Patents Assigned to Alameda Applied Sciences Corp.
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Patent number: 9109715Abstract: A high speed valve has a conductive flyer plate responsive to eddy currents induced by an adjacent coil. The eddy currents generate a repulsive force which opens the valve, and a low-mass flyer plate and spring combined with a resonant plate and spring combination provide a fast opening and closing time for the valve. A nozzle structure directs a supersonic flow of gas into a rectangular array of high-density gas suitable for interaction with a laser beam transverse to the rectangular array of jets for the production of wakefield interaction, leading to very high-energy electrons from the gas jet.Type: GrantFiled: October 5, 2008Date of Patent: August 18, 2015Assignee: Alameda Applied Sciences Corp.Inventor: Mahadevan Krishnan
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Patent number: 8038858Abstract: An apparatus for deposition of plasma reaction films includes a substrate for the deposition of either thin or thick films. The substrate also allows for a film deposition which adheres to the substrate, and also films which may be removed after deposition. The cathode may be fabricated from individual wires, or it may be fabricated from a single conductor. A macro-particle filter which preferentially traps larger particles may be introduced between a porous cathode and the deposition surface. The macro-particle filter may also carry electrical current as is useful for generating a magnetic field such that a Lorentz force acts preferentially on ionized particles, allowing them to pass through the filter while trapping macroparticles that are not influenced by the magnetic field.Type: GrantFiled: November 7, 2005Date of Patent: October 18, 2011Assignee: Alameda Applied Sciences CorpInventors: Brian L. Bures, Jason D. Wright, Michael Y. Au, Andrew N. Gerhan, Mahadevan Krishnan
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Patent number: 7867366Abstract: An apparatus for the deposition of a variable thickness coating onto the inside of a cylindrical tube comprises a variable pressure gas, an cathode coaxially positioned within the cylinder, and a voltage source applied between the cathode and cylindrical tube, which functions as an anode. A radial plasma arc is generated between the anode and cathode at a starting point on the cylinder, and the plasma arc travels down the central axis of the cylinder, providing a helical deposition region on the inside of the cylinder. Selection of the combination of cathode material and gas enable the plasma to generate ionic material which is deposited on the anodic cylinder in the region of the plasma. By varying the pressure of variable pressure gas for each helical path, it is possible to vary the composition of this deposition film.Type: GrantFiled: April 28, 2004Date of Patent: January 11, 2011Assignee: Alameda Applied Sciences Corp.Inventors: Michael D. McFarland, Mahadevan Krishnan, Jason D. Wright, Andrew N. Gerhan, Benjamin Tang
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Patent number: 7827779Abstract: A Liquid Metal Ion Thruster (LMIT) has a substrate having a plurality of pedestals, one end of the pedestal attached to the substrate, and the opposing end of the pedestal having a tip, the pedestals having grooves and the substrate also having grooves coupled to each other and to a source of liquid metal. An extractor electrode positioned parallel to the substrate and above the pedestal tips provides an electrostatic extraction field sufficient to accelerate ions from the tips of the pedestals through the extractor electrode. A series of focusing electrodes with matching apertures provides a flow of substantially parallel ion trajectories, and an optional negative ion source provides a charge neutralization to prevent space charge spreading of the exiting accelerated ions. The assembly is suitable for providing thrust for a satellite while maintaining high operating efficiencies.Type: GrantFiled: September 10, 2007Date of Patent: November 9, 2010Assignee: Alameda Applied Sciences Corp.Inventors: Mahadevan Krishnan, Kristi Wilson, Kelan Champagne, Jason D. Wright, Andrew N. Gerhan
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Patent number: 7518085Abstract: A plasma thruster with a cylindrical inner and cylindrical outer electrode generates plasma particles from the application of energy stored in an inductor to a surface suitable for the formation of a plasma and expansion of plasma particles. The plasma production results in the generation of charged particles suitable for generating a reaction force, and the charged particles are guided by a magnetic field produced by the same inductor used to store the energy used to form the plasma.Type: GrantFiled: January 31, 2006Date of Patent: April 14, 2009Assignee: Alameda Applied Sciences Corp.Inventor: Mahadevan Krishnan
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Patent number: 7221100Abstract: An apparatus for providing power to a gas discharge lamp comprises a storage capacitor and an ignition switch coupled through a primarily parasitic first inductor to a parallel combination of a diode assembly and a second inductor in series with a gas discharge lamp. The second inductor is selected to optimize the energy transfer from the capacitor to the gas discharge lamp. During a first interval determined by the time constant of the series combination of a storage capacitor, a first inductor, and a second inductor, the diode assembly is not conducting and a forward sense current builds in the first and second inductors.Type: GrantFiled: August 12, 2005Date of Patent: May 22, 2007Assignee: Alameda Applied Sciences Corp.Inventors: Evgeny H. Baksht, Mikhail I. Lomaev, Dmitry V. Rybka, Victor F. Tarasenko, Mahadevan Krishnan, John R. Thompson
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Patent number: 7053333Abstract: An apparatus for producing a vacuum arc plasma source device using a low mass, compact inductive energy storage circuit powered by a low voltage DC supply acts as a vacuum arc plasma thruster. An inductor is charged through a switch, subsequently the switch is opened and a voltage spike of Ldi/dt is produced initiating plasma across a resistive path separating anode and cathode. The plasma is subsequently maintained by energy stored in the inductor. Plasma is produced from cathode material, which allows for any electrically conductive material to be used. A planar structure, a tubular structure, and a coaxial structure allow for consumption of cathode material feed and thereby long lifetime of the thruster for long durations of time.Type: GrantFiled: August 16, 2004Date of Patent: May 30, 2006Assignee: Alameda Applied Sciences Corp.Inventors: Jochen Schein, Andrew N. Gerhan, Robyn L. Woo, Michael Y. Au, Mahadevan Krishnan
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Patent number: 6818853Abstract: An apparatus for producing a vacuum arc plasma source device using a low mass, compact inductive energy storage circuit powered by a low voltage DC supply acts as a vacuum arc plasma thruster. An inductor is charged through a switch, subsequently the switch is opened and a voltage spike of Ldi/dt is produced initiating plasma across a resistive path separating anode and cathode. The plasma is subsequently maintained by energy stored in the inductor. Plasma is produced from cathode material, which allows for any electrically conductive material to be used. A planar structure, a tubular structure, and a coaxial structure allow for consumption of cathode material feed and thereby long lifetime of the thruster for long durations of time.Type: GrantFiled: May 30, 2003Date of Patent: November 16, 2004Assignee: Alameda Applied Sciences Corp.Inventors: Jochen Schein, Andrew N. Gerhan, Robyn L. Woo, Michael Y. Au, Mahadevan Krishnan