Abstract: A system for detecting charge accumulation during semiconductor wafer manufacturing including a sensor comprising a capacitor, an emitter for directing a primary electron beam toward the sensor, wherein the primary electron beam causes the sensor to emit secondary electrons and a detector for measuring the secondary electrons.
Type:
Grant
Filed:
June 18, 1998
Date of Patent:
November 7, 2000
Assignees:
International Business Machines Corporation, Alcedo, Inc.
Inventors:
James G. Ryan, Badih El-Kareh, Auguste B. El-Kareh