Abstract: A method for etching an AlTiC workpiece comprises forming a copper mask layer on the AlTiC, lithographically patterning said copper mask layer to thereby expose portions of the AlTiC, reactive ion etching the AlTiC using a process gas comprising argon and fluorine, and removing the mask layer. The walls of the portions of the AlTiC covered by the copper mask layer are vertical, even when etching is to a substantial depth.
Abstract: A burnishing head comprises at least two rails, each rail having an inner wall and an outer wall. The outer walls are at an angle relative to one another and relative to a central axis of the burnishing head. This angle permits the burnishing head to exhibit improved recovery time if it contacts a disk being burnished. The rail walls are vertical, and the corner between the rail walls and the top surface of the rails is sharp.
Type:
Grant
Filed:
April 7, 2006
Date of Patent:
January 1, 2008
Assignees:
Komag, Inc., Ahead Magnetics, Inc.
Inventors:
Balvinder Singh, Howard Temple, Rohini Patel, legal representative, Ravi Patel, legal representative, Geera Peters, legal representative, Jayadev Patel, deceased