Patents Assigned to AKRON POLYMER SYSTEMS, INC.
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Patent number: 9856376Abstract: Films with optical transmittance of >80% between 400 and 750 nm and with coefficient of thermal expansion less than 20 ppm/° C. are prepared from aromatic polyamides that are soluble in polar organic solvents yet have glass transition temperatures >300° C. The films are crosslinked in the solid state by heating at elevated temperatures for short periods of time in the presence of multifunctional epoxides. Surprisingly, the optical and thermal properties of the films do not change significantly during the curing process. The temperature required for the crosslinking process to take place can be reduced by the presence of a few free, pendant carboxyl groups along the polyamide backbones. The films are useful as flexible substrates for electronic displays and photovoltaic devices.Type: GrantFiled: June 20, 2012Date of Patent: January 2, 2018Assignee: Akron Polymer Systems, Inc.Inventors: Limin Sun, Dong Zhang, Frank W. Harris, Jiaokai Jing
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Publication number: 20170298198Abstract: A process for manufacturing a display device, an optical device or an illuminating device includes casting a polyamide solution onto a base at temperature below 200° C. to obtain a film, heating the film on the base at temperature sufficient to make the film solvent resistant and obtain a polyamide film, forming on a surface of the polyamide film one of a display element, an optical element and an illumination element to form a display device, an optical device or an illumination device, and de-bonding the base from the display device, the optical device or the illuminating device.Type: ApplicationFiled: June 28, 2017Publication date: October 19, 2017Applicants: SUMITOMO BAKELITE CO., LTD., AKRON POLYMER SYSTEMS, INC.Inventors: FRANK W. HARRIS, DONG ZHANG, LIMIN SUN, JIAOKAI JING, HIDEO UMEDA, JUN OKADA
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Patent number: 9457496Abstract: The present invention is directed toward transparent films prepared from soluble aromatic copolyamides with glass transition temperatures greater than 300 C. The copolyamides, which contain pendant carboxylic groups are solution cast into films using N,N-dimethylacetamide (DMAc), N-methyl-2-pyrrolidinone (NMP), or other polar solvents. The films are thermally cured at temperatures near the copolymer glass transition temperature. After curing, the polymer films display transmittances >80% from 400 to 750 nm, have coefficients of thermal expansion of less than 20 ppm, and are solvent resistant. The films are useful as flexible substrates for microelectronic devices.Type: GrantFiled: June 29, 2011Date of Patent: October 4, 2016Assignee: Akron Polymer Systems, Inc.Inventors: Limin Sun, Frank W. Harris, Jiaokai Jing, Haci B. Erdem, John D. Harvey, Dong Zhang
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Publication number: 20160215132Abstract: A polymer blend includes a combination of an acrylic polymer and a styrenic fluoropolymer. The polymer blend may be used to make polymer films having a single glass transition temperature, a polarizing plate, or a display device with enhanced optical properties.Type: ApplicationFiled: January 22, 2016Publication date: July 28, 2016Applicant: Akron Polymer Systems, Inc.Inventors: Xiaoliang Zheng, Frank W. Harris, Thauming Kuo, Bin Wang, Ted Germroth, Dong Zhang, Douglas S. McWilliams, Peiyao Wang
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Publication number: 20160208096Abstract: In an aspect, the present disclosure relates to a polyamide solution comprising an aromatic polyamide and a solvent, wherein a Young's modulus of at least one direction of a cast film produced by casting the polyamide solution on a glass plate is 3.0 GPa or more, and a tensile strength of the cast film is 100 MPa or more and 250 MPa or less. In another aspect, the present disclosure relates to a polyamide solution comprising an aromatic polyamide and a solvent, wherein a Young's modulus of at least one direction of a cast film produced by casting the polyamide solution on a glass plate is 3.0 GPa or more, and an aromatic polyamide of the polyamide solution has a constitutional unit represented by following general formulae (I) and (II).Type: ApplicationFiled: January 15, 2016Publication date: July 21, 2016Applicants: AKRON POLYMER SYSTEMS, INC., SUMITOMO BAKELITE COMPANY LIMITEDInventors: Limin Sun, Dong Zhang, Jiaokai Jing, Frank W. Harris, Takehiko Maetani, Ritsuya Kawasaki, Toshihiko Katayama, Hideo Umeda
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Publication number: 20160096925Abstract: A cover member includes a base material having a film shape and containing an amorphous aromatic polyamide. Further, it is preferred that the aromatic polyamide contains a carboxyl group. Furthermore, it is preferred that the aromatic polyamide contains a rigid structure in an amount of 85 mol % or more. Moreover, it is preferred that a tensile elastic modulus of the base material is 4 GPa or more. This makes it possible to provide a cover member having a good flatness keeping property and excellent long-term durability, and an electronic device provided with such a cover member and having excellent reliability.Type: ApplicationFiled: October 2, 2015Publication date: April 7, 2016Applicants: AKRON POLYMER SYSTEMS INC., SUMITOMO BAKELITE COMPANY LIMITEDInventors: Limin Sun, Dong Zhang, Frank W. Harris, Jun Okada, Toshihiko Katayama, Ritsuya Kawasaki, Hideo Umeda, Daisuke Isobe
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Publication number: 20160075913Abstract: The present disclosure, in one aspect, relates to a polyamide solution which can suppress the yellowness. The present disclosure, in one or a plurality of embodiments, relates to a polyamide solution comprising an aromatic polyamide and a solvent, the aromatic polyamide comprising a constitutional unit having one or more free carboxyl groups and having an aromatic ring structure and an alicyclic structure in the main chain. Further, the present disclosure, in one aspect, relates to a laminated composite material, comprising a glass plate and a polyamide resin layer; the polyamide resin layer laminated onto one surface of the glass plate, the polyamide resin layer having yellowness (JIS K7373) of 2.4 or less; and the polyamide resin layer obtained by applying the solution onto the glass plate.Type: ApplicationFiled: September 9, 2015Publication date: March 17, 2016Applicants: AKRON POLYMER SYSTEMS, INC., SUMITOMO BAKELITE COMPANY LIMITEDInventors: Limin Sun, Jiaokai Jing, Dong Zhang, Frank W. Harris, Ritsuya Kawasaki, Toshihiko Katayama, Jun Okada, Hideo Umeda
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Publication number: 20160075826Abstract: In one or a plurality of embodiments, a process for manufacturing polyamide without using PrO (propylene oxide) in synthesis is provided. In one or a plurality of embodiments, provided is a process for manufacturing polyamide, including steps (a) to (c): (a) reacting diacid dichloride monomer with at least two kinds of diamine monomers in a solvent so as to generate polyamide; and (b) removing hydrochloric acid physically out of a reaction system, the hydrochloric acid being generated during the reaction in the step (a); or (c) adding a trapping reagent capable of trapping hydrochloric acid, at any time at least before the step (a), at the same time of starting the step (a), or during the step (a), wherein at least one of the diamine monomers is a diamine monomer containing a carboxyl group, and the trapping reagent does not include propylene oxide.Type: ApplicationFiled: September 9, 2015Publication date: March 17, 2016Applicants: AKRON POLYMER SYSTEMS, INC., SUMITOMO BAKELITE COMPANY LIMITEDInventors: Limin SUN, Dong Zhang, Jiaokai Jing, Frank W. Harris, Jun Okada, Toshihiko Katayama, Hideo Umeda, Ritsuya Kawasaki
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Publication number: 20160039974Abstract: In one or a plurality of embodiments, a process for manufacturing polyamide, with a reduced use of an amide-based solvent in synthesis, is provided. In one or a plurality of embodiments, provided is a process for manufacturing polyamide, including steps (1) to (3): (1) dissolving diamine in a non-amide-based organic solvent or a non-amide-based organic solvent containing 10 mass% or less of an amide-based organic solvent; (2) adding diacid dichloride to a solution obtained in the step (1) and reacting the diamine with the diacid dichloride so as to generate polyamide; and (3) adding a trapping reagent capable of trapping hydrochloric acid.Type: ApplicationFiled: August 5, 2015Publication date: February 11, 2016Applicants: SUMITOMO BAKELITE COMPANY LIMITED, AKRON POLYMER SYSTEMS, INC.Inventors: Limin SUN, Dong ZHANG, Frank W. HARRIS, Jun OKADA, Toshihiko KATAYAMA, Hideo UMEDA, Ritsuya KAWASAKI
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Patent number: 9255192Abstract: An optical compensation film composition is disclosed herein wherein the optical compensation film is stretched to yield a negative A-plate having a refractive index profile of nx<ny=nz. or a biaxial polymer film having a refractive index profile of nx<ny<nz, the film having been stretched from a film cast from a polymer solution comprising a solvent and a polymer having a moiety of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is hydrogen or a substituent on the styrenic ring.Type: GrantFiled: August 11, 2014Date of Patent: February 9, 2016Assignee: Akron Polymer Systems, Inc.Inventors: Xiaoliang Zheng, Dong Zhang, Jiaokai Jing, Frank W. Harris, Brian King, Ted Germroth, Thauming Kuo
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Patent number: 9234987Abstract: A multilayer optical film includes a wave plate having a refractive index profile of nx>ny?nz and a fluoropolymer film comprising a moiety of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring, and wherein nx and ny represent in-plane refractive indices and nz the thickness-direction refractive index of the wave plates; wherein said multilayer optical film has a positive in-plane retardation (Re) and an out-of-plane retardation (Rth) that satisfies the equation of |Rth|<Re/2 throughout the wavelength range of 400 nm to 800 nm.Type: GrantFiled: November 2, 2012Date of Patent: January 12, 2016Assignee: Akron Polymer Systems, Inc.Inventors: Bin Wang, Ted Calvin Germroth, Thauming Kuo, Frank W. Harris, Dong Zhang, Douglas S. McWilliams, Jiaokai Jing, Xiaoliang Zheng
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Publication number: 20150344359Abstract: This disclosure, viewed from one aspect, relates to a method for producing a sensor element, including the following steps (A) and (B): (A) applying a polyamide solution onto a base to form a polyamide film on the base; and (B) forming a sensor element on the surface of the polyamide film, wherein the base or the surface of the base is composed of glass or silicon wafer, wherein a polyamide of the polyamide solution has a constitutional unit represented by the following general formulae (I) and (II):Type: ApplicationFiled: May 28, 2015Publication date: December 3, 2015Applicants: SUMITOMO BAKELITE COMPANY LIMITED, AKRON POLYMER SYSTEMS, INC.Inventors: Ritsuya KAWASAKI, Takehiko MAETANI, Toshihiko KATAYAMA, Jun OKADA, Hideo UMEDA, Limin SUN, Jiaokai JING, Dong ZHANG, Frank W. HARRIS
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Publication number: 20150232697Abstract: In an aspect, the present disclosure relates to a polyamide solution including aromatic polyamide and a solvent. A dimension change gap between a cast film of the polyamide solution and the cast film after being subjected to a heat treatment is not more than a predetermined value. In another aspect, the present disclosure relates to a method for manufacturing a display element, an optical element, an illumination element or a sensor element, including a step of forming a polyamide film by using the polyamide solution.Type: ApplicationFiled: February 19, 2015Publication date: August 20, 2015Applicants: AKRON POLYMER SYSTEMS, INC., SUMITOMO BAKELITE CO., LTD.Inventors: Limin SUN, Dong Zhang, Frank W. Harris, Hideo Umeda, Ritsuya Kawasaki, Toshihiko Katayama, Yusuke Inoue, Jun Okada, Mizuho Inoue, Manabu Naito
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Publication number: 20150115255Abstract: Provided are a resin composition and a substrate that are capable of being used for manufacturing an electronic device having excellent light extraction efficiency. The resin composition contains a polymer and a solvent dissolving the polymer. The resin composition is used to form a layer, and when refractive indexes of the layer along two perpendicular in-plane directions thereof are respectively defined as “Nx” and “Ny” and a refractive index of the layer along a thickness direction thereof is defined as “Nz”, Nx, Ny and Nz satisfy a relationship of “(Nx+Ny)/2?Nz”>0.01. Further, a method of manufacturing the electronic device by using such a substrate, and the electronic device are also provided.Type: ApplicationFiled: October 24, 2014Publication date: April 30, 2015Applicants: AKRON POLYMER SYSTEMS INC., SUMITOMO BAKELITE COMPANY LIMITEDInventors: Limin SUN, Jiaokai Jing, Dong Zhang, Frank W. Harris, Hideo Umeda, Ritsuya Kawasaki, Toshihiko Katayama, Yusuke Inoue, Jun Okada, Mizuho Inoue, Manabu Naito
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Publication number: 20150108457Abstract: Provided are a resin composition and a substrate that are capable of being used for manufacturing an electronic device including a transparent resin film having an excellent display property, a method of manufacturing such a resin composition and a method of manufacturing the electronic device using such a substrate and the electronic device. The resin composition of the present invention contains an aromatic polyamide, an aromatic multifunctional compound having two or more functional groups including a carboxyl group or an amino group, and a solvent dissolving the aromatic polyamide.Type: ApplicationFiled: October 22, 2014Publication date: April 23, 2015Applicants: AKRON POLYMER SYSTEMS INC., SUMITOMO BAKELITE COMPANY LIMITEDInventors: Limin Sun, Dong Zhang, Jiaokai Jing, Frank W. Harris, Hideo Umeda, Ritsuya Kawasaki, Jun Okada, Mizuho Inoue, Manabu Naito
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Publication number: 20150099332Abstract: Provided are a resin composition and a substrate that are capable of being used for producing an electronic device including thin-film transistors having an excellent switching property. The resin composition contains an aromatic polyamide and a solvent dissolving the aromatic polyamide. The resin composition is used to form a layer, and a total light transmittance of the layer in a wavelength of 355 nm is 10% or less. Further, a method of manufacturing the electronic device using such a substrate is also provided.Type: ApplicationFiled: October 3, 2014Publication date: April 9, 2015Applicants: AKRON POLYMER SYSTEMS INC., SUMITOMO BAKELITE COMPANY LIMITEDInventors: Limin SUN, Dong ZHANG, Jiaokai JING, Frank W. HARRIS, Hideo UMEDA, Toshihiko KATAYAMA, Jun OKADA, Mizuho INOUE, Manabu NAITO
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Publication number: 20150097174Abstract: Provided are a resin composition and a substrate that are capable of being used for manufacturing an electronic device having excellent light extraction efficiency. The resin composition contains a crystalline polymer and a solvent dissolving the crystalline polymer. The resin composition is used to form a layer, and a haze value of the layer is 5% or more. Further, a method of manufacturing the electronic device by using such a substrate, and the electronic device are also provided.Type: ApplicationFiled: October 3, 2014Publication date: April 9, 2015Applicants: AKRON POLYMER SYSTEMS INC., SUMITOMO BAKELITE COMPANY LIMITEDInventors: Limin SUN, Dong ZHANG, Jiaokai JING, Frank W. HARRIS, Hideo UMEDA, Jun OKADA, Manabu NAITO
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Publication number: 20150099131Abstract: The present disclosure, in one aspect, relates to a polyamide solution including an aromatic polyamide and a solvent, wherein the aromatic polyamide includes at least two types of constitutional units, and a change rate of coefficient of thermal expansion (CTE) of a cast film produced by casting the polyamide solution on a glass plate and CTE of the same cast film after being subjected to a heat treatment at temperature of 200° C. to 450° C. (=CTE after heat treatment/CTE before heat treatment) is 1.3 or less.Type: ApplicationFiled: October 1, 2014Publication date: April 9, 2015Applicants: AKRON POLYMER SYSTEMS, INC., SUMITOMO BAKELITE CO., LTD.Inventors: Limin SUN, Dong Zhang, Jiaokai Jing, Frank W. Harris, Hideo Umeda, Ritsuya Kawasaki, Toshihiko Katayama, Yusuke Inoue, Jun Okada, Mizuho Inoue, Manabu Naito
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Publication number: 20140356636Abstract: This disclosure, in one or plurality of embodiments, relates to a solution of polyamide from which a cast film with low CTE and Rth can be achieved. This disclosure, viewed from one aspect, relates to a solution of polyamide comprising: an aromatic polyamide; inorganic filler; and a solvent. This disclosure, viewed from one aspect, relates to a laminated composite material, comprising a base, and a polyamide resin layer: wherein the polyamide resin layer is laminated to one surface of the base; and wherein the polyamide resin layer is obtained or obtainable by applying a polyamide solution comprising an aromatic polyamide, an inorganic filler and a solvent onto the base.Type: ApplicationFiled: May 28, 2014Publication date: December 4, 2014Applicants: Akron Polymer Systems, Inc., Sumitomo Bakelite Co., Ltd.Inventors: Limin SUN, Jiaokai JING, Dong ZHANG, Frank W. HARRIS, Hideo UMEDA, Ritsuya KAWASAKI, Toshihiko KATAYAMA, Yusuke INOUE, Jun OKADA, Mizuho INOUE, Manabu NAITO
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Publication number: 20140350166Abstract: An optical compensation film composition is disclosed herein wherein the optical compensation film is stretched to yield a negative A-plate having a refractive index profile of nx<ny=nz. or a biaxial polymer film having a refractive index profile of nx<ny<nz, the film having been stretched from a film cast from a polymer solution comprising a solvent and a polymer having a moiety of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is hydrogen or a substituent on the styrenic ring.Type: ApplicationFiled: August 11, 2014Publication date: November 27, 2014Applicant: AKRON POLYMER SYSTEMS, INC.Inventors: Xiaoliang Zheng, Dong Zhang, Jiaokai Jing, Frank W. Harris, Brian King, Ted Germroth, Thauming Kuo