Patents Assigned to AKHAN Semiconductor, Inc.
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Patent number: 12288690Abstract: Disclosed herein is a new and improved system and method for fabricating diamond films by first seeding a surface of a transparent substrate. A diamond layer that is at least one of nanocrystalline and ultrananocrystalline can be deposited upon the surface of the transparent substrate and both the diamond layer and the transparent substrate modified to incorporate substitutional atoms.Type: GrantFiled: October 31, 2023Date of Patent: April 29, 2025Assignee: AKHAN SEMICONDUCTOR, INC.Inventor: Adam Khan
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Patent number: 12282018Abstract: Disclosed herein is a system and method for transistor pathogen virus detector in which one embodiment may include a substrate layer, a silicon dioxide layer on the substrate layer, a nanocrystalline diamond layer on the silicon dioxide layer, a graphene oxide layer on the nanocrystalline diamond layer, fluorinated graphene oxide portions; and a linker layer, the linker layer including a plurality of pathogen receptors.Type: GrantFiled: June 5, 2024Date of Patent: April 22, 2025Assignee: AKHAN SEMICONDUCTOR, INC.Inventors: Adam Khan, Ernest Schirmann, Kiran Kumar Kovi
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Patent number: 12204143Abstract: A transparent display includes a display including a transparent substrate and a patterned diamond layer formed on the transparent substrate to at least in part define a diamond waveguide. At least two electronic devices can be connected by the diamond waveguide, and can include a sensor, a transducer, or electronic circuitry, including communication, control, or data processing electronic circuitry.Type: GrantFiled: February 14, 2024Date of Patent: January 21, 2025Assignee: AKHAN SEMICONDUCTOR, INC.Inventors: Adam Khan, Kiran Kumar Kovi, Ernest Schirmann, William Alberth
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Patent number: 12061313Abstract: A system and method for diamond based multilayer antireflective coating for optical windows are provided. An antireflective coatings for optical windows may include an optical grade silicon substrate, a first polycrystalline diamond film on the silicon substrate, a germanium film on the first polycrystalline diamond film, a fused silica film on the germanium film; and a second polycrystalline diamond film on the fused silica film. A method of fabricating a diamond based multilayer antireflective coating may include the steps of cleaning and seeding an optical substrate, forming a first diamond layer on the optical substrate, forming a germanium layer on the first diamond layer, forming a fused silica layer on the germanium layer, cleaning and seeding the germanium layer, and forming a second diamond layer on the germanium layer.Type: GrantFiled: May 2, 2023Date of Patent: August 13, 2024Assignee: AKHAN SEMICONDUCTOR, INC.Inventors: Adam Khan, Robert Polak
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Patent number: 12031987Abstract: Disclosed herein is a system and method for transistor pathogen virus detector in which one embodiment may include a substrate layer, a silicon dioxide layer on the substrate layer, a nanocrystalline diamond layer on the silicon dioxide layer, a graphene oxide layer on the nanocrystalline diamond layer, fluorinated graphene oxide portions; and a linker layer, the linker layer including a plurality of pathogen receptors.Type: GrantFiled: April 19, 2021Date of Patent: July 9, 2024Assignee: AKHAN SEMICONDUCTOR, INC.Inventors: Adam Khan, Ernest Schirmann, Kiran Kumar Kovi
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Patent number: 11921319Abstract: A transparent display includes a display including a transparent substrate and a patterned diamond layer formed on the transparent substrate to at least in part define a diamond waveguide. At least two electronic devices can be connected by the diamond waveguide, and can include a sensor, a transducer, or electronic circuitry, including communication, control, or data processing electronic circuitry.Type: GrantFiled: April 11, 2023Date of Patent: March 5, 2024Assignee: AKHAN SEMICONDUCTOR, INC.Inventors: Adam Khan, Kiran Kumar Kovi, Ernest Schirmann, William Alberth
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Patent number: 11915934Abstract: Disclosed herein is a new and improved system and method for fabricating diamond semiconductors. The method may include the steps of selecting a diamond semiconductor material having a surface, exposing the surface to a source gas in an etching chamber, forming a carbide interface contact layer on the surface; and forming a metal layer on the interface layer.Type: GrantFiled: February 9, 2023Date of Patent: February 27, 2024Assignee: AKHAN SEMICONDUCTOR, INC.Inventor: Adam Khan
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Patent number: 11837472Abstract: Disclosed herein is a new and improved system and method for fabricating monolithically integrated diamond semiconductor. The method may include the steps of seeding the surface of a substrate material, forming a diamond layer upon the surface of the substrate material; and forming a semiconductor layer within the diamond layer, wherein the diamond semiconductor of the semiconductor layer has n-type donor atoms and a diamond lattice, wherein the donor atoms contribute conduction electrons with mobility greater than 770 cm.sup.2/Vs to the diamond lattice at 100 kPa and 300K, and Wherein the n-type donor atoms are introduced to the lattice through ion tracks.Type: GrantFiled: August 24, 2021Date of Patent: December 5, 2023Assignee: AKHAN SEMICONDUCTOR, INC.Inventor: Adam Khan
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Patent number: 11784048Abstract: Disclosed herein is a new and improved system and method for fabricating diamond semiconductors. The system may include a diamond malarial having n-type donor atoms and a diamond lattice, wherein 0.16% of the donor atoms contribute conduction electrons with mobility greater than 770 cm2/Vs to the diamond lattice at 100 kPa and 300K. The method of fabricating diamond semiconductors may include the steps of selecting a diamond material having a diamond lattice; introducing a minimal amount of acceptor dopant atoms to the diamond lattice to create ion tracks; introducing substitutional dopant atoms to the diamond lattice through the ion tracks; and annealing the diamond lattice.Type: GrantFiled: May 24, 2021Date of Patent: October 10, 2023Assignee: AKHAN Semiconductor, Inc.Inventor: Adam Khan
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Patent number: 11675110Abstract: A system and method for diamond based multilayer antireflective coating for optical windows are provided. An antireflective coatings for optical windows may include an optical grade silicon substrate, a first polycrystalline diamond film on the silicon substrate, a germanium film on the first polycrystalline diamond film, a fused silica film on the germanium film; and a second polycrystalline diamond film on the fused silica film. A method of fabricating a diamond based multilayer antireflective coating may include the steps of cleaning and seeding an optical substrate, forming a first diamond layer on the optical substrate, forming a germanium layer on the first diamond layer, forming a fused silica layer on the germanium layer, cleaning and seeding the germanium layer, and forming a second diamond layer on the germanium layer.Type: GrantFiled: August 11, 2021Date of Patent: June 13, 2023Assignee: AKHAN SEMICONDUCTOR, INC.Inventors: Adam Khan, Robert Polak
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Patent number: 11656404Abstract: A transparent display includes a display including a transparent substrate and a patterned diamond layer formed on the transparent substrate to at least in part define a diamond waveguide. At least two electronic devices can be connected by the diamond waveguide, and can include a sensor, a transducer, or electronic circuitry, including communication, control, or data processing electronic circuitry.Type: GrantFiled: December 17, 2021Date of Patent: May 23, 2023Assignee: AKHAN SEMICONDUCTOR, INC.Inventors: Adam Khan, Kiran Kumar Kovi, Ernest Schirmann, William Alberth
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Patent number: 11605541Abstract: Disclosed herein is a new and improved system and method for fabricating diamond semiconductors. The method may include the steps of selecting a diamond semiconductor material having a surface, exposing the surface to a source gas in an etching chamber, forming a carbide interface contact layer on the surface; and forming a metal layer on the interface layer.Type: GrantFiled: May 24, 2021Date of Patent: March 14, 2023Assignee: AKHAN SEMICONDUCTOR, INC.Inventor: Adam Khan
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Patent number: 11572621Abstract: Disclosed herein is system and method for protective diamond coatings. The method may include the steps of cleaning and seeding a substrate, depositing a crystalline diamond layer on the substrate, etching the substrate; and attaching the substrate to protected matter. The crystalline diamond layer may reflect at least 28 percent of electromagnetic energy in a beam having a bandwidth of 800 nanometer to 1 micrometer.Type: GrantFiled: September 24, 2020Date of Patent: February 7, 2023Assignee: AKHAN SEMICONDUCTOR, INC.Inventors: Adam Khan, Robert Polak, Kiran Kumar Kovi
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Patent number: 11552276Abstract: Disclosed herein is a transparent glass system that includes an optical grade silicon substrate, a transparent substrate layer; a titanium dioxide transparent layer, the transparent layer having an index of refraction of 2.35 or greater; and a polycrystalline diamond layer, wherein the transparent layer is between the substrate layer and the polycrystalline diamond layer.Type: GrantFiled: January 19, 2021Date of Patent: January 10, 2023Assignee: AKHAN Semiconductor, Inc.Inventors: Adam Khan, Robert Polak, Priya Raman
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Patent number: 11112539Abstract: A system and method for diamond based multilayer antireflective coating for optical windows are provided. An antireflective coatings for optical windows may include an optical grade silicon substrate, a first polycrystalline diamond film on the silicon substrate, a germanium film on the first polycrystalline diamond film, a fused silica film on the germanium film; and a second polycrystalline diamond film on the fused silica film. A method of fabricating a diamond based multilayer antireflective coating may include the steps of cleaning and seeding an optical substrate, forming a first diamond layer on the optical substrate, forming a germanium layer on the first diamond layer, forming a fused silica layer on the germanium layer, cleaning and seeding the germanium layer, and forming a second diamond layer on the germanium layer.Type: GrantFiled: September 23, 2019Date of Patent: September 7, 2021Assignee: AKHAN Semiconductor, Inc.Inventors: Adam Khan, Robert Polak
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Patent number: 11107684Abstract: Disclosed herein is a new and improved system and method for fabricating monolithically integrated diamond semiconductor. The method may include the steps of seeding the surface of a substrate material, forming a diamond layer upon the surface of the substrate material; and forming a semiconductor layer within the diamond layer, wherein the diamond semiconductor of the semiconductor layer has n-type donor atoms and a diamond lattice, wherein the donor atoms contribute conduction electrons with mobility greater than 770 cm2/Vs to the diamond lattice at 100 kPa and 300K, and Wherein the n-type donor atoms are introduced to the lattice through ion tracks.Type: GrantFiled: January 27, 2020Date of Patent: August 31, 2021Assignee: AKHAN Semiconductor, Inc.Inventor: Adam Khan
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Patent number: 11043382Abstract: Disclosed herein is a new and improved system and method for fabricating diamond semiconductors. The method may include the steps of selecting a diamond semiconductor material having a surface, exposing the surface to a source gas in an etching chamber, forming a carbide interface contact layer on the surface; and forming a metal layer on the interface layer.Type: GrantFiled: August 1, 2018Date of Patent: June 22, 2021Assignee: AKHAN SEMICONDUCTOR, INC.Inventor: Adam Khan
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Patent number: 10760157Abstract: Disclosed herein is a transparent glass system that includes an optical grade silicon substrate, and a nanocrystalline diamond film on the silicon substrate, the diamond film deposited using a chemical vapor deposition system having a reactor in which methane, hydrogen and argon source gases are added. Further disclosed is a method of fabricating transparent glass that includes the steps of seeding an optical grade silicon substrate and forming a nanocrystalline diamond film on the silicon substrate using a chemical vapor deposition system having a reactor in which methane, hydrogen and argon source gases are added.Type: GrantFiled: August 9, 2017Date of Patent: September 1, 2020Assignee: AKHAN Semiconductor, Inc.Inventors: Adam Khan, Robert Polak
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Patent number: 10725214Abstract: A broad band mirror system and method, wherein the system includes a mechanical substrate layer, a reflective metal layer on the mechanical substrate level, and a diamond layer, and the method includes the steps of selecting a sacrificial substrate layer, depositing a diamond layer on the substrate layer, smoothing a first surface of the diamond layer, depositing a reflective metal layer on the diamond layer, bonding a mechanical substrate to the diamond layer, removing the sacrificial substrate level, and smoothing a second diamond surface.Type: GrantFiled: February 8, 2018Date of Patent: July 28, 2020Assignee: AKHAN Semiconductor, Inc.Inventors: Ernest Schirmann, Priya Raman, Adam Khan, Robert Polak
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Patent number: RE50260Abstract: Disclosed herein is a transparent glass system that includes an optical grade silicon substrate, and a nanocrystalline diamond film on the silicon substrate, the diamond film deposited using a chemical vapor deposition system having a reactor in which methane, hydrogen and argon source gases are added. Further disclosed is a method of fabricating transparent glass that includes the steps of seeding an optical grade silicon substrate and forming a nanocrystalline diamond film on the silicon substrate using a chemical vapor deposition system having a reactor in which methane, hydrogen and argon source gases are added.Type: GrantFiled: August 31, 2022Date of Patent: January 7, 2025Assignee: AKHAN SEMICONDUCTOR, INC.Inventors: Adam Khan, Robert Polak