Abstract: A probe is shifted at a distance where the probe and a material to be obsed are sufficiently far away from each other relative to the roughness of the material's surface. This method prevents the probe from colliding with the material's surface during the shift of the probe thereby enabling high speed shift of the probe. Further, a micro-drive mechanism for controlling tunnel currents may be stopped during the shift in order to minimize the drift which may be caused by heat generated inside the micro-drive mechanism. Therefore, it is particularly advantageous to apply this STM measuring method for high-speed and stable measurement of a very large surface area and a very rough surface.
Type:
Grant
Filed:
October 13, 1988
Date of Patent:
February 20, 1990
Assignees:
Agency of Industrial Science and Technology, Kosaka Laboratory Ltd., Seiko Instruments Inc.