Patents Assigned to AGC Inc.
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Patent number: 12222640Abstract: A reflective mask blank containing a substrate, a multilayer reflective film that reflects EUV light, and a phase shift film that shifts a phase of the EUV light, the substrate, the multilayer reflective film, and the phase shift film being arranged in this order. The phase shift film contains a compound containing Ru and Cr, an element ratio between Cr and Ru (Cr:Ru) in the phase shift film is 5:95 to 42:58, and a melting point MP1 of an oxide of the compound and a melting point MP2 of a fluoride or an oxyfluoride of the compound satisfy the following relation (1): 0.625MP1+MP2?1000??(1).Type: GrantFiled: October 20, 2023Date of Patent: February 11, 2025Assignee: AGC Inc.Inventors: Shunya Taki, Hiroaki Iwaoka, Daijiro Akagi, Ichiro Ishikawa
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Patent number: 12222532Abstract: An optical element includes a three-dimensional structure having a curved surface; and a retardation plate bent along the curved surface. The retardation plate includes a transparent substrate and a liquid crystal layer formed over the transparent substrate. The retardation plate has a slow axis and a fast axis. A glass-transition temperature, Tgne, in a slow axis direction of the retardation plate is higher than a glass-transition temperature, Tgno, in a fast axis direction of the retardation plate.Type: GrantFiled: May 24, 2024Date of Patent: February 11, 2025Assignee: AGC Inc.Inventors: Kenta Sekikawa, Hiromichi Nagayama, So Ishido
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Patent number: 12222222Abstract: A sensor cover, provided in an opening of a housing that houses a sensor, includes a conductor; a dielectric multilayer film; and a heating film, in a desired order from an outside of the housing toward an inside of the housing. The conductor and the heating film are insulated from each other. A shortest distance between the conductor and the heating film is 2.0 ?m or more.Type: GrantFiled: April 3, 2024Date of Patent: February 11, 2025Assignee: AGC Inc.Inventors: Kazuya Takemoto, Atsushi Koyanagi, Naoto Tatsuoka
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Publication number: 20250041491Abstract: A medical device where the non-specific absorption amount is reduced, durability is excellent, and eluents from the surface layer are reduced. The medical device includes a device substrate and a surface layer provided on at least part of the surface of the device substrate in contact with water, where the part of the surface of the device substrate is made of an inorganic material, the surface layer is made of a cured product of a compound having a biocompatible group and an alkoxysilyl group, the content of the biocompatible group in the compound is from 25 to 83% by mass, and the content of the alkoxysilyl group is from 2 to 70% by mass.Type: ApplicationFiled: October 1, 2024Publication date: February 6, 2025Applicant: AGC Inc.Inventors: Ryohei KOGUCHI, Hajime EGUCHI, Kyoko YAMAMOTO
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Publication number: 20250044490Abstract: An optical filter includes: a light-absorbing material X800S having a maximum absorption wavelength in a wavelength region shorter than 800 nm; a light-absorbing material Y850L having a maximum absorption wavelength in a wavelength region longer than 850 nm; and a dielectric multilayer film, in which the optical filter satisfies spectral characteristics (i-1) to (i-5).Type: ApplicationFiled: October 22, 2024Publication date: February 6, 2025Applicant: AGC Inc.Inventors: Motoshi NAKAYAMA, Takahiro SAKAGAMI, Takashi NAGATA, Kazuhiko SHIONO
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CURABLE POLYMER, CURABLE COMPOSITION, PREPREG, MULTILAYER BODY, METAL CLAD LAMINATE AND WIRING BOARD
Publication number: 20250043050Abstract: A curable polymer containing one or more type(s) of structural units (UX) represented by the following formula and which is for production of a prepreg, a metal clad laminate or a wiring board: in which X is a single bond or an oxygen atom; the benzene ring optionally has a substituent other than the substituent in the above formula; and n is an integer of 0 or more.Type: ApplicationFiled: October 10, 2024Publication date: February 6, 2025Applicant: AGC Inc.Inventors: Kazumi HASHIMOTO, Tsukasa USUDA, Yusuke YASU, Takafumi IGARASHI -
Publication number: 20250042802Abstract: The present invention relates to a photosensitive glass, having a ?-OH value of 0.20/mm or less. The present invention also relates to the photosensitive glass, having a difference between a crystal precipitation temperature after an exposure and a crystal precipitation temperature before the exposure of 10° C. or more, the exposure being performed so that a cumulative amount of a light having a wavelength of 280 nm to 360 nm is 2 J/cm2 or more.Type: ApplicationFiled: July 31, 2024Publication date: February 6, 2025Applicant: AGC Inc.Inventors: Nobuo INUZUKA, Daichi SHIRAI
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Publication number: 20250043102Abstract: Provided are: a liquid composition containing a thermosetting resin and silica particles, the silica particles (1) having a specific water vapor adsorption amount and a specific moisture retention variation, (2) having a specific charge amount and a specific d50, and (3) having a specific powder friction angle, a specific d50, and a specific aggregation state; a prepreg, a metal substrate with a resin, and a wiring board using the liquid composition; and silica particles used in the liquid composition.Type: ApplicationFiled: October 23, 2024Publication date: February 6, 2025Applicants: AGC INC., AGC SI-TECH CO., LTD.Inventor: Hiromichi KAMO
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CURABLE POLYMER, CURABLE COMPOSITION, PREPREG, MULTILAYER BODY, METAL CLAD LAMINATE AND WIRING BOARD
Publication number: 20250043043Abstract: A curable polymer comprising one or more type(s) of structural units (UX) represented by the following formula and one or more type(s) of other structural units other than the structural units (UX) and a curable polymer comprising only one or more type(s) of structural units (UX) represented by the following formula as structural units, and which is for production of a prepreg, a metal clad laminate or a wiring board. in which R1 and R2 each independently represent a hydrogen atom, a hydroxyl group or an organic group; the benzene ring optionally has a substituent other than the substituent in the above formula; and n is an integer of 0 or more.Type: ApplicationFiled: October 17, 2024Publication date: February 6, 2025Applicant: AGC Inc.Inventors: Kazumi HASHIMOTO, Tsukasa USUDA, Yoshitaka NOMURA, Asuka MATSUNAMI -
Publication number: 20250042808Abstract: A glass plate includes a first principal surface and a second principal surface facing away from the first principal surface, wherein the first principal surface includes an anti-glare surface, and the anti-glare surface includes a plurality of curvingly-recessed surfaces each of which has a spoon-cut shape.Type: ApplicationFiled: October 18, 2024Publication date: February 6, 2025Applicant: AGC Inc.Inventors: Yuki AKAMA, Masanobu ISSHIKI, Yusuke MORI
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Publication number: 20250044489Abstract: The present invention pertains to an optical filter including: a light-absorbing material Y900-1000 having a maximum absorption wavelength in a wavelength region of 900 nm to 1,000 nm, and a dielectric multilayer film, in which the optical filter satisfies all of spectral characteristics (i-1) to (i-6), and the optical filter may satisfy spectral characteristic (i-7).Type: ApplicationFiled: October 22, 2024Publication date: February 6, 2025Applicant: AGC Inc.Inventors: Motoshi NAKAYAMA, Takahiro SAKAGAMI, Takashi NAGATA, Kazuhiko SHIONO
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Patent number: 12216397Abstract: A reflective mask blank for EUV lithography includes: a substrate; a multilayer reflective film for reflecting EUV light; and a phase shift film for shifting a phase of EUV light, the multilayer reflective film and the phase shift film formed on or above the substrate in this order. The phase shift film includes a layer 1 including ruthenium (Ru) and at least one selected from the group consisting of oxygen (O) and nitrogen (N). Among diffraction peaks derived from the phase shift film observed at 2?: from 20° to 50° by out-of-plane XRD method, a peak having the highest intensity has a half value width FWHM of 1.0° or more.Type: GrantFiled: October 17, 2023Date of Patent: February 4, 2025Assignee: AGC Inc.Inventors: Daijiro Akagi, Hirotomo Kawahara, Toshiyuki Uno, Ichiro Ishikawa, Kenichi Sasaki
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Patent number: 12215182Abstract: Provided are a urethane prepolymer from which is obtained an adhesive which has excellent moisture permeability and which attains both low adhesion to skin and high adhesion to a base material, an adhesive, a skin patch material, an adhesive tape, a wearable device, and a wearable device kit. The urethane prepolymer is a hydroxyl-group-terminated urethane prepolymer obtained by reacting an oxyalkylene polymer A having an average number of hydroxyl groups per molecule of 2.1 to 3, an oxyalkylene polymer B in which the number of hydroxyl groups per molecule is 1, and a diisocyanate compound, the number-average molecular weight of the oxyalkylene polymer B being 5000 or greater, and the content of ethylene oxide units in the hydroxyl-group-terminated urethane prepolymer being more than 10 mass %.Type: GrantFiled: August 11, 2021Date of Patent: February 4, 2025Assignee: AGC Inc.Inventors: Makito Nakamura, Haru Kawasaki, Hitoshi Shimoma, Chitoshi Suzuki, Hiroshi Wada
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Patent number: 12216398Abstract: A reflective mask blank includes a substrate and, on or above the substrate in order, a reflective layer for reflecting EUV light, a protective layer for protecting the reflective layer, and an absorbent layer for absorbing EUV light. The absorbent layer has a reflectance for a wavelength of 13.53 nm of from 2.5% to 10% and consists of a lower absorption layer and an upper absorption layer. A film thickness dbi of the absorbent layer satisfies a relationship of: dbi MAX?(i×6+1) nm?dbi?dbi MAX?(i×6?1) nm where the integer i is 0 or 1, and dbi MAX is represented by: d bi ? MAX ( nm ) = 13.53 2 ? n ? cos ? 6 ? ° { INT ( 0.58 1 - n 1 ) + 1 2 ? ? ? ( tan - 1 ( - k 2 1 - n 2 ) + 0.Type: GrantFiled: January 19, 2024Date of Patent: February 4, 2025Assignee: AGC INC.Inventors: Hiroyoshi Tanabe, Hiroshi Hanekawa, Toshiyuki Uno
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Patent number: 12218405Abstract: To provide an antenna set capable of forming a communication area which achieves a relatively high throughput. An antenna set comprising a group of antenna units transmitting streams by distributed MIMO, wherein the group of antenna units has a first antenna unit facing a window glass attached to a building, and a second antenna unit disposed at a distance from the first antenna unit.Type: GrantFiled: January 13, 2023Date of Patent: February 4, 2025Assignee: AGC Inc.Inventors: Yoshiyuki Ikuma, Ryuta Sonoda, Yasushi Higashida, Tetsuya Hiramatsu, Kentaro Oka
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Publication number: 20250034029Abstract: The present invention relates to a glass including, in mol % in terms of oxides: 68% or more of SiO2; 0.1% to 8% of Al2O3; and 0.1% to 4% of SrO, in which [SiO2]+[B2O3] is 88% or more, [B2O3]?([RO]+[R2O]?[Al2O3]) is 27% or less, a relative dielectric constant at 25° C. and a frequency of 10 GHz is 4.5 or less, a dielectric loss tangent at 25° C. and a frequency of 10 GHz is 0.005 or less, ?Abs-OH is 4.0 or less, a total content (RO) of MgO, CaO, SrO, and BaO is more than 0% to 6%, a total content (R2O) of Li2O, Na2O, and K2O is 0% to 1%, [Al2O3]?[RO] is ?3% to less than 8%, [Al2O3]×[RO] is more than 0 to 30, [MgO]+[CaO] is 0.1% to 5.9%, and [MgO]/([MgO]+[Al2O3]) is 0 to 0.45.Type: ApplicationFiled: October 10, 2024Publication date: January 30, 2025Applicant: AGC Inc.Inventors: Takeyuki KATO, Yuya HAMADA, Seiji INABA
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Publication number: 20250036020Abstract: A reflective mask blank includes: a substrate, a multilayer reflective film including molybdenum layers and silicon layers alternately and being configured to reflect EUV light, an intermediate film, a protective film, and an absorber film, in this order, in which the intermediate film includes silicon and nitrogen, an atomic weight ratio of a content of the nitrogen to a content of the silicon is 0.22 to 0.40 or 0.15 or less, the protective film includes one or more layers selected from the group consisting of a layer including rhodium and a layer including a rhodium-containing material, and the rhodium-containing material includes rhodium and one or more elements selected from the group consisting of boron, carbon, nitrogen, oxygen, silicon, titanium, zirconium, niobium, molybdenum, ruthenium, palladium, tantalum, and iridium.Type: ApplicationFiled: October 9, 2024Publication date: January 30, 2025Applicant: AGC Inc.Inventors: Wataru NISHIDA, Daijiro AKAGI, Hiroaki IWAOKA, Hiroshi HANEKAWA, Taiga FUDETANI, Masaru HORI, Takayoshi TSUTSUMI
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Publication number: 20250034428Abstract: A compound containing a linear alkyl group having 19 or more carbon atoms or a linear alkylene group having 19 or more carbon atoms, and a reactive silyl group linked to the linear alkyl group having 19 or more carbon atoms or the linear alkylene group having 19 or more carbon atoms, directly or via a polyvalent linking group, a composition and a surface treatment agent including the compound, and an article and a method of producing an article using the surface treatment agent.Type: ApplicationFiled: September 23, 2024Publication date: January 30, 2025Applicant: AGC Inc.Inventors: Hiroyuki HARA, Koki WATANABE, Motoshi AOYAMA
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Publication number: 20250034180Abstract: A compound including the following Group 1, a partial structure that is an alkylene chain or a polyalkylene oxide chain, and the following Group 2: Group 1: —SiR13 Group 2: —Si(R2)nL3-n where each of pieces of R1 independently represents a hydrocarbon group or a trialkylsilyloxy group, each of pieces of R2 independently represents a hydrocarbon group, each of pieces of L independently represents a hydrolyzable group or a hydroxyl group, and n is an integer from 0 to 2.Type: ApplicationFiled: September 24, 2024Publication date: January 30, 2025Applicant: AGC Inc.Inventors: Koki WATANABE, Motoshi AOYAMA, Yasuhiro HIRATA, Hironobu SAKAGUCHI, Eiichiro ANRAKU, Shiori KAWAKAMI
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Publication number: 20250034752Abstract: A gallium oxide film production apparatus includes: a reaction chamber; a substrate disposition portion located in the reaction chamber and configured to dispose a substrate for growing a gallium oxide; a gallium element supply device configured to supply a gallium element to the substrate disposition portion; an oxygen element supply device configured to supply oxygen constituent particles to the substrate disposition portion; and a mixed gas supply device configured to supply a mixed gas containing oxygen and ozone to the oxygen element supply device. The oxygen element supply device includes a plasma generation unit configured to generate plasma from the mixed gas.Type: ApplicationFiled: September 24, 2024Publication date: January 30, 2025Applicants: NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM, AGC Inc.Inventors: Masaru HORI, Osamu Oda, Arun Kumar Dhasiyan, Atsushi Hayashi, Nobutaka Aomine