Abstract: A method for producing a sulfide-based solid electrolyte includes: heating and melting a first sulfide-based solid electrolyte raw material in a furnace to obtain a first melt; supplying a second sulfide-based solid electrolyte raw material to the first melt; heating and melting an obtained mixture in a gas atmosphere containing a sulfur element; and cooling an obtained second melt.

Abstract: A method for producing a sulfide-based solid electrolyte includes heating and melting a raw material in a heating furnace. The heating furnace includes a sulfur supply portion, a partition provided inside the heating furnace, and one or more other structures capable of allowing an inside and an outside of the heating furnace to communicate with each other. The method includes: forming a melt by heating and melting the raw material; dividing a space between the melt and the heating furnace by the partition into a first space in which the sulfur supply portion is located and a second space in which the other structure is located; and forming a sulfur-excess atmosphere portion by introducing a component containing a sulfur element into the first space from the sulfur supply portion.

Abstract: A method for producing magnetic particles containing a manganese-aluminum alloy includes: mixing manganese particles, an aluminum source, an activator containing a halide, and an anti-sintering agent to obtain a mixed powder; heating the mixed powder to calorize the manganese particles by utilizing gaps between particles of the anti-sintering agent formed by the anti-sintering agent, to obtain a treated mixture containing magnetic particles containing a manganese-aluminum alloy, wherein a mass ratio of aluminum to manganese (Al/Mn) in the manganese-aluminum alloy is in a range from 25/75 to 35/65; removing the anti-sintering agent from the treated mixture to recover the magnetic particles containing the manganese-aluminum alloy.

Abstract: A method for producing a sulfide-based solid electrolyte powder includes: heating and melting a sulfide-based solid electrolyte raw material in a furnace; and spraying a gas onto an obtained melt while discharging the melt from the furnace to cool, solidify, and powder the melt. A spraying pressure of the gas may be 0.2 MPa to 10 MPa.

Abstract: The present invention relates to a glass article 2 including a first main surface 2A, a second main surface 2B, and an end surface 2C connecting the first main surface 2A and the second main surface 2B, in which the end surface 2C includes a side surface portion 2CC, a first chamfered portion 2CA connecting the side surface portion 2CC and the first main surface 2A, and a second chamfered portion 2CB connecting the side surface portion 2CC and the second main surface 2B, and a parameter R defined by Formula (1) satisfies Formula (2) (in expression (1), Ecg, A, B, C, D, and t, are as defined in the specification). (1): R=0.38·Ecg?A/t?2.61·B/t+4.38·C/t?10.6·D/t (2): R?23.

Abstract: A glass for chemical strengthening including, in mol % in terms of oxides: 50% to 65% of SiO2; 15% to 25% of Al2O3; 2% to 10% of B2O3; 0% to 15% of P2O5; 0% to 15% of ZnO; 0% to 10% of MgO; 0% to 15% of CaO; 3% to 15% of Li2O; 2.5% to 15% of Na2O; 0% to 5% of K2O; 0% to 5% of ZrO2; 0% to 5% of Y2O3; and 0% to 5% of TiO2, in which [Li2O]/([Na2O]+[K2O]) is 0.5 to 3.5, and [Al2O3]+[Li2O] is 27% to 35%, provided that in the formulas, [ ] indicates a content of each component described in the parentheses in mol % in terms of oxides.

Abstract: A supporting glass substrate includes a compression stress layer on a surface thereof, and has an average thermal expansion coefficient at 50° C. to 200° C. that is 7 ppm/° C. to 15 ppm/° C., an internal tensile stress that is 5 MPa to 55 MPa, and a depth of the compression stress layer that is 10 ?m to 60 ?m.

Abstract: A reflective mask blank for EUV lithography, includes: a substrate; a conductive film; a reflective layer; and an absorption layer, the absorption layer absorbing the EUV light, wherein the conductive film has a refractive index n?1000-1100 nm of 5.300 or less and has an extinction coefficient k?1000-1100 nm of 5.200 or less, at a wavelength of 1000 nm to 1100 nm, the conductive film has a refractive index n?600-700 nm of 4.300 or less and has an extinction coefficient k?600-700 nm of 4.500 or less, at a wavelength of 600 nm to 700 nm, the conductive film has a refractive index n?400-500 nm of 2.500 or more and has an extinction coefficient k?400-500 nm of 0.440 or more, at a wavelength of 400 nm to 500 nm, and the conductive film has a film thickness t of 40 nm to 350 nm.

Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light. The substrate, the multilayer reflective film, the protection film, and the phase shift film are arranged in this order. The phase shift film is made of an Ir-based material containing Ir as a main component, and the protection film is made of a Rh-based material containing Rh as a main component.

Abstract: The present invention relates to a silica particle dispersion including spherical silica particles and a solvent, in which the spherical silica particles have a median diameter d50 of 0.5 ?m to 20 ?m, and a product A×d50 of 2.7 ?m·m2/g to 5.0 ?m·m2/g, the product A×d50 being a product of a specific surface area A (m2/g) of the spherical silica particles and the median diameter d50 (?m).

Abstract: The electromagnetic wave reflecting device includes: a reflection panel that reflects a radio wave of a desired band selected from a frequency band between 1 GHz and 170 GHz; and a frame that holds the reflection panel. The frame has a conductive portion. The reflection panel is held by the frame so that an edge of the reflection panel is not exposed to an outside of the frame. At least a part of the conductive portion of the frame is covered with a non-conductive protecting member or protective coating.

Abstract: The present invention relates to a silica particle dispersion including: hollow silica particles; and a solvent, in which the hollow silica particles have an average particle diameter in a range of 0.2 ?m to 10 ?m. The present invention relates to the silica particle dispersion in which the hollow silica particles have a particle density of 0.35 g/cm3 to 2.00 g/cm3, the particle density being determined by density measurement with a dry pycnometer using argon gas.

Abstract: An optical filter includes: a substrate; and a dielectric multilayer film laid on or above at least one major surface of the substrate, in which the substrate includes a resin layer, the resin layer includes a transparent resin, a UV dye, and an IR dye that has a maximum absorption wavelength at a wavelength of 650 nm to 800 nm, and the UV dye satisfies all of characteristics (i-1) to (i-4).

Abstract: The present invention relates to a laminated glass for a vehicle, the laminated glass having an intermediate film between an outer glass plate and an inner glass plate, includes: a test area A defined by JIS Standard R3212; an information transmitting/receiving area in which a device installed in a vehicle transmits and/or receives information; a film capable of heating the information transmitting/receiving area, the film being adhered to an area that is outside of the test area A and overlaps the information transmitting/receiving area in a planar view between the intermediate film and either one of the outer glass plate or the inner glass plate.

Abstract: A glass substrate includes: a first major surface; a second major surface that is opposite to the first major surface; an end surface interposed between the first major surface and the second major surface; a first boundary surface that is interposed between the first major surface and the end surface and connected to the end surface; and a second boundary surface that is connected to the first major surface and the first boundary surface. The second boundary surface is a convex curved surface, and the second boundary surface has a radius of curvature R2 of 0.1 mm or larger and 2.0 mm or smaller.

Abstract: According to the present invention, provided is a heater including a heat generating member being conductive and configured to radiate heat rays by being fed with electric power, a tubular member constituted by a metal and accommodating the heat generating member, and an intermediate member arranged between the heat generating member and the tubular member and constituted by an electrically insulating material, wherein the intermediate member is arranged and/or configured to allow, among the heat rays radiated from the heat generating member, at least light having a wavelength of from 1 ?m to 2 ?m to pass through the intermediate member to reach the tubular member.

Abstract: A laminated body includes a glass substrate; and a laminated film installed on a surface of the glass substrate. The laminated film includes, from a side of the glass substrate, a first layer containing silicon nitride; a second layer containing silicon; and a third layer containing silicon nitride. A transmittance of visible light incident from the side of the glass substrate is greater than or equal to 10%. A surface resistance value measured from a side of the laminated film is greater than 200 ?/sq.

Abstract: A reflective mask blank, which is a binary reflective mask blank, includes, in order: a substrate; a multilayer reflective film configured to reflect EUV light; and a pattern film. The pattern film has a laminated structure including a total of L layers each having a different refractive index where L is a natural number of 2 or more. When an absorption coefficient of an i-th layer in the pattern film from a side opposite to the substrate is defined as ki, a thickness of the i-th layer in the pattern film from the side opposite to the substrate is defined as di (nm), a total thickness of the pattern film is defined as d, an exposure wavelength is defined as ? (nm), and Pi is defined as 1?exp(?2?/?*diki), the following formula (1) is satisfied. ? i = 1 L ( P i / d ) > 0.

Abstract: A glass plate (a glass plate for cover glasses) with a low concentration of impurities is produced using article cullet. A process of melting glass raw materials and cullet and producing therefrom a glass plate is repeated. The glass plate is further processed into a glass article. The glass article is a cover glass for displays, including the glass plate and a coating provided on a surface of the glass plate. The cullet used includes glass plate cullet that is cullet of the glass plate and article cullet that is cullet of the article cullet. At least one of the mixing ratio of the glass raw material, the mixing ratio of the glass plate cullet, the mixing ratio of the article cullet, the impurity concentration in the glass plate cullet and the impurity concentration in the article cullet is adjusted in accordance with at least one of the impurity concentration in the glass plate cullet and the impurity concentration in the article cullet.

Abstract: An optical filter includes: an absorber including an inorganic material including ytterbium; an absorption layer including a dye and a resin, the dye having a maximum absorption wavelength between 350 nm and 1,200 nm; and a dielectric multilayer film. The absorber may have a flat plate shape, and the absorber may have a thickness of 3 mm or less.