Patents Assigned to Alameda Applied Sciences Corp.
  • Patent number: 9109715
    Abstract: A high speed valve has a conductive flyer plate responsive to eddy currents induced by an adjacent coil. The eddy currents generate a repulsive force which opens the valve, and a low-mass flyer plate and spring combined with a resonant plate and spring combination provide a fast opening and closing time for the valve. A nozzle structure directs a supersonic flow of gas into a rectangular array of high-density gas suitable for interaction with a laser beam transverse to the rectangular array of jets for the production of wakefield interaction, leading to very high-energy electrons from the gas jet.
    Type: Grant
    Filed: October 5, 2008
    Date of Patent: August 18, 2015
    Assignee: Alameda Applied Sciences Corp.
    Inventor: Mahadevan Krishnan
  • Patent number: 8038858
    Abstract: An apparatus for deposition of plasma reaction films includes a substrate for the deposition of either thin or thick films. The substrate also allows for a film deposition which adheres to the substrate, and also films which may be removed after deposition. The cathode may be fabricated from individual wires, or it may be fabricated from a single conductor. A macro-particle filter which preferentially traps larger particles may be introduced between a porous cathode and the deposition surface. The macro-particle filter may also carry electrical current as is useful for generating a magnetic field such that a Lorentz force acts preferentially on ionized particles, allowing them to pass through the filter while trapping macroparticles that are not influenced by the magnetic field.
    Type: Grant
    Filed: November 7, 2005
    Date of Patent: October 18, 2011
    Assignee: Alameda Applied Sciences Corp
    Inventors: Brian L. Bures, Jason D. Wright, Michael Y. Au, Andrew N. Gerhan, Mahadevan Krishnan
  • Patent number: 7867366
    Abstract: An apparatus for the deposition of a variable thickness coating onto the inside of a cylindrical tube comprises a variable pressure gas, an cathode coaxially positioned within the cylinder, and a voltage source applied between the cathode and cylindrical tube, which functions as an anode. A radial plasma arc is generated between the anode and cathode at a starting point on the cylinder, and the plasma arc travels down the central axis of the cylinder, providing a helical deposition region on the inside of the cylinder. Selection of the combination of cathode material and gas enable the plasma to generate ionic material which is deposited on the anodic cylinder in the region of the plasma. By varying the pressure of variable pressure gas for each helical path, it is possible to vary the composition of this deposition film.
    Type: Grant
    Filed: April 28, 2004
    Date of Patent: January 11, 2011
    Assignee: Alameda Applied Sciences Corp.
    Inventors: Michael D. McFarland, Mahadevan Krishnan, Jason D. Wright, Andrew N. Gerhan, Benjamin Tang
  • Patent number: 7827779
    Abstract: A Liquid Metal Ion Thruster (LMIT) has a substrate having a plurality of pedestals, one end of the pedestal attached to the substrate, and the opposing end of the pedestal having a tip, the pedestals having grooves and the substrate also having grooves coupled to each other and to a source of liquid metal. An extractor electrode positioned parallel to the substrate and above the pedestal tips provides an electrostatic extraction field sufficient to accelerate ions from the tips of the pedestals through the extractor electrode. A series of focusing electrodes with matching apertures provides a flow of substantially parallel ion trajectories, and an optional negative ion source provides a charge neutralization to prevent space charge spreading of the exiting accelerated ions. The assembly is suitable for providing thrust for a satellite while maintaining high operating efficiencies.
    Type: Grant
    Filed: September 10, 2007
    Date of Patent: November 9, 2010
    Assignee: Alameda Applied Sciences Corp.
    Inventors: Mahadevan Krishnan, Kristi Wilson, Kelan Champagne, Jason D. Wright, Andrew N. Gerhan
  • Patent number: 7518085
    Abstract: A plasma thruster with a cylindrical inner and cylindrical outer electrode generates plasma particles from the application of energy stored in an inductor to a surface suitable for the formation of a plasma and expansion of plasma particles. The plasma production results in the generation of charged particles suitable for generating a reaction force, and the charged particles are guided by a magnetic field produced by the same inductor used to store the energy used to form the plasma.
    Type: Grant
    Filed: January 31, 2006
    Date of Patent: April 14, 2009
    Assignee: Alameda Applied Sciences Corp.
    Inventor: Mahadevan Krishnan
  • Patent number: 7221100
    Abstract: An apparatus for providing power to a gas discharge lamp comprises a storage capacitor and an ignition switch coupled through a primarily parasitic first inductor to a parallel combination of a diode assembly and a second inductor in series with a gas discharge lamp. The second inductor is selected to optimize the energy transfer from the capacitor to the gas discharge lamp. During a first interval determined by the time constant of the series combination of a storage capacitor, a first inductor, and a second inductor, the diode assembly is not conducting and a forward sense current builds in the first and second inductors.
    Type: Grant
    Filed: August 12, 2005
    Date of Patent: May 22, 2007
    Assignee: Alameda Applied Sciences Corp.
    Inventors: Evgeny H. Baksht, Mikhail I. Lomaev, Dmitry V. Rybka, Victor F. Tarasenko, Mahadevan Krishnan, John R. Thompson
  • Patent number: 7053333
    Abstract: An apparatus for producing a vacuum arc plasma source device using a low mass, compact inductive energy storage circuit powered by a low voltage DC supply acts as a vacuum arc plasma thruster. An inductor is charged through a switch, subsequently the switch is opened and a voltage spike of Ldi/dt is produced initiating plasma across a resistive path separating anode and cathode. The plasma is subsequently maintained by energy stored in the inductor. Plasma is produced from cathode material, which allows for any electrically conductive material to be used. A planar structure, a tubular structure, and a coaxial structure allow for consumption of cathode material feed and thereby long lifetime of the thruster for long durations of time.
    Type: Grant
    Filed: August 16, 2004
    Date of Patent: May 30, 2006
    Assignee: Alameda Applied Sciences Corp.
    Inventors: Jochen Schein, Andrew N. Gerhan, Robyn L. Woo, Michael Y. Au, Mahadevan Krishnan
  • Patent number: 6818853
    Abstract: An apparatus for producing a vacuum arc plasma source device using a low mass, compact inductive energy storage circuit powered by a low voltage DC supply acts as a vacuum arc plasma thruster. An inductor is charged through a switch, subsequently the switch is opened and a voltage spike of Ldi/dt is produced initiating plasma across a resistive path separating anode and cathode. The plasma is subsequently maintained by energy stored in the inductor. Plasma is produced from cathode material, which allows for any electrically conductive material to be used. A planar structure, a tubular structure, and a coaxial structure allow for consumption of cathode material feed and thereby long lifetime of the thruster for long durations of time.
    Type: Grant
    Filed: May 30, 2003
    Date of Patent: November 16, 2004
    Assignee: Alameda Applied Sciences Corp.
    Inventors: Jochen Schein, Andrew N. Gerhan, Robyn L. Woo, Michael Y. Au, Mahadevan Krishnan