abstract: An anti-reflective film-attached transparent substrate includes a transparent substrate and an anti-reflective film. The anti-reflective film has a laminated structure in which at least two layers having different refractive indices are laminated, at least one layer is mainly formed of a Si oxide, at least another layer is a mixed oxide layer mainly formed of a mixed oxide containing Mo and Nb, the mixed oxide layer contains an oxide of at least one high hardness metal element selected from the group consisting of W, Cr, Mn, Ni, Zr, Ta, and Be, a proportion of Mo to a total of Mo and Nb in the mixed oxide layer is 60 at % or less, and a proportion of a total of the high hardness metal element to a total of metal elements in the mixed oxide layer is 12 at % or more.

Abstract: A compound that contains at least two linear alkylene groups, a trivalent or higher valent linking group to which the at least two linear alkylene groups are bonded, and a reactive silyl group that is bonded to the trivalent or higher valent linking group; a composition and a surface treatment agent that contain the compound; and an article and a method of producing an article that use the surface treatment agent.